Plasma Enhanced Chemical Vapor Deposition

等离子体增强化学气相沉积

• 批准号: 455444208
• 金额: --
• 依托单位: Technische Universität Braunschweig
• 依托单位国家: 德国
• 项目类别: Major Research Instrumentation
• 财政年份: 2020
• 资助国家: 德国
• 起止时间: 2019-12-31 至 无数据
• 项目状态: 未结题
• 来源: https://gepris.dfg.de/gepris/projekt/455444208?language=en
• 关键词: Plasma; Enhanced; Chemical; Vapor; Deposition

The Institute of Semiconductor Technology is covering research activities from epitaxy of semiconductor nanostructures, chip processing and integration into systems for nanometrology. The infrastructure is available in the Epitaxy Competemce Center ec2, which is part of the institute. For the deposition of dielectric layers e.g. as isolation layers for microLED architectures of field effect transistors, as well as for optical layers in Bragg mirrors for laser diodes, a plasma deposition system is required. Focus of the reserach activities will be microLED reserach for Structured Micro Illumination Light Engines (SMILE) as well as 3-dimensional LED architectures. In addition, the plasma deposition will be available to all partner of LENA ("Laboratory for Emerging Nanometrology,"), the new reserach center for nanometrology reserach at TU Braunschweig.

半导体技术研究所的研究活动包括半导体纳米结构的外延，芯片加工和集成到纳米计量系统中。该基础设施可在Epittership Competemce Center ec2中使用，该中心是该研究所的一部分。为了沉积介电层，例如作为场效应晶体管的微LED架构的隔离层，以及用于激光二极管的布拉格反射镜中的光学层，需要等离子体沉积系统。研究活动的重点将是结构化微照明光引擎（SMILE）以及三维LED架构的microLED研究。 此外，等离子体沉积将提供给所有合作伙伴的LENA（“新兴纳米计量学实验室，”），新的研究中心纳米计量研究在TU布伦瑞克。