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Reliability Improvement of Diamond Film Cutting Tools by Two-step CVD Growth Technique

两步CVD生长技术提高金刚石薄膜切削刀具的可靠性

基本信息

批准号：
10555243
负责人：
MITSUDA Yoshitaka
金额：
$ 6.98万
依托单位：
The University of Tokyo
依托单位国家：
日本
项目类别：
Grant-in-Aid for Scientific Research (B)
财政年份：
1998
资助国家：
日本
起止时间：
1998 至 2000
项目状态：
已结题

来源：
https://kaken.nii.ac.jp/en/grant/KAKENHI-PROJECT-10555243/
关键词：
DIAMOND CVD CUTTING TOOL TWO-STEP GROWTH MICROWAVE PLASMA RELIABILITY SUPER HARD SUBSTRATE ADHESION

项目摘要

In order to improve the reliability of diamond cutting tool, we have investigated two targets; to develop the cylindrical cavity type microwave (MW) plasma CVD system with high efficiency of production, and/or to establish the simple procedure of enhancement on the nucleation density compared with two-step growth technique.The novel MW plasma CVD system was developed using the cylindrical cavity with H11 mode. The conversion efficiency of MW power into plasma drastically increased by improving the mode converter and the MW guide.Using the developed system, the diamond films were successfully deposited. Either by increasing MW power or by adding Ar gas, the plasma volume was expanded, resulting in the enlargement of deposition area. The uniformity of substrate temperature was performed using the divided-concentric circle heater. In this study, the maximum difference of substrate temperature was reduced up to 50 degree. Using these techniques, the diamond film was successfully deposited … More in the area of φ90 with relatively uniform thickness.Since two-step growth technique, in which the adhesion strength, i.e., the reliability can be enhanced, has the complicated process, the production efficiency was much lower at the industrial level. Therefore, the pulse injection procedure was developed instead of the high supersaturation step in two step growth technique. Using the pulse injection procedure, we could achieve the enhancement of nucleation density as well as in the two-step growth technique. The pulse injection procedure had the advantage to skip the processes of the second plasma generation and the cleaning after deposition, resulting in the decrease of production cost.Moreover, the scale of developed system was dependent on the using MW wavelength. Although the using frequency was 2.45GHz in this study, 900MHz can be available in the industrial production system. Using 900MHz, the deposition area might be three times larger than this study, keeping the basic advantages. Less

为了提高金刚石刀具的可靠性，我们研究了两个目标：一是开发生产效率高的圆柱腔型微波等离子体CVD系统，二是建立一种相对于两步生长技术提高成核密度的简单工艺。通过对模式转换器和微波波导的改进，大幅度提高了微波功率向等离子体的转换效率。无论是增加微波功率还是加入氩气，都使等离子体体积增大，导致沉积面积增大。采用同心圆加热器实现了衬底温度的均匀性。在这项研究中，衬底温度的最大差异被减小到50度。利用这些技术，成功地沉积了金刚石薄膜 ...更多信息由于采用两步生长技术，可靠性不能提高，工艺复杂，生产效率在工业水平上要低得多。因此，脉冲注入程序取代了两步生长技术中的高过饱和步骤。采用脉冲注入工艺，我们可以达到提高成核密度的效果。脉冲注入工艺的优点是省去了二次等离子体产生和沉积后的清洗过程，降低了生产成本，而且系统的规模取决于所用波长。虽然本研究的使用频率为2.45GHz，但900MHz可以用于工业生产系统。使用900MHz，沉积面积可能是本研究的三倍，保持基本优势。少