Reliability Improvement of Diamond Film Cutting Tools by Two-step CVD Growth Technique
Reliability Improvement of Diamond Film Cutting Tools by Two-step CVD Growth Technique
批准号:
10555243
负责人:
MITSUDA Yoshitaka
金额:
$6.98万
依托单位:
依托单位国家:
日本
项目类别:
Grant-in-Aid for Scientific Research (B)
财政年份:
1998
资助国家:
日本
项目状态:
已结题
起止时间:
1998 至 2000
中文摘要
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英文摘要
In order to improve the reliability of diamond cutting tool, we have investigated two targets; to develop the cylindrical cavity type microwave (MW) plasma CVD system with high efficiency of production, and/or to establish the simple procedure of enhancement on the nucleation density compared with two-step growth technique.The novel MW plasma CVD system was developed using the cylindrical cavity with H11 mode. The conversion efficiency of MW power into plasma drastically increased by improving the mode converter and the MW guide.Using the developed system, the diamond films were successfully deposited. Either by increasing MW power or by adding Ar gas, the plasma volume was expanded, resulting in the enlargement of deposition area. The uniformity of substrate temperature was performed using the divided-concentric circle heater. In this study, the maximum difference of substrate temperature was reduced up to 50 degree. Using these techniques, the diamond film was successfully deposited … More in the area of φ90 with relatively uniform thickness.Since two-step growth technique, in which the adhesion strength, i.e., the reliability can be enhanced, has the complicated process, the production efficiency was much lower at the industrial level. Therefore, the pulse injection procedure was developed instead of the high supersaturation step in two step growth technique. Using the pulse injection procedure, we could achieve the enhancement of nucleation density as well as in the two-step growth technique. The pulse injection procedure had the advantage to skip the processes of the second plasma generation and the cleaning after deposition, resulting in the decrease of production cost.Moreover, the scale of developed system was dependent on the using MW wavelength. Although the using frequency was 2.45GHz in this study, 900MHz can be available in the industrial production system. Using 900MHz, the deposition area might be three times larger than this study, keeping the basic advantages. Less
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高井義成, 小林剣二, 光田好孝: "円筒H11モードを利用したマイクロ波プラズマCVD装置によるダイヤモンド膜の大面積堆積"表面技術協会第102回講演大会講演要旨集. 233-234 (2000)
Yoshinari Takai、Kenji Kobayashi、Yoshitaka Mitsuda:“使用圆柱 H11 模式的微波等离子体 CVD 设备大面积沉积金刚石薄膜”表面技术协会第 102 届会议摘要 233-234 (2000)。
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通讯作者:
Yoshinari TAKAI, Kenji KOBAYASHI, Yoshitaka MITSUDA: "CVD Fabrication of Diamond Films in the Microwave Resonance Cavity with Cylindrical H11 mode"14th Symposium Abstract of Diamond Symposium. 64-65 (2000)
Yoshinari TAKAI、Kenji KOBAYASHI、Yoshitaka MITSUDA:“圆柱形 H11 模式微波谐振腔中金刚石薄膜的 CVD 制造”第 14 届金刚石研讨会摘要。
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Yoshitaka MITSUDA, Yoshinari TAKAI: "Diamond Films Deposition in Microwave Plasma Reactor with Cylindrical H11 mode"Jpn. J. Appl. Phys.. (2002)
Yoshitaka MITSUDA、Yoshinari TAKAI:“圆柱形 H11 模式微波等离子体反应器中的金刚石薄膜沉积”Jpn。
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高井義成, 小林剣二, 光田好孝: "円筒H11モードマイクロ波共振器によるダイヤモンド膜のCVD形成"第14回ダイヤモンドシンポジウム講演概要集. 64-65 (2000)
Yoshinari Takai、Kenji Kobayashi、Yoshitaka Mitsuda:“使用圆柱形 H11 模式微波谐振器进行金刚石薄膜的 CVD 形成”第 14 届钻石研讨会摘要 64-65(2000 年)。
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通讯作者:
Yoshinari TAKAI, Kenji KOBAYASHI, Yoshitaka MITSUDA: "Enlargement of Deposition Area of Diamond Films by the Microwave Plasma CVD system using Cylindrical H11 mode"102nd Symposium Abstract of Surface Finishing Society of Japan. 233-234 (2000)
Yoshinari TAKAI、Kenji KOBAYASHI、Yoshitaka MITSUDA:“使用圆柱 H11 模式的微波等离子体 CVD 系统扩大金刚石薄膜的沉积面积”日本表面处理协会第 102 届研讨会摘要。
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