Electrochemical conditions for Separating purified metallic films by electrodeposition at the two-liquid-phase interface.

通过两液相界面电沉积分离纯化金属膜的电化学条件。

• 批准号: 11450268
• 负责人: KANEKO Hiroyuki
• 金额: $ 9.47万
• 依托单位: Akita University
• 依托单位国家: 日本
• 项目类别: Grant-in-Aid for Scientific Research (B)
• 财政年份: 1999
• 资助国家: 日本
• 起止时间: 1999 至 2001
• 项目状态: 已结题
• 来源: https://kaken.nii.ac.jp/en/grant/KAKENHI-PROJECT-11450268/
• 关键词: Electrodeposition; Metallic film; Interfacial phenomenon; High qurity; Lead; 鉛

A two-dimensional metal deposit can be obtained by the cathodic reduction of the metal at the interface between an organic liquid and an aqueous solution. One advantage of this technique is that any solid substrate is not needed. Therefore, as one of attractive application of this technique, electrochemical conditions were surveyed for preparing purified metallic films in this study.Firstly, experimental techniques were developed to maintain uniform growth of metallic films along the interface, ; The given distance between the counter electrode and the growth front of the metal was held, by moving the counter electrode.Secondly, effects of impurities in aqueous solutions were examined on the growth and purity of zinc electrodeposited. The additions of Cu and Fe ions influenced scarcely on the growth of zinc,but the addition of Pb ions resulted in an uniform growth of zinc. Pb and Cu enriched in zinc, but Fe did not enrich.Fundamental information to obtain purified metallic films by this technique was obtained.Above results will be very useful for preparing highly purified metallic films.

可以通过在有机液体和水溶液之间的界面上的金属降低阴极减少金属来获得二维金属沉积物。该技术的优点之一是不需要任何固体底物。因此，作为该技术的有吸引力的应用之一，在这项研究中调查了用于制备纯化金属膜的电化学条件。首先，开发了实验技术，以维持沿界面的金属膜的均匀生长；通过移动计数器电极，持有计数器电极和金属生长正面之间的给定距离。第二，第二，杂质在水溶液中的影响对锌电沉积的生长和纯度进行了检查。 Cu和Fe离子的添加​​几乎不会影响锌的生长，但是PB离子的添加​​导致锌的均匀生长。富含锌的Pb和Cu并没有丰富Fe。通过该技术获得纯化的金属膜的信息。放置结果对于准备高度纯化的金属膜非常有用。

项目成果

Eiji Tada, Hiroyuki Kaneko: "Electrodeposition of PbO_2 Finns at the Interface of Two Immiscible Liquids"Chemistry Letters, 2000. 1306-1307 (2000)

Eiji Tada，Hiroyuki Kaneko：“两种不混溶液体界面处 PbO_2 Finns 的电沉积”化学快报，2000 年。1306-1307 (2000)

Eiji Tada, Hiroyuki Kaneko: "Electrodeposition of PbO_2 Films at the Interface of Two Immiscible Liquids"Chemistry Letters. 2000. 1306-1307 (2000)

Eiji Tada、Hiroyuki Kaneko：“两种不混溶液体界面处的 PbO_2 薄膜的电沉积”化学快报。

Hiroyuki Kaneko, Miki Nagasawa, Toshiaki Mitsui: "Purification of Zinc Electrodeposited at the Interface between Two Liquid Phases"Surface & Coatings Technology. (発表予定).

Hiroyuki Kaneko、Miki Nagasawa、Toshiaki Mitsui：“两液相界面电沉积锌的净化”表面与涂层技术（待提交）。

Hiroyuki Kaneko: "Preparation and morphology of conducting films by electrodeposition at the interface between two liquid phases"Hyomen-Gijutsu. 50. 59-63 (2000)

Hiroyuki Kaneko：“通过在两个液相之间的界面上进行电沉积来制备导电薄膜和形态”Hyomen-Gijutsu。

金児 紘征: "二液相界面電析法による薄膜の製造とその形態"表面技術. 50. 59-63 (2000)

Hiroyuki Kaneko：“通过两液界面电沉积方法生产薄膜及其形态”表面技术 50. 59-63 (2000)。