Preparation of Metallic Films at the Interface between Two Liquid Phases

两液相界面金属膜的制备

• 批准号: 03805059
• 负责人: KANEKO Hiroyuki
• 金额: $ 0.9万
• 依托单位: Akita University
• 依托单位国家: 日本
• 项目类别: Grant-in-Aid for General Scientific Research (C)
• 财政年份: 1991
• 资助国家: 日本
• 起止时间: 1991 至 1993
• 项目状态: 已结题
• 来源: https://kaken.nii.ac.jp/en/grant/KAKENHI-PROJECT-03805059/
• 关键词: Electrodeposition; Interfacial Phenomena; Metallic Films; Filmy Growth; Zinc; Cobalt; Copper; Gold; 金属葉; 界面成長; 電析結晶; 亜鉛; コバルト; 薄膜

Two-dimentional metal deposits can be obtained by the cathodic reduction of metal ions at an interface between an organic liquid and an aqueous solution of the metal salt under appropriate experimental conditions. The effect of metallic species and its concentration, organic liquid, temperature, applied voltage and current on the morphology of the deposit was studied in detail. As a result, filmy deposits of zinc, cobalt, copper, silver and gold were obtained ; filmy growth was favored at the interface with an organic liquid having high interfacial tension, at high temperatures than room temperature and at relatively low applied voltages.We then tried to continuously prepare metallic films as an application of above phenomenon. The cathode was an aluminum foil floating at the interface, one end of which was connected to the rotating drum. The anode was positioned vertically to the cathode. A film growing along the interface was continuously rolled onto the drum by a computer-controlled stepping motor. The principal advantage of this technique are as follows : metallic films are easily obtainable without using any substate for deposition, and the crystal direction of the film can be controlled.

在适当的实验条件下，通过在有机液体和金属盐水溶液之间的界面上阴极还原金属离子，可以获得二维金属沉积。详细研究了金属种类及其浓度、有机液体、温度、外加电压和电流对镀层形貌的影响。结果得到了锌、钴、铜、银和金的薄膜沉积，在界面张力较高、温度高于室温、外加电压较低的有机液体的界面上有利于薄膜的生长。阴极是漂浮在界面上的铝箔，其一端连接到旋转滚筒上。阳极与阴极垂直放置。计算机控制的步进电机将沿界面生长的薄膜连续滚动到鼓上。这种技术的主要优点是：无需使用任何衬底即可获得金属薄膜，并且薄膜的晶体方向可控。

项目成果

Hiroyuki Kaneko,Hitoshi Taimatsu,Tsukasa Takahashi: "Preparation of Cobalt Films by Electrodeposition at the Interface between Two Liquid Phases" Denki Kagaku. 61. 827-829 (1993)

Hiroyuki Kaneko、Hitoshi Taimatsu、Tsukasa Takahashi：“通过在两液相界面上电沉积制备钴薄膜”电气化学。

金児紘征 泰松斉 阪原久: "金属塩水溶液/有機液体界面で成長した各種金属葉の形態" 秋田大学鉱山学部資源地学研究施設報告. 56. 187-191 (1991)

Hiroyuki Kaneko、Hitoshi Yasumatsu 和 Hisashi Sakahara：“在金属盐水溶液/有机液体界面生长的各种金属叶子的形态”秋田大学矿业学院资源地质研究所的报告 56. 187-191（1991 年）。 ）

Hiroyuki Kaneko, Hitoshi Taimatsu and Hisashi Sakahara: "Preparation of Metallic Films by Electrodeposition at the Interface between Two Liquid Phases" Materials Transaction, JIM. 34. 732-734 (1993)

Hiroyuki Kaneko、Hitoshi Taimatsu 和 Hisashi Sakahara：“通过在两液相界面上的电沉积制备金属薄膜”Materials Transaction，JIM。

Hiroyuki Kaneko, Hisashi Sakahara and Hitoshi Taimatsu: "Filmy Growth of Metal Leaves Electrodeposited at the Metallic Salt Solution / Organic Liquid Interface (in Japanese)" J.Mining and Materials Processing of Japan. 107. 542-546 (1991)

Hiroyuki Kaneko、Hisashi Sakahara 和 Hitoshi Taimatsu：“在金属盐溶液/有机液体界面电沉积金属叶的薄膜生长（日语）”J.Mining and Materials Manufacturing of Japan。

阪原 久・金児 紘征,泰松 斉: "酢酸エステル/硫酸亜鉛水溶液界面に電析した亜鉛葉の形態" 表面技術. 43. 1059-1064 (1992)

Hisashi Sakahara、Hiroyuki Kaneko 和 Hitoshi Yasumatsu：“沉积在醋酸盐/硫酸锌水溶液界面的锌叶的形态”表面技术 43. 1059-1064 (1992)。