Nanoimprint Lithography System

纳米压印光刻系统

• 批准号: 459053265
• 金额: --
• 依托单位: Rheinisch-Westfälische Technische Hochschule Aachen
• 依托单位国家: 德国
• 项目类别: Major Research Instrumentation
• 财政年份: 2021
• 资助国家: 德国
• 起止时间: 2020-12-31 至 无数据
• 项目状态: 未结题
• 来源: https://gepris.dfg.de/gepris/projekt/459053265?language=en
• 关键词: Nanoimprint; Lithography; System

The IWE 1 of RWTH Aachen University applies for a nanoimprint lithography system to complement the institute's nanofabrication facilities and for a shared clean room that is currently being expanded (Central Laboratory for Micro- and Nanotechnology, CMNT). We are currently able to use electron beam lithography from our neighboring institute for nanostructures. However, structuring entire wafers with mixed micro- and nanostructures is not practical due to the long writing times. In our research work at earlier institutes, we have long been using nanoimprint lithography as a key technology for the fast wafer-scale production of nanostructures. This is still reflected in the current IWE 1 projects. For compatibility with other systems in the CMNT, the nanoimprint lithography system must be designed for 8 inch wafer sizes. The system should enable a structurally accurate replication of nanostructures up to 20 nm (UV nanoimprint) and also enable the direct structuring of thermally curable polymers and 2D nanomaterial/polymer composites. This allows a broad use of nanotechnology also within the framework of the CMNT and in the Graphen & 2D Material Center of the RWTH Aachen.

RWTH亚琛大学的IWE 1申请纳米压印光刻系统，以补充该研究所的纳米制造设施，并申请目前正在扩建的共享洁净室（微纳米技术中心实验室，CMNT）。我们目前能够使用电子束光刻从我们邻近的研究所的纳米结构。然而，由于长的写入时间，用混合的微米和纳米结构化整个晶片是不实际的。在我们早期研究所的研究工作中，我们长期以来一直使用纳米压印光刻作为快速晶圆级纳米结构生产的关键技术。这仍然反映在目前的IWE 1项目中。为了与CMNT中的其它系统兼容，纳米压印光刻系统必须被设计用于8英寸晶片尺寸。该系统应该能够实现高达20 nm的纳米结构的结构精确复制（UV纳米压印），并且还能够实现热固化聚合物和2D纳米材料/聚合物复合材料的直接结构化。这使得纳米技术在CMNT的框架内以及亚琛工业大学的石墨烯和二维材料中心得到了广泛的应用。