Nanoimprint Lithography System

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The IWE 1 of RWTH Aachen University applies for a nanoimprint lithography system to complement the institute's nanofabrication facilities and for a shared clean room that is currently being expanded (Central Laboratory for Micro- and Nanotechnology, CMNT). We are currently able to use electron beam lithography from our neighboring institute for nanostructures. However, structuring entire wafers with mixed micro- and nanostructures is not practical due to the long writing times. In our research work at earlier institutes, we have long been using nanoimprint lithography as a key technology for the fast wafer-scale production of nanostructures. This is still reflected in the current IWE 1 projects. For compatibility with other systems in the CMNT, the nanoimprint lithography system must be designed for 8 inch wafer sizes. The system should enable a structurally accurate replication of nanostructures up to 20 nm (UV nanoimprint) and also enable the direct structuring of thermally curable polymers and 2D nanomaterial/polymer composites. This allows a broad use of nanotechnology also within the framework of the CMNT and in the Graphen & 2D Material Center of the RWTH Aachen.