Electron-beam lithography system

电子束光刻系统

• 批准号: 490736786
• 金额: --
• 依托单位: Friedrich-Schiller-Universität Jena
• 依托单位国家: 德国
• 项目类别: Major Research Instrumentation
• 财政年份: 2021
• 资助国家: 德国
• 起止时间: 2020-12-31 至 无数据
• 项目状态: 未结题
• 来源: https://gepris.dfg.de/gepris/projekt/490736786?language=en
• 关键词: Electron; beam; lithography; system

With the present application we apply for a user-friendly electron beam lithography system with high spatial resolution. The system will enable the applicants' working groups to experimentally implement a wide range of complex nanosystems. An important work focus should be on the fabrication of hybrid photonic and optoelectronic nanostructures. The nanostructures to be realized here are diverse and include for example light-emitting, non-linear and switchable photonic meta-surfaces, hybrid quantum systems, optoelectronic systems based on two-dimensional materials and nanowires, and photonic systems that are decorated with nanostructured responsive materials. Another focus of work is the development of new nanomaterials and nanostructuring processes, such as the development of electron-beam-sensitive responsive polymers, special flexible glasses and nanostructured ion-exchanged surfaces. The system applied for is the ideal tool for the controlled fabrication of hybrid nanostructures based on designs optimized on the computer. In particular, complex nanostructures, which consist of two or more precisely aligned layers and / or different material systems, should also be realized. This precise control is particularly important for hybrid photonic nanostructures, whose functionality is based on a selective near-field interaction of an optically resonant structure with nanoscale matter. For this purpose, the requested system enables multi-stage exposure processes that can be aligned with one another with an accuracy of sub 10 nm using an interferometric sample stage. Another strength of the system is its high flexibility for the exposure of samples with very small or irregular dimensions. This enables the nanostructuring of new materials and / or layered systems that are only available in small quantities. The requested system is therefore ideally suited for method development of new optical and responsive material systems and new nanostructuring processes. The system applied for will be mainly used by five research groups from the Friedrich Schiller University (FSU) Jena, which are based at the Faculty of Physics and Astronomy and the Faculty of Chemistry and Geosciences, but shall in principle be made accessible for all interested research groups of the FSU. In particular, the system will enable various new interdisciplinary collaborations between the research groups using it. All in all, the requested system will significantly strengthen the scientific spectrum of the FSU Jena at the intersection of the two focal points optics and materials science.

在本申请中，我们申请了具有高空间分辨率的用户友好的电子束光刻系统。该系统将使申请人的工作组能够实验性地实现各种复杂的纳米系统。一个重要的工作重点应该是混合光子和光电纳米结构的制造。这里要实现的纳米结构是多种多样的，包括例如发光的、非线性的和可切换的光子元表面、混合量子系统、基于二维材料和纳米线的光电系统以及用纳米结构响应材料装饰的光子系统。另一个工作重点是开发新的纳米材料和纳米结构化工艺，例如开发电子束敏感的响应聚合物，特殊的柔性玻璃和纳米结构化离子交换表面。该系统适用于基于计算机优化设计的混合纳米结构的控制制造的理想工具。特别地，还应该实现由两个或更多个精确对准的层和/或不同的材料系统组成的复杂纳米结构。这种精确的控制对于混合光子纳米结构特别重要，其功能是基于光学谐振结构与纳米级物质的选择性近场相互作用。为此目的，所请求的系统能够实现多阶段曝光过程，其可以使用干涉样品台以低于10 nm的精度彼此对准。该系统的另一个优点是其高度灵活性，适用于尺寸非常小或不规则的样品的曝光。这使得只能少量获得的新材料和/或分层系统的纳米结构化成为可能。因此，所要求的系统非常适合于新的光学和响应材料系统和新的纳米结构化工艺的方法开发。申请的系统将主要由耶拿弗里德里希·席勒大学（FSU）的五个研究小组使用，这些研究小组设在物理和天文学学院以及化学和地球科学学院，但原则上应使FSU的所有感兴趣的研究小组都能使用。特别是，该系统将使使用它的研究小组之间的各种新的跨学科合作成为可能。总而言之，所要求的系统将大大加强FSU耶拿在光学和材料科学两个重点交叉点的科学谱。