Nanoimprint Lithography System

我们提出了一种纳米压印光刻系统(UV-NIL)，作为模块化纳米生产设备的三个主要组件之一。UV-NIL系统是精确和快速实现和复制2D和2.5D微纳结构所必需的。该系统将有可能显著提高这种结构的生产效率，并实现高产量和灵活性。特别是，它将与基于双光子聚合(TPP)的激光纳米加工系统结合使用，该系统将通过UV-NIL制造后续微结构和纳米结构复制的母工具，从而实现最大的生产灵活性。在模块化纳米生产设施内，用于实现2D、2.5D和3D微纳结构的纳米压印光刻系统和激光纳米加工系统将由光学计量系统补充，用于精确测量结构几何形状、尺寸、特征尺寸和表面粗糙度等相关参数。所有模块将在一个多规模的生产链中实现，以实现各种集成的光学元件、子系统和整个功能系统，适用于从监控和传感到成像和超材料的各种应用。拟议的纳米压印光刻系统(UV-NIL)-以及最终的模块化纳米生产设施-提供一个组合的生产和表征环境，并将被四个主要用户组和其他一些合作者广泛使用。它将位于一个共同的基础设施中，以实现最佳接入和运营。申请者的一个研究小组将组织操作和服务。所要求的系统目前无法在计划的用户小组中使用。

We propose a Nanoimprint Lithography System (UV-NIL) as one of three main components of a modular Nanoproduction Facility. The UV-NIL System is required for precise and fast realization and replication of 2D and 2.5D micro- and nanostructures. The system will make it possible to significantly increase the production efficiency of such structures and achieve high throughput and flexibility. In particular, it will be utilized in combination with a Laser Nanofabrication System based on two-photon polymerization (TPP) which will fabricate the master tools for the subsequent micro- and nanostructure replication by UV-NIL enabling maximal production flexibility. Within the modular Nanoproduction Facility, the Nanoimprint Lithography System and the Laser Nanofabrication System for the realization of 2D, 2.5D, and 3D micro- and nanostructures will be complemented by an Optical Metrology System for precise measurement of the relevant parameters such as structure geometries, dimensions, feature sizes, and surface roughness. All modules will be implemented in a multi-scale production chain for the realization of various integrated optical elements, subsystems, and entire functional systems for a variety of applications ranging from optical networks over monitoring and sensing to imaging and metamaterials.The proposed Nanoimprint Lithography System (UV-NIL) - and ultimately the modular Nanoproduction Facility - provides a combined production and characterization environment and will be broadly utilized by the groups of the four main users and a number of additional collaborators. It will be located in a common infrastructure for optimal access and operation. One research group of the applicants will organize operation and service.The requested system is currently not available in the groups of the planned users.