Nanoimprint Lithography System

点击翻译按钮获取中文摘要

We propose a Nanoimprint Lithography System (UV-NIL) as one of three main components of a modular Nanoproduction Facility. The UV-NIL System is required for precise and fast realization and replication of 2D and 2.5D micro- and nanostructures. The system will make it possible to significantly increase the production efficiency of such structures and achieve high throughput and flexibility. In particular, it will be utilized in combination with a Laser Nanofabrication System based on two-photon polymerization (TPP) which will fabricate the master tools for the subsequent micro- and nanostructure replication by UV-NIL enabling maximal production flexibility. Within the modular Nanoproduction Facility, the Nanoimprint Lithography System and the Laser Nanofabrication System for the realization of 2D, 2.5D, and 3D micro- and nanostructures will be complemented by an Optical Metrology System for precise measurement of the relevant parameters such as structure geometries, dimensions, feature sizes, and surface roughness. All modules will be implemented in a multi-scale production chain for the realization of various integrated optical elements, subsystems, and entire functional systems for a variety of applications ranging from optical networks over monitoring and sensing to imaging and metamaterials.The proposed Nanoimprint Lithography System (UV-NIL) - and ultimately the modular Nanoproduction Facility - provides a combined production and characterization environment and will be broadly utilized by the groups of the four main users and a number of additional collaborators. It will be located in a common infrastructure for optimal access and operation. One research group of the applicants will organize operation and service.The requested system is currently not available in the groups of the planned users.