Development of a "near-surface"-photodetector based on anomalous above-band-gap absorption band of SiGe
Development of a "near-surface"-photodetector based on anomalous above-band-gap absorption band of SiGe
批准号:
12555085
负责人:
FUKATSU Susumu
金额:
$6.34万
依托单位:
依托单位国家:
日本
项目类别:
Grant-in-Aid for Scientific Research (B)
财政年份:
2000
资助国家:
日本
项目状态:
已结题
起止时间:
2000 至 2002
中文摘要
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英文摘要
Silicon-on-insulator (SOI) substrates have been in the focus of attention these days particularly from the perspective of developing high speed, less power-hungry electronics. The looming silicon-photonics on the other hand is to bring photonics/optoelectronics onto this otherwise purely electronic SOI chip. The problem then is that the conventional architecture of photonics/optoelectronics devices, at it stands, would not allow for a highly integrated circuit design, which can be traced back to the indirect band-gap of silicon that only weakly absorbs light thereby leaving a fairly large footprint.In this study, an attempt is made to create a new class of strongly-absorbing, on-chip quantum photodetector that takes advantage of an anomalous near-surface absorption band centered near 12eV developing in oxidized SiGe due to the relevant unique electronic states as opposed to those pertaining to the bulk. This above-band-gap absorption band was reproducible even in silicon-based systems short of Ge, which shows that it has to do with Si and hence its near-surface defects launched therein. A series of MSM (metal-semiconductor-metal) photodetecotrs prototypes with Schottky links was tested to examine such characteristics as spectral sensitivity in relation to wavelength selective detection, dynamic range of photoresponse, dark current, polarization-insensitiveness, and transient response including bandwidth reaching the subnanosecond domain. Interestingly, the absence of hole burning indicates that the 1.2eV band is not homogeneously broadened. Besides the issues that had been addressed in the original proposal, electroabsorption and electroreflectance were discovered during the course of this study, which holds considerable promise in building electro-optic modulator and tunable detector. The fabrication of an arrayed detector for mulitichannel spectroscopy and transparent fringe detection will remain as a subject of future study.
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M.Jo, K.Ishida, K.Kawamoto, S.Fukatsu: "Evolution of In-based compound semiconductor quantum dots on Si (001)"Phys. Stat. Sol.. (掲載予定). (2003)
M.Jo、K.Ishida、K.Kawamoto、S.Fukatsu:“Si (001) 上 In 基化合物半导体量子点的演化”Phys Stat.(待出版)。
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深津 晋: "シリーズ 結晶成長のダイナミクス3巻 エピタキシャル成長のメカニズム 中嶋一雄 編集 第4章3節 サーファクタントを利用した成長"共立出版. 17 (2002)
Susumu Fukatsu:“晶体生长的系列动力学第3卷外延生长机制,由Kazuo Nakajima编辑第4章第3节使用表面活性剂”Kyoritsu Shuppan 17(2002)。
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Field-enhanced Stokes shifts in strained Si_1-yC_y/Si(001) quantum wells
应变 Si_1-yC_y/Si(001) 量子阱中的场增强斯托克斯位移
DOI:
--
发表时间:
2000
期刊:
Thin Solid Films 369
影响因子:
--
作者:
[Y.Sugawara]
通讯作者:
Y.Sugawara
Time of Flight法を用いたSi_1-xGe_x/Si歪量子井戸における面内方向の励起子輸送の観測
利用飞行时间法观察Si_1-xGe_x/Si应变量子阱面内方向的激子输运
DOI:
--
发表时间:
2001
期刊:
影响因子:
--
作者:
[Y.Ishikawa, N.Shibata, S.Fukatsu, 澤田和宏]
通讯作者:
澤田和宏
シリコンフォトニクス第2章「シリコン光エミッタ」
硅光子学第二章“硅发光器”
DOI:
--
发表时间:
2007
期刊:
影响因子:
--
作者:
[K.Kawamoto, M.Jo, Y.Sugawara, S.Fukatsu, 深津晋, 深津晋]
通讯作者:
深津晋
共 47 条
Implementation of quantum algorithms on an analog printed-circuit-board
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Real space transfer of electrons in a Si-based quantum structure and its application to infrared generation
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Development of SiGe-based Quantum Well Laser Diodes
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负责人:FUKATSU Susumu
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