DEVELOPMENT OF OPTICAL FIBERS FOR DEEP UV LIGHT

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The purpose of this research to develop optical fibers for deep ultraviolet radiation using modified SiO2 class developed for vacuum UV lithography by the present author in 1999. The results obtained are summarized as follows.(1) The fibers composed of 200ppm F-doped SiO2 core and 5000ppm F-doped SiO2 clad exhibited a high transmission (〜60%/m)by tuning the drawing conditions. The refractive index was 0.7%.(2) The resulting fibers treated in pressured H2 gas for 2 days exhibited excellent toughness for F2 laser irradiation, i.e., almost no degradation was seen after 105 pulses of ArF laser pulse(〜50 mJ/cm2) was noted, while the as-drawn fibers were significantly degraded.(3) Excellent leaching ability was found for the fabricated fibers. Sharpening of an edge was automatically achieved just by placing the edge in HF-acid solution. Application to probe for UV-SNOM is expected.(4) Fundamental information on interaction of SiO2 glass with F2 excimer laser was obtained, i.e., defect formation, photo-induced structural change, and effects of H2-laeading.