DEVELOPMENT OF OPTICAL FIBERS FOR DEEP UV LIGHT

深紫外光光纤的开发

• 批准号: 13555240
• 负责人: HOSONO Hideo
• 金额: $ 8.45万
• 依托单位: TOKYO INSTITUTE OF TECHNOLOGY
• 依托单位国家: 日本
• 项目类别: Grant-in-Aid for Scientific Research (B)
• 财政年份: 2001
• 资助国家: 日本
• 起止时间: 2001 至 2002
• 项目状态: 已结题
• 来源: https://kaken.nii.ac.jp/en/grant/KAKENHI-PROJECT-13555240/
• 关键词: glass fibers; optical materials; silica glass; UV-fibers; 深紫外ファイバー; モディファイドシリカ; 点欠陥; エキシマーレーザー; 光導波路; ガラス

The purpose of this research to develop optical fibers for deep ultraviolet radiation using modified SiO2 class developed for vacuum UV lithography by the present author in 1999. The results obtained are summarized as follows.(1) The fibers composed of 200ppm F-doped SiO2 core and 5000ppm F-doped SiO2 clad exhibited a high transmission (〜60%/m)by tuning the drawing conditions. The refractive index was 0.7%.(2) The resulting fibers treated in pressured H2 gas for 2 days exhibited excellent toughness for F2 laser irradiation, i.e., almost no degradation was seen after 105 pulses of ArF laser pulse(〜50 mJ/cm2) was noted, while the as-drawn fibers were significantly degraded.(3) Excellent leaching ability was found for the fabricated fibers. Sharpening of an edge was automatically achieved just by placing the edge in HF-acid solution. Application to probe for UV-SNOM is expected.(4) Fundamental information on interaction of SiO2 glass with F2 excimer laser was obtained, i.e., defect formation, photo-induced structural change, and effects of H2-laeading.

本研究的目的是利用作者于1999年研制的用于真空紫外光刻的改性SiO2材料制备深紫外辐射光纤。所得结果总结如下：(1)通过调整拉伸条件，200ppm掺f SiO2芯和5000ppm掺f SiO2包层组成的光纤具有较高的透射率（~ 60%/m）。折射率为0.7%。(2)在高压H2气体中处理2天的纤维在F2激光照射下表现出优异的韧性，即在105次ArF脉冲（~ 50 mJ/cm2）下几乎没有降解，而拉伸后的纤维降解明显。(3)制备的纤维具有良好的浸出能力。锐化的边缘是自动实现的，只是把边缘放在hf酸溶液。有望应用于UV-SNOM探针。(4)获得了SiO2玻璃与F2准分子激光相互作用的基本信息，即缺陷的形成、光致结构变化以及h2 -铅的影响。

项目成果

K.Kajihara: "Diffusion and reaction of hydrogen in F_2-laser irradiated SiO_2 glass"Physical Review Letters. 89. 135507 1-135507 4 (2002)

K.Kajihara：“氢在F_2激光照射的SiO_2玻璃中的扩散和反应”物理评论快报。

K.Kajihara, L.Skuja, M.Hirano, and H.Hosono: "Formation and decay of non-bridging oxygen hole centers in SiO_2 glasses induced by F2 laser irradiation : in-situ observation using a pump and probe techniques"Applied Physics Letters. 79. 1757 (2001)

K.Kajihara、L.Skuja、M.Hirano 和 H.Hosono：“F2 激光照射诱导的 SiO_2 玻璃中非桥接氧空穴中心的形成和衰变：使用泵浦和探针技术进行原位观察”应用物理学

Oto, et al.: "Optical fiber for deep ultraviolet light"IEEE Photonics Technology Letters. 13. 978-981 (2001)

Oto 等人：“用于深紫外光的光纤”IEEE 光子技术快报。

K.Kajihara et al.: "Diffusion and reactions of H in F_2-irradiated SiO_2 glass"Physical Review Letters. 89. 135507-1-135507-4 (2002)

K.Kajihara等：“H在F_2-辐照的SiO_2玻璃中的扩散和反应”物理评论快报。

Y.Ikuta et al.: "Effect of H_2-impregnation on excimer-laser-induced ODC formation in synthetic SiO_2 glass"Applied Physics Lett.. 80. 3916-3918 (2002)

Y.Ikuta 等人：“H_2-浸渍对合成 SiO_2 玻璃中准分子激光诱导的 ODC 形成的影响”应用物理快报.. 80. 3916-3918 (2002)