The Efficient Use of Burned Shell Ceramics as Polishing Abrasive

本研究采用贝壳陶瓷和云母作为硅片抛光新磨料(抛光条件下)。0贝壳陶瓷在抛光压力22.4kpa，抛光时间30分钟的条件下，表面粗糙度为110~130 nmRa的硅片表面形成镜面(1~5 nmRm)。贝壳陶瓷是一种高效的抛光磨料。烧制后的贝壳陶瓷抛光效果要好于未烧制的贝壳陶瓷。0 Mica与贝壳陶瓷一样，用云母抛光可以得到纳米量级的镜面。研究表明，贝壳陶瓷和云母都可以有效地用作抛光磨料。它们比现有的磨料浆更具生态建议，因此对用户友好。

The research employs shell ceramics and mica as new polishing abrasive (the condition of the slurry) for the silicon wafer.○ Shell ceramicsWhen using the shell ceramics, the silicon wafer whose surface roughness is 110〜130 nmRa becomes a mirror surface (1-5 nmRm) under the condition of 22.4 kPa polishing pressure and 30 minutes polishing time. The shell ceramics is the efficient polishing abrasive. The burned shell ceramics polishes better than the non-burned shell ceramics.○ MicaThe mirror surface of the nano meter order is obtained by the polishing using mica, as is obtained by the shell ceramics. The research demonstrates that both the shell ceramics and mica can be effectively used as abrasive for polishing. They are ecologically recommendatory than the existing abrasive slurry, and hence, user-friendly.