Development of Novel electrochemical Nanofabrication Processes through Controlling Non-linear Diffusion

本研究的目的是开发新型的金属纳米结构的电化学方法的纳米加工过程。特别强调了对电化学过程特有的物种非线性扩散的控制和利用。在第一年的研究中，金属物种的优先电化学沉积在硅晶片表面上的纳米缺陷位置被证实，并利用这一点，金属纳米结构的制造工艺开发。利用从头算分子轨道方法对还原剂在金属团簇表面的反应进行了定量分析。此外，尝试应用照明辅助阳极氧化工艺来开发Si纳米纤维工艺，并通过使用孔状结构控制照明条件，该孔状结构控制孔向反应位点的非线性扩散，实现了均匀形成大孔阵列。我 关于我们 第二年，改进了硅晶片表面金属纳米结构的制备工艺，以实现对各种金属物种的进一步精确控制。尝试对硅大孔阵列进行改性，以制备可用作微反应器的皮升体积的玻璃管阵列。提出了一种制备孔阵列和填充金属针阵列的单批工艺。此外，本文还对高性能超大规模集成电路的关键材料--应变硅表面的化学性质进行了理论分析，并定量评价了表面反应性与“应变度”之间的关系。在最后一年，开发了玻璃管尖端通孔的制造工艺，以形成“纳米喷嘴”阵列。该工艺通过控制蚀刻剂物质的非线性扩散来实现。通过使用该工艺，尝试制造滤波器装置和其他系统。此外，利用量子化学计算方法，建立了化学沉积过程中还原剂反应活性的定量评价方法。如上所述，已经开发了用于精密纳米纤维的新型电化学方法，并且已经阐明了反应过程的详细机理。少

The objective of this research was to develop novel nanofabrication processes of metal nanostructures trough electrochemical approaches. Especially, control and utilization of the nonlinear diffusion of the species, which is unique to the electrochemical processes, were emphasized. In the first year of the research, preferential electrochemical deposition of metal species at the nano-defect sites on Si wafer surface was confirmed, and by utilizing this, fabrication process of metal nanostructure was developed. Also, quantitative analysis was made for the reaction of reductant species at the surface of metal cluster using ab-initio molecular orbital calculation. In addition, attempt on the application of illumination-assisted anodization process was made to develop Si nanofabrication process, and by controlling the illumination condition using aperture-like structure, which controls nonlinear diffusion of holes to the reaction sites, uniform formation of macro pore array was achieved. I … More n the second year, the fabrication process of metal nanostructure onto Si wafer surface was improved to achieve further precision control for various metal species. The modification of the Si macro pore array was attempted to fabricate pico-liter volume glass tube array which is applicable as microreactors. The single-batch process to fabricate the pore array and its filling to form metal-needle array was also developed. In addition, theoretical analysis on the chemical properties of strained Si surface, which is key material for fabricating high-performance ULSI, was also attempted and the correlation between the surface reactivity and "degree of strain" was quantitatively evaluated. In the final year, fabrication process for through-hole to the tip of the glass tube was developed to form "nano-nozzle" array. This process was achieved by controlling the nonlinear diffusion of etchant species. By using this process, fabrication of filter devices and other systems was attempted. In addition, quantitative evaluation procedure of the reactivity of reductant for electroless deposition process was established using quantum chemical calculation approaches. As described, novel electrochemical processes for precision nanofabrication have been developed and detailed mechanism of the reaction processes has elucidated. Less