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Low-Cost and Low-Power LSI design Methodology optimized for Electron Beam Direct Writing Technique with Merged Memory Circuit

Low-Cost and Low-Power LSI design Methodology optimized for Electron Beam Direct Writing Technique with Merged Memory Circuit
针对具有合并存储器电路的电子束直写技术优化的低成本和低功耗LSI设计方法
批准号:
16560317
负责人:
FUJINO Takeshi
金额:
$1.86万
依托单位:
依托单位国家:
日本
项目类别:
Grant-in-Aid for Scientific Research (C)
财政年份:
2004
资助国家:
日本
项目状态:
已结题
起止时间:
2004 至 2005

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中文摘要
翻译
随着超大规模集成电路微加工技术的进步,由微处理器和大存储器组成的集成电子系统可以在单个芯片上实现。这些“片上系统”是实现手机、数码相机等小型、低功耗、高性能系统的关键部件。由于掩模成本的原因,“片上系统”的初始开发成本变得昂贵。最新的“片上系统”的掩膜成本超过了100万美元。对于小批量生产的大规模集成电路来说,这一成本是一个关键问题,而芯片成本的大部分取决于“片上系统”的掩模成本,其全寿命产量小于1万个。因此,为了实现低成本的“片上系统”,必须开发降低掩模成本的新技术。我们采用EB直写技术作为光刻工具。EB直写是一种无掩码的技术,因此它没有掩码成本。然而,EB直写的吞吐量远低于光刻。即使是小批量的大规模集成电路生产,也必须缩短EB直接写入时间。采用字符投影EB直写技术,提高了数据吞吐量。本研究开发了三个关键技术。首先,开发了基于字符投影光刻的接近效果校正技术,以提高图案精度。其次,我们提出了新颖的“字符构建标准单元”设计方法,实现了高吞吐量的EB直写。最后,研究了一种适合EB直写的可编程逻辑体系结构。通过以上三个方面的研究,我们推动了小批量“片上系统”的低成本技术。
英文摘要
Integrated electronic system composed of microprocessors and large memories can be realized as a single chip owing to the progress of micro-fabrication technology of VLSI. These "System On a Chip" are key parts which realize small, low-power, and high-performance system such as mobile phones and digital still cameras.Initial development cost of "System On a Chip" become expensive due to the mask cost. The mask cost for the latest "System On a Chip" becomes more than 1 million dollars. This cost is a critical issue for small-production volume LSI, and the most of the chip cost depends upon the mask cost for "System On a Chip" whose whole-life production volume is less than 10 thousand. Therefore, the new technologies reducing mask cost must be developed for the low-cost "System On a Chip".We adopted EB direct-writing technique as a lithography tool. EB direct-writing is the mask-less technique, then it is free from mask-cost. However, the throughput of EB direct-writing is much lower than that of photo-lithography. Even for the small-volume LSI production, EB direct-writing time have to be shortened. Character-projection EB direct-writing technique is applied in order to increase the throughput.Three key technologies are developed in this study. First, proximity-effect-correction technique using character projection lithography is developed for high-patterning accuracy. Secondly, we proposed novel "Character-build standard cell" design methodology, which realize high throughput EB direct writing. Lastly, via-programmable logic architecture which is' suitable for EB direct-writing is examined. Using these three studies mentioned above, we promote the low-cost technology for small-production volume "System On a Chip".
期刊论文(39)
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会议论文
1サイクルでリードとライト動作を行う擬似デュアルポートメモリ
在一个周期内执行读写操作的伪双口存储器
DOI: --
发表时间: 2005
期刊: 第9回システムLSIワークショップ講演資料集
影响因子: --
作者: [下村弘, 早崎雅彦, 山原陽介, 泉知論, 藤野毅]
通讯作者: 藤野毅
Parallel Placement Procedare based on Distributed Genetic Algorithms
基于分布式遗传算法的并行放置程序
DOI: --
发表时间: 2005
期刊: Proc.International Conference on Adaptive and Natural Computing algorithms
影响因子: --
作者: [Masaya Yoshikawa, Takeshi Fujino, Hidekazu Terai]
通讯作者: Hidekazu Terai
Character-Build Standard-Cell Layout Technique for High-Throughput Character-Projection EB lithography
用于高通量字符投影 EB 光刻的字符构建标准单元布局技术
DOI: --
发表时间: 2005
期刊: Proc. of Photomask Japan 2005
影响因子: --
作者: [T.Fujino, Y.Kajiya, M.Yoshikawa]
通讯作者: M.Yoshikawa
A Novel Analog Module Placement Procedure Based on Hierarchical Genetic Algorithm
一种基于分层遗传算法的新型模拟模块放置程序
DOI: --
发表时间: 2005
期刊: Proc.The 9th IASTED International Conference on Artificial IntelliLence & Soft Computinig Vol.1
影响因子: --
作者: [M.Yoshikawa, T.Fujino, H.Terai]
通讯作者: H.Terai
共 11 条
    Survey on water quality and benthic taxonomy at headwater of Ayeyarwady river, Myanmar
    • 批准号:
      24404004
    • 项目类别:
      Grant-in-Aid for Scientific Research (B)
    • 资助金额:
      $6.82万
    • 财政年份:
      2012
    • 负责人:
      FUJINO Takeshi
    • 依托单位:
    EVATUATION OF PRIMARY PRODUCTIVITY IN STREAM BY TWO DIMENSIONAL FLUORESCENCE MEASUREMENT METHOD
    • 批准号:
      21560533
    • 项目类别:
      Grant-in-Aid for Scientific Research (C)
    • 资助金额:
      $3.0万
    • 财政年份:
      2009
    • 负责人:
      FUJINO Takeshi
    • 依托单位:
    Via programmable logic device with tamper resistance fabricated by EB direct writing technique applied for user authentication
    • 批准号:
      20560340
    • 项目类别:
      Grant-in-Aid for Scientific Research (C)
    • 资助金额:
      $2.91万
    • 财政年份:
      2008
    • 负责人:
      FUJINO Takeshi
    • 依托单位:
    ECOLOGICAL PROCESS OF AQUATIC ECOSYSTEMS DURING IMPOUNDMENT OF A DAM
    • 批准号:
      19560509
    • 项目类别:
      Grant-in-Aid for Scientific Research (C)
    • 资助金额:
      $2.91万
    • 财政年份:
      2007
    • 负责人:
      FUJINO Takeshi
    • 依托单位:
    海外基金