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Control of microstructures of silicon nanocrystals by ion implantation and their application for optical devices.

Control of microstructures of silicon nanocrystals by ion implantation and their application for optical devices.
离子注入控制硅纳米晶的微观结构及其在光学器件中的应用。
批准号:
17510098
负责人:
IWAYAMA Tsutomu
金额:
$2.3万
依托单位国家:
日本
项目类别:
Grant-in-Aid for Scientific Research (C)
财政年份:
2005
资助国家:
日本
项目状态:
已结题
起止时间:
2005 至 2006

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中文摘要
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英文摘要
Si ion implantation into Si0_2 and subsequent high temperature anneals induce the formation of embedded luminescent Si nanocrystals. The potentialities of rapid thermal annealing (RTA) to enhance the photoluminescence (PL) as well as those to induce low temperature formation of luminescent Si nanocrystals have been investigated. Si ion implantation was used to synthesize specimens of Si0_2 containing supersaturated Si. The implanted samples were rapidly annealed only for a few minutes. After that, in some cases before that, the samples were annealed for a few hours using a conventional furnace to induce Si precipitation. PL spectra were measured at various steps of anneal processes. The luminescence intensity is strongly enhanced with RTA prior to a conventional furnace anneal. The luminescence intensity, however, decreases when RTA follows conventional furnace annealing. It is found that the order of heat treatment is an important factor in intensities of the luminescence. Enhancement is also found to be typical for low dose samples. Moreover, the visible photoluminescence is found to be observed even after furnace anneal below 1000 ℃, only for RTA treated samples. In forming the luminescent Si nanocrystals in a Si0_2 matrix from supersaturation, decomposition, segregation, diffusion, nucleation, aggregation, growth and crystallization processes are clearly important. As a result of diffusion limited segregation, a number of small aggregates will be formed and they act as a nucleation point.In the present research project, we have found that the luminescence intensity is strongly enhanced with a rapid thermal anneal prior to a conventional furnace anneal and the luminescence intensity decreases with a rapid thermal annealing after a conventional furnace anneal. Moreover, a post implantation rapid thermal anneal prior to a furnace anneal is effective to achieve low temperature formation of luminescent Si nanocrystals.
期刊论文(18)
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会议论文
Lamp annealing effects on the formation process of implanted silicon nanocrystals in SiO_2.
灯退火对SiO_2中注入硅纳米晶形成过程的影响
DOI: --
发表时间: 2007
期刊: Nucl. Instrum. Methods B 257
影响因子: --
作者: [J.Ariake, T.Chiba, N.Honda, J.Ariake, 有明 順, J.Ariake, 有明 順, 有明 順, J.Ariake, J.Ariake, J.Ariake, J.Ariake, 有明 順(共著), J.Ariake (one of the coauthors), 有明 順, T.S.Iwayama]
通讯作者: T.S.Iwayama
DOI: 10.1016/j.vacuum.2006.03.023
发表时间: 2006-09-20
期刊: VACUUM
影响因子: 4
作者: [Iwayama, T. S., Hama, T., Boyd, I. W.]
通讯作者: Boyd, I. W.
Low temperature formation of luminescent Si nanocrystals in SiO_2 with rapid thermal anneals.
通过快速热退火在 SiO_2 中低温形成发光硅纳米晶体。
DOI: --
发表时间: 2006
期刊: Proceedings of the 24th Symposium on Materials Science & Engineering Research Center of Ion Beam Technology 24
影响因子: --
作者: [T.S.Iwayama, T.Hama, D.E.Hole, T.Hama]
通讯作者: T.Hama
DOI: 10.1021/ic0504487
发表时间: 2005-09-05
期刊: INORGANIC CHEMISTRY
影响因子: 4.6
作者: [Inamo, M, Matsubara, N, Hoshino, M]
通讯作者: Hoshino, M
7
    Control of embedded Si nanocrystals in SiO2 by ion and laser beams
    • 批准号:
      22604002
    • 项目类别:
      Grant-in-Aid for Scientific Research (C)
    • 资助金额:
      $2.91万
    • 财政年份:
      2010
    • 负责人:
      IWAYAMA Tsutomu
    • 依托单位:
    Control of microstructures of semiconductor nanocrystals by ion implantation and their application for optical materials
    • 批准号:
      15510100
    • 项目类别:
      Grant-in-Aid for Scientific Research (C)
    • 资助金额:
      $2.37万
    • 财政年份:
      2003
    • 负责人:
      IWAYAMA Tsutomu
    • 依托单位:
    海外基金