Quantum mechanical simulation of current noise of nanoscale double-gate MOSFETs
Quantum mechanical simulation of current noise of nanoscale double-gate MOSFETs
批准号:
17560308
负责人:
MIYOSHI Tanroku
金额:
$1.92万
依托单位:
依托单位国家:
日本
项目类别:
Grant-in-Aid for Scientific Research (C)
财政年份:
2005
资助国家:
日本
项目状态:
已结题
起止时间:
2005 至 2006
中文摘要
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英文摘要
In this research project, we have studied the current noise characteristics of nano-scale MOS devices by employing the quantum transport models based upon the nonequilibrium Green's function model (NEGF) and the quantum corrected Monte Carlo (MC) device simulation.1. Nonequilibrium Green's function modelThe NEGF is used to study the shot noise suppression caused by the quantum mechanical correlations of electrons in semiconductor nano-scale devices, so that the current noise is discussed at low temperature. It was considered interesting to apply the NEGF models to the study of shot noise in ballistic nano-scale Si-MOSFETs, where correlations of electrons are expected to exist when the three dimensional electrons in the various shape of electrodes are injected into the inversion layer of the channel and confined to quantized subbands as the so-called two-dimensional electron gases. It is found from the NEGF simulation that the drain current noise is always suppressed below the full Pois … More sonian value partly due to the Fermi correlation and partly due to the partition noise of electrons injected from the electrodes. Further, the current noise to average current ratio (Fano-factor) is found to be suppressed strongly with the increase of gate bias and the decrease of operating temperature.2. Quantum corrected Monte Carlo modelThe quantum corrected MC model has been developed to simulate practical semiconductor devices at normal temperatures, and applied to the study of the current fluctuations of a nano-scale double-gate Si-MOSFET. The quantum mechanical effects are incorporated in terms of a quantum correction of potential in this particle model. It is shown that the incorporation of the ellipsoidal multi-valleys of silicon conduction band and energy quantization effects are important to analyze the current noise in ultra small Si-MOSFETs. As a result, it is found that the fractional deviation of current noise never increase s but decreases a little even if the channel length is reduced to less than a few ten nanometers. Less
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A First Principles Study on Electronic Band Structures of Nano-Scaled SOI Films
纳米级SOI薄膜电子能带结构的第一性原理研究
DOI:
--
发表时间:
2005
期刊:
Extended Abstracts of Int'l Conf. on Solid State Devices and Materials (SSDM05)
影响因子:
--
作者:
[P.N.Minh, T.Oho, N.Sato et al., 上中 恒雄, 寺谷 佳之, Hideaki Tsuchiya, Yoshiyuki Teratani]
通讯作者:
Yoshiyuki Teratani
DOI:
10.1109/ted.2006.885672
发表时间:
2006-11
期刊:
IEEE Transactions on Electron Devices
影响因子:
3.1
作者:
[H. Tsuchiya;K. Fujii;T. Mori;T. Miyoshi]
通讯作者:
H. Tsuchiya;K. Fujii;T. Mori;T. Miyoshi
A Picture of Quasi-Ballistic Transport in Nanoscale MOSFETs
纳米级 MOSFET 中的准弹道输运图
DOI:
--
发表时间:
2006
期刊:
Proc. Int. Conf. Solid State Devices and Materials (SSDM2006)
影响因子:
--
作者:
[和田光司, 谷井宏成, 西村太, 笹部孝司, 植野嘉章, 岩崎俊, H.Tsuchiya]
通讯作者:
H.Tsuchiya
巻頭言 デバイスシミュレーションのパラダイムシフト
前言 器件仿真的范式转变
DOI:
--
发表时间:
2005
期刊:
シミュレーション学会誌 24・4
影响因子:
--
作者:
[和田光司, 谷井宏成, 西村太, 笹部孝司, 植野嘉章, 岩崎俊, H.Tsuchiya, 三好旦六]
通讯作者:
三好旦六
Paradigm shift in device simulation (Preface)
设备仿真的范式转变(前言)
DOI:
--
发表时间:
2005
期刊:
J. Japan Society for Simulation Technology Vol.24, No.4
影响因子:
--
作者:
[K.Itagaki, H.Takayanagi, H.Nakano, K.Horio, T.Miyoshi]
通讯作者:
T.Miyoshi
共 11 条
Research of current fluctuations of nanoscaled MOSFETs based upon quantum transport models
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批准号:15560296
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项目类别:Grant-in-Aid for Scientific Research (C)
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资助金额:$2.24万
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财政年份:2003
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负责人:MIYOSHI Tanroku
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依托单位:
海外基金