Development of Evaluation methods for mechanical properties in micro-sized components for MEMS devices
Development of Evaluation methods for mechanical properties in micro-sized components for MEMS devices
批准号:
17560611
负责人:
ISHIYAMA Chiemi
金额:
$2.18万
依托单位国家:
日本
项目类别:
Grant-in-Aid for Scientific Research (C)
财政年份:
2005
资助国家:
日本
项目状态:
已结题
起止时间:
2005 至 2006
中文摘要
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英文摘要
Firstly, bending tests were developed using micro-sized bending specimens made of SU-8 photo resist to clarify the bending properties of a micro-sized polymer. A digital microscope was used for the in situ observation of elastic and plastic deformation of cantilever type bend specimens, which had been cut from sheets using a laser cutting system. Loads were applied to these cantilevers using a mechanical testing machine, which was developed by us for micro-sized materials for Micro-electro mechanical systems (MEMS). Load-displacement curve under bending load conditions in micro-sized SU-8 specimens clearly shows ductile manner, although SU-8 is usually brittle material. Shear band like deformation was appeared near root of the specimens after maximum load, and then this plastic deformation area was expanded during loading. The ductile behavior in a micro-sized SU-8 may be caused by regional shear band deformation near the root.Secondly, micro-sized bending tests were performed using epoxy type photo-resist, SU-8, to clarify effects of a processing condition, UV exposure, Post baking and heat curing conditions on bending properties. Form the results in the first year, photo-masks for micro-sized bending specimens were planed. Load-displacement curves of most microsized SU-8 specimens show in an extremely ductile manner and all the specimens were failed by root of the beam. Young's modulus, Yield point and bending strength of SU-8 specimens remarkably increase with increasing exposure dose and heat curing. All the results clarify that bending properties of microsized photoresist are strongly affected by UV exposure and heat curing.
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Bending deformation behaviour of a micro-sized SU-8 photo-resist for MEMS
MEMS 微型 SU-8 光刻胶的弯曲变形行为
DOI:
--
发表时间:
2005
期刊:
Polymer Preprints(Japan) Vol.54, No.2
影响因子:
--
作者:
[Chiemi ISHIYAMA, Junpei MATSUZAKI, Yakichi HIGO]
通讯作者:
Yakichi HIGO
マイクロサイズ曲げ試験によるMEMS用厚膜レジストSU-8の塑性変形挙動
通过微尺寸弯曲测试用于MEMS的厚膜抗蚀剂SU-8的塑性变形行为
DOI:
--
发表时间:
2005
期刊:
第54回高分子討論会予稿集 54・2
影响因子:
--
作者:
[石山 千恵美, 松崎 純平, 肥後 矢吉]
通讯作者:
肥後 矢吉
MEMS用微小構造部材の接着強度測定評価法の開発と評価
MEMS微结构元件粘合强度测量与评价方法的开发与评价
DOI:
--
发表时间:
2006
期刊:
第50回日本学術会議材料工学連合講演会予稿集
影响因子:
--
作者:
[石山千恵美, 曽根正人, 肥後矢吉]
通讯作者:
肥後矢吉
MEMS用フォトレジストのマイクロサイズ曲げ特性に及ぼす露光量の影響
曝光剂量对MEMS光刻胶微尺寸弯曲性能的影响
DOI:
--
发表时间:
2006
期刊:
第55回高分子討論会予稿集 55・2
影响因子:
--
作者:
[石山 千恵美, 松崎 純平, 曽根 正人, 肥後 矢吉]
通讯作者:
肥後 矢吉
Effects of Exposure on Bending Properties in Micro-sized Photo-resist for MEMS
曝光对 MEMS 微型光刻胶弯曲性能的影响
DOI:
--
发表时间:
2006
期刊:
Polymer Preprints(Japan) Vol.55, No.2
影响因子:
--
作者:
[Chiemi ISHIYAMA, Junpei MATSUZAKI, Masato SONE, Yakichi HIGO]
通讯作者:
Yakichi HIGO
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