Electron beam induced deposition and ablation nanofabrication facility

电子束诱导沉积和烧蚀纳米加工设施

• 批准号: LE0453879
• 负责人: Prof Matthew Phillips
• 金额: $ 12.28万
• 依托单位: University of Technology Sydney
• 依托单位国家: 澳大利亚
• 项目类别: Linkage Infrastructure, Equipment and Facilities
• 财政年份: 2005
• 资助国家: 澳大利亚
• 起止时间: 2005-03-01 至 2006-03-01
• 项目状态: 已结题
• 来源: https://dataportal.arc.gov.au/RGS/Web/Grants/LE0453879
• 关键词: Electron; beam; induced; deposition; ablation

Electron beam induced deposition and ablation(EBIDA) is rapidly emerging as a new technology capable of fabricating three-dimensional nanostructures on nearly any substrate with very high precision. This proposal aims to establish a nanoscale EBIDA facility by integrating a specialized nanolithography attachment with an existing state-of-the-art 1nm resolution high current variable pressure scanning electron microscope. This combination of instrumentation will enable the high-speed production of conductive and insulating structures with 1-to-10nm dimensions. The unique facility will be used to manufacture and prototype novel nanoscale devices and structures and will enable measurement of their physical and chemical properties.

电子束诱导沉积和烧蚀（EBIDA）是一种快速发展的新技术，能够在几乎任何基底上以非常高的精度制造三维纳米结构。该提案旨在建立一个纳米级EBIDA设施，将一个专门的纳米光刻附件与现有的最先进的1nm分辨率高电流变压扫描电子显微镜相结合。这种仪器的组合将能够高速生产1至10 nm尺寸的导电和绝缘结构。该独特的设施将用于制造和原型新型纳米器件和结构，并将能够测量其物理和化学特性。