Electron beam induced deposition and ablation nanofabrication facility

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Electron beam induced deposition and ablation(EBIDA) is rapidly emerging as a new technology capable of fabricating three-dimensional nanostructures on nearly any substrate with very high precision. This proposal aims to establish a nanoscale EBIDA facility by integrating a specialized nanolithography attachment with an existing state-of-the-art 1nm resolution high current variable pressure scanning electron microscope. This combination of instrumentation will enable the high-speed production of conductive and insulating structures with 1-to-10nm dimensions. The unique facility will be used to manufacture and prototype novel nanoscale devices and structures and will enable measurement of their physical and chemical properties.