Effect of impurity on Si(111)-7*7 self-organization
Effect of impurity on Si(111)-7*7 self-organization
批准号:
09450022
负责人:
OHDOMARI Iwao
金额:
$6.02万
依托单位:
依托单位国家:
日本
项目类别:
Grant-in-Aid for Scientific Research (B)
财政年份:
1997
资助国家:
日本
项目状态:
已结题
起止时间:
1997 至 1998
中文摘要
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英文摘要
1 Influence of oxygen on the formation of Si(lll)-7*7 domainsThe transient aspects of Si(lll)7*7 reconstruction after laser irradiation were observed under the experimental condition of different Si substrate temperature and 0_2 pressure. The 7*7 growth was suppressed easily under higher 0_2 pressure and lower temperature. By means of in situ STM observation of the process, we have found that the preferential oxidation of the unreconstructed disordered region on the surface result in the suppression of the 7*7 growth.The 7*7 coverage on the quenched surfaces was measured as a formation of cooling speed for the two types of Si wafers with different oxygen concentration with STM.The 7*7 coverage of the sample with higher oxygen concentration was higher than that of the sample with lower oxygen concentration, which suggested that oxygen had an influence on the formation of the 7*7 structure.A novel inter-atomic potential energy function for Si, 0 mixed systems was developed to realize mol … More ecular-dynamics studies on the roles of 0 atoms in the 7*7 reconstruction. By molecular orbital calculations, we clarified that 0 atoms lowered the energetic barrier to form the 7*7 structure.2 In situ observation of the Si surface modification by ion irradiation using an ion-source /STM combined systemIn situ real-time high temperature observation of Si (111) 7*7 surface during ion irradiation in ultra high vacuum was performed for the first time using the ion-source / STM combined system. Sequential STM images of the high temperature surface showed structural change in the surface atomic arrangement before and after ion irradiation.3 Wafer scale fabrication of nano-structures on Si(lll) surfaceCorrelation between the surface atomic arrangement and the preferential adsorption site of Cu in a wet-process was investigated. For Cu deposition on hydrogen-terminated Si (111) surface, Cu mano-wires of -50 nm wide were observed in a narrow window of Si potential. We found that Cu nano clusters precipitate at dihydride Si atoms but not at mnonohydride Si atoms. Less
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K.Hara and I.Ohdomari: "Wafer-scale Nano-fabrication using Single-Ion-Implantation and Electrochemical Process" Technical Report of the Institute of Electronics, Information and Communication Engineers. ED-97-07. 35-40 (1997)
K.Hara 和 I.Ohdomari:“使用单离子注入和电化学工艺的晶圆级纳米制造”电子、信息和通信工程师协会的技术报告。
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K.Shimada, S.Katsube, T.Ishimaru, H.Kawada, and I.Ohdomari: "Consideration on the quantitativeness of reflection high energy electron diffraction intensity as a tool to monitor the coverage of the Si(111) surface by 7*7 domains" Japanese Journal of Applie
K.Shimada、S.Katsube、T.Ishimaru、H.Kawada 和 I.Ohdomari:“考虑反射高能电子衍射强度的定量性作为监测 Si(111) 表面覆盖率的工具 7*
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M. Koyama, et al.: "Influence of Near-Surface Defects in Si Induced by Reactive Ion Etching on the Electrical Properties of the Pt/n-Si Interface" Japanese Journal of Applied Physics. 36. 6682-6686 (1997)
M. Koyama 等人:“反应离子蚀刻引起的硅近表面缺陷对 Pt/n-Si 界面电性能的影响”日本应用物理学杂志。
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T. Watanabe, et al.: "Effects of fixed particles on periodic adatom arrangements on Si(111) unreconstructed surfaces" Applied Surface Science. (to be published).
T. Watanabe 等人:“固定粒子对 Si(111) 未重构表面上周期性吸附原子排列的影响”应用表面科学。
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K.Hara and I.Ohdomari: "Control of metal nano-structure morphology by means of applied Si potential" Applied Surface Science. (in press). (1998)
K.Hara 和 I.Ohdomari:“通过应用硅电势控制金属纳米结构形态”应用表面科学。
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共 41 条
Real-Time Scanning Tunneling Microscopy of Nano-Scale Surface Modification by Dopant Ion Irradiation
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批准号:20360023
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项目类别:Grant-in-Aid for Scientific Research (B)
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资助金额:$11.56万
-
财政年份:2008
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负责人:OHDOMARI Iwao
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依托单位:
Fabrication of semiconductor nano-scale structures and control of its electrical characteristics by means of quantum doping
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批准号:09555102
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项目类别:Grant-in-Aid for Scientific Research (B)
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资助金额:$8.26万
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财政年份:1997
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负责人:OHDOMARI Iwao
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依托单位:
Doping by single Ion Implantation and its application to solid state materials and devices.
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批准号:05101003
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项目类别:Grant-in-Aid for Specially Promoted Research
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资助金额:$143.36万
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财政年份:1993
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负责人:OHDOMARI Iwao
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依托单位:
Evaluation of semiconductor/insulator interface structure by crystal model
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批准号:61460069
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项目类别:Grant-in-Aid for General Scientific Research (B)
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资助金额:$3.84万
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财政年份:1986
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负责人:OHDOMARI Iwao
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依托单位:
海外基金