EVALUATION OF MECHANICAL PROPERTIES OF DIAMOND THIN FILM ONTO METAL SUBSTRATES PRODUCED BY MWCVD

MWCVD 金属基底上金刚石薄膜的机械性能评估

• 批准号: 09650106
• 负责人: MURAKAMI Ri-ichi
• 金额: $ 2.05万
• 依托单位: THE UNIVERSITY OF TOKUSHIMA
• 依托单位国家: 日本
• 项目类别: Grant-in-Aid for Scientific Research (C)
• 财政年份: 1997
• 资助国家: 日本
• 起止时间: 1997 至 1998
• 项目状态: 已结题
• 来源: https://kaken.nii.ac.jp/grant/KAKENHI-PROJECT-09650106/
• 关键词: DIAMOND THIN FILM; DIAMOND LIKE CARBON FILM; ADHESION; FRICTION AND WEAR PROPERTIES; マイクロ波プラズマ; CVD; 機械的性質

The diamond thin films were produced onto pure titanium and mild steel substrates by micro wace plasma CVD.The diamond like carbon films were coated onto tool steel and cemented carbide by ion plating. For diamond thin films, the adhisive strength was measured by scrach testing machine. The adhesive strength increased with increasing the film thickness. For diamond like carbon films, the adhesive strength, hardness and friction and wear properties were mesured. The hardness was almost coincident with that of diamond film. The adhesive strength was about 40 N.The friction was less than 0.15. The wear properties was improved by coating diamond thin films.

采用微晶等离子体气相沉积技术在纯钛和低碳钢基体上制备了金刚石薄膜。采用离子镀的方法在工具钢和硬质合金表面镀上类金刚石碳膜。对金刚石薄膜，采用刮伤试验机测定其粘接强度。粘接强度随膜厚的增加而增加。测定了类金刚石碳膜的粘接强度、硬度和摩擦磨损性能。硬度与金刚石膜的硬度基本一致。粘接强度约为40 n，摩擦系数小于0.15。涂层金刚石薄膜提高了耐磨性能。

项目成果

Ri-ichi Murakami, Atsusi Kikuyama, Masaharu Kond: "Initiation Properties of Diamond Thin Film onto Pure Titanium by MWCVD" Procs.of Annual Meeting of JSMS. 183-184 (1998)

Ri-ichi Murakami、Atsusi Kikuyama、Masaharu Kond：“MWCVD 纯钛上金刚石薄膜的引发性能”JSMS 年会论文集。

村上理一,菊山敦史,近藤正春: "MNCVDによる純チタン基板へのダイヤモンド薄膜の形成特性" 日本材料学会第47期学術講演会講演論文集. 183-184 (1998)

Riichi Murakami、Atsushi Kikuyama、Masaharu Kondo：“MNCVD 纯钛基底上金刚石薄膜的形成特性”日本材料学会第 47 届学术会议论文集 183-184 (1998)。

Ri-ichi Murakami, Hirosi Tanaka, Masaharu Kondo: "On Tribological Properties of DLC Film Coated Materials by Ion Plating" Procs of Annual Meeting of JSME. No.98-5, Vol.B. 11-21-11-22 (1998)

Ri-ichi Murakami、Hirosi Tanaka、Masaharu Kondo：《论离子镀 DLC 薄膜涂层材料的摩擦学性能》JSME 年会记录。

村上理一,田中洋司,近藤正春: "イオンプーティングによるDLC膜被覆材のトライボロジー特性について" 日本機械学会材料力学部門講演会講演論文集. VolB,No98-5. 11-21,11-22 (1998)

Riichi Murakami、Yoji Tanaka、Masaharu Kondo：“离子喷镀法的 DLC 膜涂层材料的摩擦学性能”日本机械工程学会材料力学分会论文集，第 11-21,11-22 期（1998 年）。

村上理一,菊山敦史,近藤正春: "MWCVDによる純チタン基板へのダンヤモンド薄膜の形成特性" 日本材料学会第47期学術講演会講演論文集. 183-184 (1998)

Riichi Murakami、Atsushi Kikuyama、Masaharu Kondo：“MWCVD 在纯钛基底上形成 Dunyamond 薄膜的特征”日本材料学会第 47 届学术会议论文集 183-184 (1998)。