Physical Properties control of II-VI Compound Semiconductors for Blue Light-Emitting-Devices
用于蓝色发光器件的II-VI族化合物半导体的物理性能控制
基本信息
- 批准号:61550222
- 负责人:
- 金额:$ 1.34万
- 依托单位:
- 依托单位国家:日本
- 项目类别:Grant-in-Aid for General Scientific Research (C)
- 财政年份:1986
- 资助国家:日本
- 起止时间:1986 至 1987
- 项目状态:已结题
- 来源:
- 关键词:
项目摘要
Of the II-VI compounds, ZnSe and ZnS have the greatest potential for use in blue light-emitting-diodes. For device applications, it is important to control both conductive type and resistivity of these materials. We have investigated growth of acceptor doped ZnSe and donor doped ZnS films by Metalorganic Chemical Vapor Deposition (MOCVD), and obtained several important results as follows;1. Acceptor doping to ZnSe: We have examined the growth of p-type ZnSe films by using nitrogen (N) and lithium (Li) as acceptor impurtites. First, growth of N-doped ZnSe films by using NH_3 as a dopant has been carried out.It has been shown that the njtrogen atoms act as shallow acceptors in ZnSe through low-temperature photoluminescence measurements, byt some deep centers related to the nitrogen impurity are also introduced into highly N-doped films. In case of the growth of Li-doped ZnSe, cyclopentadienly Li was used as a dopant. Up until now, it has been said that Li is an amphoteric impurity in ZnSe. However, it was found that the lithium atoms incorporated into the ZnSe films act as shallow acceptors through the photoluminescence properties. Furthermore, it was also found that the intensities from deep centers related to Zn-vacancy are remarkably reduced in Li-doped ZnSe.2. Donor doping to ZnS: Growth and properties of donor doped ZnS films by MOCVD have been investigated. Trimethylaluminum and HCl were used as donor dopant sources. Both Al- and Cl- doped ZnS films with resistivity as low as about 1 .cm can be grown. Furthermore, an excitonic emission related to a shallow donor level and emission from self-activated centers are dominant peaks in the low-temperature photoluminescence spectrum.
在II-VI族化合物中,ZnSe和ZnS在蓝色发光二极管中具有最大的应用潜力。对于器件应用,重要的是控制这些材料的导电类型和电阻率。本文研究了用金属有机化学气相沉积法(MOCVD)生长受主掺杂的ZnSe和施主掺杂的ZnS薄膜,得到了以下几个重要结果:1。受主掺杂ZnSe:我们已经研究了p型ZnSe薄膜的生长,通过使用氮(N)和锂(Li)作为受主杂质。首先,用NH_3作掺杂剂生长了N掺杂的ZnSe薄膜,低温光致发光测试表明,氮原子在ZnSe中起着浅受主的作用,同时也在高N掺杂的薄膜中引入了与氮杂质有关的拜特深中心。在Li掺杂的ZnSe的生长的情况下,使用环己基Li作为掺杂剂。到目前为止,人们一直认为Li是ZnSe中的两性杂质。然而,人们发现,锂原子纳入ZnSe薄膜作为浅受体通过光致发光性能。此外,还发现Li掺杂的ZnSe中与Zn空位相关的深中心强度显著降低. ZnS的施主掺杂:本文研究了用MOCVD法生长施主掺杂ZnS薄膜及其性质。使用三甲基铝和HCl作为供体掺杂剂源。Al掺杂和Cl掺杂的ZnS薄膜都可以生长出电阻率低至1.0cm左右的薄膜.此外,与浅施主能级相关的激子发射和自激活中心的发射是低温光致发光光谱中的主要峰。
项目成果
期刊论文数量(5)
专著数量(0)
科研奖励数量(0)
会议论文数量(0)
专利数量(0)
Akihiko Yoshikawa: Journal of Crystal Growth. 86. 279-284 (1988)
吉川明彦:晶体生长杂志。
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- 影响因子:0
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- 通讯作者:
Shigeki Yamaga: "Growth of Polycrystalline CdS Films by Low-Pressure Metalorganic Chemical Vapor Deposition" Japanese Journal of Applied Physics. 26. 1002-1007 (1987)
Shigeki Yamaga:“通过低压金属有机化学气相沉积生长多晶 CdS 薄膜”,日本应用物理学杂志。
- DOI:
- 发表时间:
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- 影响因子:0
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武藤伸一郎: 電子通信学会デバイス研究会 技術報告. ED86-98. 41-46 (1986)
Shinichiro Muto:IEICE 设备研究小组技术报告。 ED86-98 (1986)。
- DOI:
- 发表时间:
- 期刊:
- 影响因子:0
- 作者:
- 通讯作者:
Akihiko Yoshikawa: "The Dependence on GrowthTemperature of Photoluminescence Properties of Nitrogen-Doped ZnSe Grown by MOCVD" Journal of Crystal Growth. 86. 279-284 (1988)
Akihiko Yoshikawa:“MOCVD 生长的氮掺杂 ZnSe 的光致发光特性对生长温度的依赖性”晶体生长杂志。
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- 影响因子:0
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YOSHIKAWA Akihiko其他文献
YOSHIKAWA Akihiko的其他文献
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{{ truncateString('YOSHIKAWA Akihiko', 18)}}的其他基金
Development of Fundamental Technologies of III-Nitride Semiconductor Optical Devices with "1-monolayer" Quantum Well Structures
“单层”量子阱结构III族氮化物半导体光器件基础技术开发
- 批准号:
23246056 - 财政年份:2011
- 资助金额:
$ 1.34万 - 项目类别:
Grant-in-Aid for Scientific Research (A)
Study on the polarity control of hexagonal-structure widegap compound semiconductors and its effect on the material control
六方结构宽禁带化合物半导体极性控制及其对材料控制的影响研究
- 批准号:
13450121 - 财政年份:2001
- 资助金额:
$ 1.34万 - 项目类别:
Grant-in-Aid for Scientific Research (B)
DEVELOPMENT OF MULTIPLY PHOTO-ASSISTED MOVPE FOR FABRICATION OF SEMICONDUCTOR BLUE LASER DIODES
开发用于制造半导体蓝色激光二极管的多重光辅助MOVPE
- 批准号:
07555411 - 财政年份:1995
- 资助金额:
$ 1.34万 - 项目类别:
Grant-in-Aid for Scientific Research (B)
A New in-situ Optical Probing Method for the Surface Reaction in Heteroepitaxy : Surface Photo-Interference
异质外延表面反应的一种新的原位光学探测方法:表面光干涉
- 批准号:
05452092 - 财政年份:1993
- 资助金额:
$ 1.34万 - 项目类别:
Grant-in-Aid for General Scientific Research (B)
Growth and Properties of (III-V)-(II-VI) Super Lattices by Photo-Assisted Atomic Layer Epitaxy
光辅助原子层外延生长和 (III-V)-(II-VI) 超级晶格的性能
- 批准号:
01460134 - 财政年份:1989
- 资助金额:
$ 1.34万 - 项目类别:
Grant-in-Aid for General Scientific Research (B)
相似海外基金
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Alexander Graham Bell Canada Graduate Scholarships - Master's
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- 批准号:
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- 批准号:
60460060 - 财政年份:1985
- 资助金额:
$ 1.34万 - 项目类别:
Grant-in-Aid for General Scientific Research (B)