Development of Nanometer Ion Probe Technology

纳米离子探针技术的发展

• 批准号: 01850089
• 负责人: NAMBA Susumu
• 金额: $ 19.01万
• 依托单位: Osaka University
• 依托单位国家: 日本
• 项目类别: Grant-in-Aid for Developmental Scientific Research (B).
• 财政年份: 1989
• 资助国家: 日本
• 起止时间: 1989 至 1990
• 项目状态: 已结题
• 来源: https://kaken.nii.ac.jp/grant/KAKENHI-PROJECT-01850089/
• 关键词: Ion beam; Focused Ion Beam; Ion Probe; RBS; Toroidal Analyzer; Damage; Semiconductor; 3 Dimensional Analysis; ナノメ-トルイオンプロ-ブ; 集速イオンビ-ム; プリスタリング; アブレ-ション

A toroidal analyzer with high resolution, consisting of multichannel plates and digital position sensitive detectors, has been designed and combined with a focused ion beam with a beam spot diameter of 1 micron. A high speed data acquisition system with CAMAC modules has also been designed and a nanometer ion probe system using RBS with the software for the system, realizing 2 or 3 dimensional nondestructive analysis was completed.Semiconductor test structures could successfully be measured and the system software was optimized to perform damage-less analysis. 3 dimensional nondestructive analysis with lateral and in-depth resolutions of 1 micron and 0.5 nanometer has been realized in this research.The high speed data acquisition system enabled to store all data from a sample by a single measurement, which could be later reconstructed by computer processing. This drastically reduced beam induced damage during measurement, which realized fast and nondestructive 3 dimensional analysis of electronic materials.

设计了一种由多通道板和数字位置灵敏探测器组成的高分辨率环形分析器，并与束斑直径为1微米的聚焦离子束相结合。设计了基于CAMAC模块的高速数据采集系统，完成了基于RBS的纳米离子探针系统及其软件，实现了二维和三维的无损分析，成功地对半导体测试结构进行了测量，并对系统软件进行了优化，实现了无损分析。本研究实现了横向和深度分辨率分别为1微米和0.5纳米的三维无损分析，高速数据采集系统能够一次性存储样品的所有数据，并可通过计算机处理进行重构。这大大减少了测量过程中的束流损伤，实现了电子材料的快速无损三维分析。

项目成果

堀野,茶谷原,木内,藤井,佐藤,高井: "Microbeam Line of MeV Heavy Ions for Materials Modification and InーSitu Analysis" Japan.J.Appl.Phys.29. 2680-2683 (1990)

Horino、Chatanihara、Kiuchi、Fujii、Sato、Takai：“用于材料改性和原位分析的 MeV 重离子微束线”Japan.J.Appl.Phys.29 (1990)。

A. Kinomura, M. Takai, T. Matsuo, S. Ujiie, S. Namba, M. Satou, M. Kiuchi and K. Fujii: ""RBS Analysis of Beam-Processed Micro Area by Focused MeV Ion Beam"" Nucl. Instr. and Meth.39. 40-42 (1989)

A. Kinomura、M. Takai、T. Matsuo、S. Ujiie、S. Namba、M. Satou、M. Kiuchi 和 K. Fujii：“通过聚焦 MeV 离子束对束加工微区域进行 RBS 分析”

A. Kinomura, M. Takai, T. Matsuo, M. Satou, A. Chayahara, and S. Namba: ""Tomography of Microstructures by Scanning Micro-RBS Probe"" Japan. J. Appl. Phys.28. 1286-1289 (1989)

A. Kinomura、M. Takai、T. Matsuo、M. Satou、A. Chayahara 和 S. Namba：“通过扫描微型 RBS 探针进行微结构断层扫描”，日本。

Y. Agawa, T. Uchiyama, A. Hoshino, H. Tsuboi, R. Fukui, K. Takagi, H. Yamakawa, T. Matsuo, M. Takai, and S. Namba: ""500 keV Ion Beam Accelerator for Microbeam Formation"" Nucl. Instr. and Methods. B45. 540-542 (1990)

Y. Akawa、T. Uchiyama、A. Hoshino、H. Tsuboi、R. Fukui、K. Takagi、H. Yamakawa、T. Matsuo、M. Takai 和 S. Namba：“”500 keV 微束离子束加速器

H. Sanda, M. Takai, S. Namba, A. Chayahara, and M. Satou,: ""MeV Ion-Beam Induced Localized Enhancement of Magnetic Property in Stainless Steel Foil"" Nucl. Instr. and Methods.

H. Sanda、M. Takai、S. Namba、A. Chayahara 和 M. Satou，“MeV 离子束诱导不锈钢箔中磁性的局部增强”Nucl。