Development of Nanometer Ion Probe Technology

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A toroidal analyzer with high resolution, consisting of multichannel plates and digital position sensitive detectors, has been designed and combined with a focused ion beam with a beam spot diameter of 1 micron. A high speed data acquisition system with CAMAC modules has also been designed and a nanometer ion probe system using RBS with the software for the system, realizing 2 or 3 dimensional nondestructive analysis was completed.Semiconductor test structures could successfully be measured and the system software was optimized to perform damage-less analysis. 3 dimensional nondestructive analysis with lateral and in-depth resolutions of 1 micron and 0.5 nanometer has been realized in this research.The high speed data acquisition system enabled to store all data from a sample by a single measurement, which could be later reconstructed by computer processing. This drastically reduced beam induced damage during measurement, which realized fast and nondestructive 3 dimensional analysis of electronic materials.