课题基金 / 基金详情

Light-Emitting Mechanism of Rare-Earth Doped III-V Compound Semiconductor and the Light-Emitting Devices of Carrier Injection Type

Light-Emitting Mechanism of Rare-Earth Doped III-V Compound Semiconductor and the Light-Emitting Devices of Carrier Injection Type
稀土掺杂III-V族化合物半导体的发光机理及载流子注入型发光器件
批准号:
03650022
负责人:
UEKUSA Shin-ichiro
金额:
$1.15万
依托单位:
依托单位国家:
日本
项目类别:
Grant-in-Aid for General Scientific Research (C)
财政年份:
1991
资助国家:
日本
项目状态:
已结题
起止时间:
1991 至 1992

项目摘要

项目成果

相似基金

相关文献

中文摘要
翻译
研究了稀土掺杂的III-V化合物半导体和Si的光致发光(PL)和电致发光(EL)光谱,以阐明用液相外延(LPE)、热扩散和离子注入三种方法制备的样品的发光机理。我们观察到了与稀土原子内部4f-4f跃迁有关的特殊峰的发光光谱(与半导体的光学性质或能带结构无关)。稀土掺杂的III-V化合物半导体系统是一种很有前途的新型光电子器件和电致发光器件如激光二极管和发光二极管的材料。1.液相外延(LPE)通过测量不同Yb化合物如YbF_3、YbP在GaAs中的发光或电致发光,获得了约1000 nm的与Yb^<3>有关的发光。对于EL样品,可以通过载流子注入激发出GaAs中的稀土。与InP:YbCl_3相比,与Yb^<3>有关的发射相对较宽,这是因为Yb^<3>在GaAs中形成了具有某些缺陷或杂质的复杂中心。2热扩散InP:Yb和Si;Er离子在1540 nm附近发光,光致发光激发光谱(PLE)光谱由Er^<3和Gt;离子直接激发产生的尖峰组成。对于InP:InP:Yb和Si;Er离子在InP:Yb和Si;Er中表现出强烈的稀土相关发光,当Yb和Si;Er被InP带隙以下的光子能量激发时,Yb>离子被InP带隙以下的光子激发时,Yb>3>相关发射很强,因为新的有效能量转移过程是通过缺陷能级向Yb^<3>离子转移的。
英文摘要
Photoluminescence (PL) and electroluminescence (EL) spectra of rare earth doped III-V compound semiconductors and Si were investigated in order to clear the light emitting mechanism of the samples prepared by three methods such as liquid-phase epitaxy (LPE), thermal diffusion and ion-implantaion. We observed the luminescence spectra with peculiar peaks which are related to the internal 4f-4f transitions of the rare earth atoms, (which are independent of the optical properties or the band structure of semiconductor). The rare earth doped III-V compound semiconductor systems are promising materials for a new type of optoelectronic devices and EL devices such as laser diode and light-emitting diode. The following results were obtained.1 Liquid-phase epitaxy (LPE)The Yb^<3+>-related luminescence around 1000nm was obtained through the PL or EL measurements from different Yb compounds as YbF_3,YbP in GaAs.For EL samples, the rare earth in GaAs can be excited by carrier injection.The Yb^<3+>-related emission of GaAs : YbF_3 and GaAs : YbP was relatively broad compared with InP : YbCl_3 because the Yb^<3+> forms complex centers with some defects or impurities in GaAs.2 Thermal diffusionThe Er^<3+>-related luminescence around 1540nm was obtained from the Er^<3+>ions in Si, and the photoluminescence excitation spectroscopy (PLE) spectra consisted of sharp peaks which were caused by the direct excitation of Er^<3+>ions.For InP : Er, Er^<3+>-related luminescence was not observed.3 Ion-implantationInP : Yb and Si ; Er showed intense rare-earth related emission compared with LPE and a thermal diffusion.For InP : Yb, when Yb^<3+>ion was excited by the photon energy below the InP-band-gap, Yb^<3+>-related emssion was strong because the new efficient energy transfer processes to Yb^<3+> ions occurred through the defect energy levels.
期刊论文(39)
专著(0)
科研奖励(0)
会议论文
Shin-ichiro Uekusa et al.: "Optical Activity of Yb^<3+> in MeV Ion-Implanted InP" Materials Research Society,Symp.Proc.(1993)
Shin-ichiro Uekusa 等人:“MeV 离子注入 InP 中 Yb^<3> 的光学活性”材料研究学会,Symp.Proc.(1993)
DOI: --
发表时间:
期刊:
影响因子: --
作者: []
通讯作者:
Akihiko Majima et al.: "Optical Direct and Indirect Excitation of Er^<3+> Ions in Silicon" Materials Research Society,Symp.Proc.(1993)
Akihiko Majima 等人:“硅中 Er^<3> 离子的光学直接和间接激发”材料研究学会,Symp.Proc.(1993)
DOI: --
发表时间:
期刊:
影响因子: --
作者: []
通讯作者:
DOI: --
发表时间:
期刊:
影响因子: --
作者: []
通讯作者:
真島 晃彦: "GaAs:YbF_3およびGaAs:YbPエピタキシャル層の光学的・電気的性貭" 明治大学理工学部研究報告. 5. 13-19 (1992)
真岛明彦:“GaAs:YbF_3 和 GaAs:YbP 外延层的光学和电学特性”明治大学理工学院研究报告 5. 13-19 (1992)。
DOI: --
发表时间:
期刊:
影响因子: --
作者: []
通讯作者:
39
    海外基金