Light-Emitting Mechanism of Rare-Earth Doped III-V Compound Semiconductor and the Light-Emitting Devices of Carrier Injection Type
Light-Emitting Mechanism of Rare-Earth Doped III-V Compound Semiconductor and the Light-Emitting Devices of Carrier Injection Type
批准号:
03650022
负责人:
UEKUSA Shin-ichiro
金额:
$1.15万
依托单位:
依托单位国家:
日本
项目类别:
Grant-in-Aid for General Scientific Research (C)
财政年份:
1991
资助国家:
日本
项目状态:
已结题
起止时间:
1991 至 1992
中文摘要
研究了稀土掺杂III-V化合物半导体和Si的光致发光(PL)和电致发光(EL)光谱,以明确液相外延(LPE)、热扩散和离子注入三种方法制备的样品的发光机理。我们观察到与稀土原子内部4f-4f跃迁有关的特殊峰(与半导体的光学性质或能带结构无关)的发光光谱。稀土掺杂III-V化合物半导体体系是一种很有前途的新型光电子器件和EL器件,如激光二极管和发光二极管。得到了以下结果液相外延(LPE)通过对不同的Yb化合物如YbF_3,YbP在GaAs中进行PL或EL测量,获得了Yb^<3+>在1000nm左右的相关发光。对于EL样品,GaAs中的稀土可以通过注入载流子激发。与InP: YbCl_3相比,GaAs: YbP和GaAs: YbP的Yb^<3+>相关发射相对较宽,这是因为Yb^<3+>在GaAs中形成了复杂的中心,带有一些缺陷或杂质Si中的Er^<3+>离子产生1540nm左右的Er^<3+>相关发光,其光致发光激发光谱(PLE)由Er^<3+>离子直接激发产生的尖峰组成。对于InP: Er,未观察到Er^<3+>相关发光离子注入inp: Yb和Si;与LPE相比,Er表现出强烈的稀土相关发射和热扩散。对于InP: Yb,当Yb^<3+>离子被InP带隙以下的光子能量激发时,Yb^<3+>相关发射较强,这是因为通过缺陷能级发生了向Yb^<3+>离子的新的有效能量转移过程。
英文摘要
Photoluminescence (PL) and electroluminescence (EL) spectra of rare earth doped III-V compound semiconductors and Si were investigated in order to clear the light emitting mechanism of the samples prepared by three methods such as liquid-phase epitaxy (LPE), thermal diffusion and ion-implantaion. We observed the luminescence spectra with peculiar peaks which are related to the internal 4f-4f transitions of the rare earth atoms, (which are independent of the optical properties or the band structure of semiconductor). The rare earth doped III-V compound semiconductor systems are promising materials for a new type of optoelectronic devices and EL devices such as laser diode and light-emitting diode. The following results were obtained.1 Liquid-phase epitaxy (LPE)The Yb^<3+>-related luminescence around 1000nm was obtained through the PL or EL measurements from different Yb compounds as YbF_3,YbP in GaAs.For EL samples, the rare earth in GaAs can be excited by carrier injection.The Yb^<3+>-related emission of GaAs : YbF_3 and GaAs : YbP was relatively broad compared with InP : YbCl_3 because the Yb^<3+> forms complex centers with some defects or impurities in GaAs.2 Thermal diffusionThe Er^<3+>-related luminescence around 1540nm was obtained from the Er^<3+>ions in Si, and the photoluminescence excitation spectroscopy (PLE) spectra consisted of sharp peaks which were caused by the direct excitation of Er^<3+>ions.For InP : Er, Er^<3+>-related luminescence was not observed.3 Ion-implantationInP : Yb and Si ; Er showed intense rare-earth related emission compared with LPE and a thermal diffusion.For InP : Yb, when Yb^<3+>ion was excited by the photon energy below the InP-band-gap, Yb^<3+>-related emssion was strong because the new efficient energy transfer processes to Yb^<3+> ions occurred through the defect energy levels.
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Shin-ichiro Uekusa et al.: "Optical Activity of Yb^<3+> in MeV Ion-Implanted InP" Materials Research Society,Symp.Proc.(1993)
Shin-ichiro Uekusa 等人:“MeV 离子注入 InP 中 Yb^<3> 的光学活性”材料研究学会,Symp.Proc.(1993)
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Akihiko Majima et al.: "Optical Direct and Indirect Excitation of Er^<3+> Ions in Silicon" Materials Research Society,Symp.Proc.(1993)
Akihiko Majima 等人:“硅中 Er^<3> 离子的光学直接和间接激发”材料研究学会,Symp.Proc.(1993)
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Ken-ichiro Ootake et al.: "Photoluminescence of MeV erbium-implanted Silicon" Extended Abstracts (The 40th Spring Meeting, 1993) ; The Japan Society of Applied Physics and Related Societies. No.3. 792 (1993)
Ken-ichiro Ootake 等人:“MeV 铒注入硅的光致发光”扩展摘要(第 40 届春季会议,1993 年);
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真島 晃彦: "GaAs:YbF_3およびGaAs:YbPエピタキシャル層の光学的・電気的性貭" 明治大学理工学部研究報告. 5. 13-19 (1992)
真岛明彦:“GaAs:YbF_3 和 GaAs:YbP 外延层的光学和电学特性”明治大学理工学院研究报告 5. 13-19 (1992)。
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Tsutomu Iida et al.: "Characterization of Novel Emission Lines in Mg^+ -Implanted InP" Materials Research Society,Fall Meeting. 24- (1991)
Tsutomu Iida 等人:“Mg^2-注入 InP 中新型发射线的表征”材料研究协会,秋季会议。
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