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A Study on Y Oxide High-Temperature Superconducting Thin Film Deposition by Pulsed Arc Plasma Discharges

A Study on Y Oxide High-Temperature Superconducting Thin Film Deposition by Pulsed Arc Plasma Discharges
脉冲电弧等离子体放电Y氧化物高温超导薄膜沉积研究
批准号:
04555062
负责人:
SUDA Yoshiaki
金额:
$2.05万
依托单位国家:
日本
项目类别:
Grant-in-Aid for Developmental Scientific Research (B)
财政年份:
1992
资助国家:
日本
项目状态:
已结题
起止时间:
1992 至 1994

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中文摘要
翻译
脉冲电弧等离子体法具有沉积速率快、化学计量比与体材料相当、可原位晶化和低温制备等优点,是一种新型的超导薄膜制备方法。采用脉冲电弧等离子体放电和离轴磁控溅射技术,<7-X>在MgO(100)和SrTiO 3(100)衬底上溅射YBa_2Cu_3O_2体靶并存款YBaCuO薄膜。为了制备高质量的YBaCuO薄膜,研究了等离子体特性和薄膜特性。脉冲电弧等离子体放电法沉积的薄膜几乎化学计量组成。采用发射光谱技术监测工艺等离子体状态, ...更多信息 确认身份并估算了激发温度。实验结果表明,脉冲电弧等离子体放电法是制备YBaCuO超导薄膜的一种简单、廉价、有效的方法,并采用KrF脉冲激光沉积法(PLD)在柔性衬底上制备了YBaCuO超导薄膜。YBaCuO/YSZ/金属薄膜的c轴取向由YSZ缓冲层的取向控制。采用有限元法求解一维热传导方程,对激光辐照超导薄膜进行了数值研究。采用脉冲YAG激光沉积法制备了立方氮化硼薄膜,可作为YBaCuO薄膜的涂层。对脉冲电弧等离子体放电产生的电磁噪声进行了测量,对脉冲电弧等离子体和脉冲激光等脉冲过程进行了研究,将得到新的良好结果。这对脉冲过程的科学研究和工业生产具有重要意义。少
英文摘要
Since the discovery of high Tc oxide superconductors, there have been enormous interest and efforts to develop superconducting thin films for electronic applications including high sensitive magnetic field detector, switching device and a Josephson device.A pulsed arc plasma discharge method has the advantage of high deposition rate, chemicall stoichiometry equal to a bulk (target) material and possibility of in situ crystallization and low temperature process. The pulsed arc plasma discharge and the off-axis magnetron sputtering were applied to sputter YBa_2Cu_3O_<7-X> bulktargets and deposit YBaCuO thin films on MgO (100) and SrTiO_3 (100) substrates without heating. The plasma properties and the film characteristics were investigated to prepare the high-quality YBaCuO thin films. The films deposited by the pulsed arc plasma discharge method had almost stoichiometric composition. Optical emission spectroscopy was used to monitor the process plasma state and many spectral lines were i … More dentified. And the excitation temperature were estimated. Our experiments show that the pulsed arc plasma discharge method is simple, inexpensive and effective technique to fabricate YBaCuO superconducting thin films.A preparation of YBaCuO thin film on a flexible substrate with YSZ buffer layr by KrF pulsed laser deposition (PLD) was also investigated. The c-axis arraignment of the YBaCuO/YSZ/metal films was controlled by the orientation of the YSZ buffer layr. And laser-irradiated superconducting thin films were studied numerically by solving the one-dimensional heat conduction equation by means of the finite element method. Cubic BN films which might be coating films of YBaCuO thin films were prepared by pulsed YAG laser deposition. The electromagnetic noise caused by pulsed arc plasma discharge was also measured.We will get new good results from the pulsed process including pulsed arc plasma and pulsed laser. It might be very important to study the pulsed process scientifically and industrially. Less
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Y. Suda: "Development of a Pulsed Arc Plasma Process for Preparation of YBaCuO Thin Films" Proceedings of the 5th ACED-92. 157-160 (1992)
Y. Suda:“用于制备 YBaCuO 薄膜的脉冲电弧等离子体工艺的开发”第五届 ACED-92 论文集。
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須田 義昭: "パルスYAGレーザアブレッションによる窒化崩素薄膜作製と分光分析" 電気学会放電,誘電・電気材料合同研究会. ED-95-24. 81-90 (1995)
Yoshiaki Suda:“脉冲 YAG 激光烧蚀氮化氮薄膜的制备和光谱分析”IEEJ 放电、电介质和电气材料联合研究组 ED-95-90 (1995)。
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共 29 条
    Fabrication of organic electro-luminescence thin films using low temperature electron ablation method
    • 批准号:
      22540510
    • 项目类别:
      Grant-in-Aid for Scientific Research (C)
    • 资助金额:
      $2.75万
    • 财政年份:
      2010
    • 负责人:
      SUDA Yoshiaki
    • 依托单位:
    Development of Indoor Environmental Improvement System by Using Nano Structural High Sensitivity Thin Film Gas Sensor
    • 批准号:
      14350153
    • 项目类别:
      Grant-in-Aid for Scientific Research (B)
    • 资助金额:
      $4.74万
    • 财政年份:
      2002
    • 负责人:
      SUDA Yoshiaki
    • 依托单位:
    Development of High Selective and High Sensitive Air Gas Sensor for Environmental Protection by PLD Method
    • 批准号:
      13555098
    • 项目类别:
      Grant-in-Aid for Scientific Research (B)
    • 资助金额:
      $3.78万
    • 财政年份:
      2001
    • 负责人:
      SUDA Yoshiaki
    • 依托单位:
    Development of Carbon Nitride (CN) Thin Film Preparation Process by Pulsed Laser Deposition
    • 批准号:
      10555108
    • 项目类别:
      Grant-in-Aid for Scientific Research (B).
    • 资助金额:
      $3.78万
    • 财政年份:
      1998
    • 负责人:
      SUDA Yoshiaki
    • 依托单位:
    国内基金
    海外基金
    高温超导YBaCuO薄膜及其涂层导体的厚度效应研究
    • 批准号:
      11174193
    • 项目类别:
      面上项目
    • 资助金额:
      62.0万元
    • 批准年份:
      2011
    • 负责人:
      蔡传兵
    • 依托单位:
    快中子辐照超导体YBACUO改性机理的正电子湮没研究