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Supwe-flat (411) A hetero.

Supwe-flat (411) A hetero.
Supwe-平 (411) 异性恋。
批准号:
06402040
负责人:
HIYAMIZU Satoshi
金额:
$18.18万
依托单位:
依托单位国家:
日本
项目类别:
Grant-in-Aid for General Scientific Research (A)
财政年份:
1994
资助国家:
日本
项目状态:
已结题
起止时间:
1994 至 1995

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中文摘要
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英文摘要
We have investigated properties of (411) A super-flat interfaces [atomically flat interfaces over a macroscopic area (1 cm x 1 cm)] not only in GaAs/AlGaAsheterostructures on GaAs substrates but also in other III-V systems such as pseudomorphic InGaAs/AlGaAs heterostructures on GaAs substrates and InGaAs/InAlAs heterostructurs lattice-matched to InP substrates grown by molecular beam epitaxy (MBE).We achieved the (411) A super-flat interfaces in GaAs/Al_xGa_<1-x>As quantum wells (QWs) with high Al content (x=0.3-1) by optimizing MBE growth conditions. Furthermore, GaAs/AlGaAs double barrier resonant tunneling (DBRT) structures were grown on (411) A GaAs substrate as an application of (411) A super-flat interfaces to quantum effect devices, and we obtained excellent device performance of much improved peak-to-valley current ratio compared with a conventional (100) GaAs/AlGaAs DBRT structure. Next, we realized the (411) A super-flat interfaces in pseudomorphic In_xGa_<1-x>As/Al_<0.3>Ga_<0.7>As QWs with In content of x=0-0.08 grown on (411) GaAs substrates. In the study of (411) A InGaAs/InAlAs QW structures lattice-matched to InP substrates, we obtained high crystal quality of In_<O.53>Ga_<0.47>As films grown on (411) A InP substrates, but we could not observeexcellent optical properties of (411) A In_<0.53>Ga_<0.47>As/In_<0.52>Al_<0.48>As QWs with the super-flat interfaces because of rather low crystal quality of In_<0.52>Al_<0.48>As barriers. By further optimizing MBE growth conditions for (411) A InGaAs/In AlAs QWs, we expect to obtain the (411) A super-flat interfaces in the InGaAs/InAlAs system lattice-matched InP substrates.In summary, we studied properties of the (411) A super-flat interfaces in III-V semiconductor heterostructures and showed their high potential for applications to quantum effect devices.
期刊论文(20)
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D.Marx: "Low temperature etching of GaAs substrates and improved morphology of GaAs grown by metalorganic molecular beam epitaxy" J.Cryst.Growth. 150. 551-556 (1995)
D.Marx:“GaAs 衬底的低温蚀刻和通过金属有机分子束外延生长的 GaAs 的改进形态”J.Cryst.Growth。
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通讯作者:
D.Marx: "Metalorganic molecular beam epitaxy of GaSb on patterned GaSb substrates using triethylgallium and Sb_4" J.Cryst.Growth. 150. 874-878 (1995)
D.Marx:“使用三乙基镓和 Sb_4 在图案化 GaSb 基板上进行 GaSb 金属有机分子束外延”J.Cryst.Growth。
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通讯作者:
D.Marx: "Low temperature etching of GaAs substrates and improved morphology of GaAs grown by metalorganic molecular beam epitaxy using trisdimethy laminoarsenic and triethylgallium" J.Cryst.Growth. 150. 551-556 (1995)
D.Marx:“GaAs 衬底的低温蚀刻和使用三二甲基氨基砷和三乙基镓通过金属有机分子束外延生长的 GaAs 的形态改善”J.Cryst.Growth。
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通讯作者:
K.Shinohara: "Electrical properties of Si-doped GaAs layers grown on (411)A GaAs substrates by molecular beam epitaxy" Semicond.Sci.& Technol.11. 125 (1996)
K.Shinohara:“通过分子束外延在 (411)A GaAs 衬底上生长的 Si 掺杂 GaAs 层的电特性”Semicond.Sci。
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