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US-Ireland Joint R&D Partnership: Strained Engineered Germanium Quantum-Well Laser on GaAs and Si for Optical Coherence Tomography

US-Ireland Joint R&D Partnership: Strained Engineered Germanium Quantum-Well Laser on GaAs and Si for Optical Coherence Tomography
美国-爱尔兰联合R
批准号:
2042079
负责人:
Mantu Hudait
金额:
$39.08万
依托单位国家:
美国
项目类别:
Standard Grant
财政年份:
2021
资助国家:
美国
项目状态:
已结题
起止时间:
2021-08-15 至 2024-07-31

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中文摘要
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英文摘要
Optical-coherence-tomography (OCT) is a powerful technique with a wide range of applications, from imaging live tissue to non-destructive industrial testing. Coherent light sources for OCT in the short wave infra-red (SWIR) wavelength can achieve much higher resolution with wider bandwidth and penetration in opaque living tissue, such as, brain and lung tissues. However, there is a lack of SWIR sources with the combined intensity and bandwidth to further enhance the OCT performance. The continued development of affordable and compact coherent light sources in this spectral range is important in many areas of modern technology. The combination of different semiconducting materials and light source architectures offers new paths for highly efficient SWIR sources at reduced cost. The central thrust of the proposed collaborative research is to investigate the design of germanium (Ge) based coherent light sources, with heterogeneous integration of InGaAs/Ge/InGaAs quantum-well structures on GaAs and large area, cost-effective Si substrates. Our objective is to develop tunable SWIR light sources capable of significantly higher penetration depth, image contrast and resolution than available from existing light sources, which will benefit a wide range of important medical, industrial and consumer applications.To demonstrate the viability of the proposed approach, several key technical and scientific challenges must be addressed, including: (i) design and numerical simulation of the proposed strained ε-Ge-based quantum-well (QW) device architectures; (ii) materials synthesis and analysis of InGaAs/ε-Ge/InGaAs QW heterostructures on GaAs and Si using III-V strain template for modified bandgap of Ge; (iii) fabrication and demonstration of ε-Ge QW coherent light sources in wavelength ranges from 1.7 μm to 2.5 μm on GaAs; and (iv) implementation of an integration scheme on large area, cost-effective Si substrates. An international partnership of scientific groups from USA, Ireland and Norther Ireland brings together a synergistic mix of expertise and specialized facilities in materials science, semiconductor fabrication, test and simulation. To address (ii), (iii), and (iv), the proposed research will utilize the state-of-the-art in-house epitaxial growth (interconnected group-IV and III-V molecular beam epitaxy chambers), collaborative materials characterization and simulation (e.g., high-resolution x-ray diffraction, transmission electron microscopy, photoluminescence spectroscopy, deep level transient spectroscopy, and electronic band structure simulation), and in-house/partner fabrication facilities. To address (i), a combination of numerical simulations and electronic structure theory will be leveraged to develop experimentally-calibrated InGaAs/ε-Ge/InGaAs QW device models necessary for broadband light emission in SWIR range. By investigating these topics, this research will elucidate numerous as-of-yet unexplored avenues of fundamental research, including: (a) the amount of strain and doping density in Ge to optical gain and emission wavelength; (b) the role of Ge layer thickness as a function of strain to optical gain; (c) the reduction of current density arising from non-radiative recombination; (d) the threshold current density with amount of strain in Ge; and (e) the realization of device-quality epitaxial Ge QW heterostructures on Si through minimization of dislocations and anti-phase domains in in-situ III-V buffer architectures on Si. Through a comprehensive examination and understanding of the above challenges, this research will establish a pathway to achieving new high performance coherent light sources in the little explored SWIR spectral range that will benefit society as well as industry via medical imaging and non-destructive testing. Furthermore, this international scientific partnership allows for a comprehensive project that trains and mentors students in the field of photonics and nanotechnology through exchange programs. The outcomes of the proposed research results will be disseminated to public through National Science Foundation and lay a foundation for continued and growing US-Ireland collaboration.This award reflects NSF's statutory mission and has been deemed worthy of support through evaluation using the Foundation's intellectual merit and broader impacts review criteria.
期刊论文(6)
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DOI: 10.1103/physrevapplied.18.064083
发表时间: 2022
期刊: Physical Review Applied
影响因子: 4.6
作者: [Clavel, M.B., Murphy-Armando, F., Xie, Y., Henry, K.T., Kuhn, M., Bodnar, R.J., Khodaparast, G.A., Smirnov, D., Heremans, J.J., Hudait, M.K.]
通讯作者: Hudait, M.K.
DOI: 10.1039/d3tc01018j
发表时间: 2023-06-21
期刊: JOURNAL OF MATERIALS CHEMISTRY C
影响因子: 6.4
作者: [Karthikeyan,Sengunthar, Joshi,Rutwik, Hudait,Mantu K.]
通讯作者: Hudait,Mantu K.
Temperature and doping-dependent interplay between the direct and indirect optical response in buffer-mediated epitaxial germanium
缓冲介导的外延锗中直接和间接光学响应之间的温度和掺杂依赖性相互作用
DOI: --
发表时间: 2022
期刊: Optical materials
影响因子: 3.9
作者: [Mantu K. Hudait, Michael Meeker]
通讯作者: Mantu K. Hudait, Michael Meeker
Interplay Between Strain and Thickness on the Effective Carrier Lifetime of Buffer-Mediated Epitaxial Germanium Probed by the Photoconductance Decay Technique
通过光电导衰减技术探测缓冲介导的外延锗的有效载流子寿命的应变和厚度之间的相互作用
DOI: 10.1021/acsaelm.3c00256
发表时间: 2023
期刊: ACS Applied Electronic Materials
影响因子: 4.7
作者: [Bhattacharya, Shuvodip, Johnston, Steven W., Datta, Suman, Hudait, Mantu K.]
通讯作者: Hudait, Mantu K.
Collaborative Research: Planning Grant: I/UCRC for Next Generation Nanomaterial and Device Engineering (NGeNE)
US-Ireland R&D Partnership: Si-compatible, Strain Engineered Staggered Gap Ge(Sn)/InxGa1-xAs Nanoscale Tunnel Field Effect Transistors
EAGER: Silicon-compatible, Crystallographic Oriented Epitaxial Germanium for New Generation of Metal-oxide Semiconductor Field-effect Transistors
Collaborative: Mixed Anion and Cation Based Transistor Architecture for Ultra-Low Power Complementary Logic Applications
国内基金
海外基金
关于不对称去芳香化反应/Ireland-Claisen重排反应的研究:构筑手性吲哚啉衍生物
  • 批准号:
    22001177
  • 项目类别:
    青年科学基金项目
  • 资助金额:
    24.0万元
  • 批准年份:
    2020
  • 负责人:
    刘杨斌
  • 依托单位: