Fabrication of novel monolithic optical devices composed of blue laser diodes and ferroelectric optical waveguides
Fabrication of novel monolithic optical devices composed of blue laser diodes and ferroelectric optical waveguides
批准号:
10650005
负责人:
MASUDA Atsushi
金额:
$2.56万
依托单位国家:
日本
项目类别:
Grant-in-Aid for Scientific Research (C)
财政年份:
1998
资助国家:
日本
项目状态:
已结题
起止时间:
1998 至 1999
中文摘要
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英文摘要
In order to develop novel monolithic optical devices composed of blue laser diodes and ferroelectric optical waveguides, ferroelectric lead zirconate titanate (PZT) films were deposited on gallium nitride (GaN). PZT films were deposited by pulsed laser ablation on cubic GaN prepared on (001) GaAs by metalorganic vapor phase epitaxy for the first time. PZT films were preferentially [100] oriented on GaN with MgO buffer layers although PZT films were randomly oriented without MgO buffer layer. The origin for the difference is thought that MgO buffer layer acts as a diffusion barrier between PZT and GaN.Relationship between the crystallinity and the resistance against oxidation was also studied. It was found that GaN with lower crystallinity shows higher resistivity. It was also revealed that the crystallinity degrades and the surface roughness decreases both with an exposure to oxygen atmosphere around 500 ℃.
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A.Hashimoto, H.Wada, T.Ueda, Y.Nishio, A.Masuda and A.Yamamoto: "Mixing mechanism of h-GaN in c-GaN growth on GaAs (001) substrates"Physica Status Solidi (a). Vol.176. 519-524 (1999)
A.Hashimoto、H.Wada、T.Ueda、Y.Nishio、A.Masuda 和 A.Yamamoto:“GaAs (001) 衬底上 c-GaN 生长中 h-GaN 的混合机制”Physica Status Solidi (a)。
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A.Morimoto, T.Shimizu 他3名: "Effect of nitrogen gas on preparation of Ti-Al-N thin films by pulsed laser ablation" Applied Surface Science. 127-129巻. 994-998 (1998)
A.Morimoto、T.Shimizu 等 3 人:“氮气对脉冲激光烧蚀制备 Ti-Al-N 薄膜的影响”,《应用表面科学》第 127-129 卷(1998 年)。
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A.Morimoto,T.Shimizu他3名: "LPE-like growth of YIG ferrimagnetic thin films by pulsed laser ablation with molten droplets"Applied Physics A. 69. S703-S706 (1999)
A.Morimoto、T.Shimizu 和其他 3 人:“通过脉冲激光烧蚀熔滴实现 YIG 亚铁磁薄膜的 LPE 状生长”应用物理学 A. 69. S703-S706 (1999)
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A.Hasimoto,A.Masuda 他3名: "Suppression of hexagonal GaN mixing by As_4 molecular beam in cubic GaN growth on GaAs(001) substrates"Journal of Crystal Growth. 201/202巻. 392-395 (1999)
A. Hasimoto、A. Masuda 和其他 3 人:“GaAs(001) 衬底上立方 GaN 生长中 As_4 分子束对六方 GaN 混合的抑制”《晶体生长杂志》第 201/202 卷(1999 年)。
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Atsushi Masuda 他5名: "Novel deposition technique of Er-doped a-Si:H combining catalytic CVD and pulsed laser ablation"Journal of Non-Crystalline Solids. (印刷中). (2000)
Atsushi Masuda 和其他 5 人:“结合催化 CVD 和脉冲激光烧蚀的掺铒 a-Si:H 的新型沉积技术”非晶固体杂志(2000 年)。
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