Control of mechanical properties of micro-material

微材料机械性能的控制

• 批准号: 10650258
• 负责人: KOTERA Hidetoshi
• 金额: $ 2.5万
• 依托单位: KYOTO UNIVERSITY
• 依托单位国家: 日本
• 项目类别: Grant-in-Aid for Scientific Research (C)
• 财政年份: 1998
• 资助国家: 日本
• 起止时间: 1998 至 1999
• 项目状态: 已结题
• 来源: https://kaken.nii.ac.jp/grant/KAKENHI-PROJECT-10650258/
• 关键词: MEMS; MECHANICAL PROPERTIES; TENSILTE TEST; DIFFUSION; MULTI LAYERED MATERIAL; MEMBRANE DEFLECTION; THICKNESS; GENETIC ALGORITHM; AES; Dynamic Response; FEM; 解析; 拡散

1) We measure the thickness of the diffusion layer and the distribution of atoms by Auger electron spectroscopy (AES) and investigate the effect of fabrication process on the diffusion layer. We chose Al and SiOィイD22ィエD2 thin films deposited on a silicon wafer, since SiOィイD22ィエD2 and Al thin films are commonly used for the MEMS. In practice, SiOィイD22ィエD2 thin film is used as a dielectric layer, that is, SiOィイD22ィエD2 is sandwiched between an electrode or wiring and the other material. The SiOィイD22ィエD2 film is also employed as the material for masking or etch-stop layer, and therefore, it works as a structure, that is, substrate for diaphragms or cantilevers. On the other hand, Al is used as an electrode or wiring.In the fabrication process of MEMS, the thin films may be subjected to heat treatment : annealing is carried out to reduce residual stress in the films; when additional material is deposited, the substrate should be heated. In this study, we examine the distribution of atoms th … More in films of Al and SiOィイD22ィエD2 and silicon wafer by AES, and we discuss the effect of heat treatment on the distribution of the atoms.2) We propose a new tensile test method. A prefabricated test substrate on which a thin film is deposited is developed. The concept of our method is as follows. First, on a silicon substrate, gage portion is prefabricated by the surface micro-machining such as a photolithography and wet etching. After fabricating the test substrate, tensile test is performed to measure Young's modulus of the test substrate. Second, the thin film we are concerned is deposited on the prefabricated test substrate. Finally, the tensile test is again carried out. Young's modulus of the thin film can be measured by subtracting the effect of Young's modulus of the prefabricated test substrate. For the purpose of this, we also develop a new tensile test equipment and a test substrate holder. We discuss the viability of this method for measuring the mechanical properties of deposited thin film.3) We make clear the effect of internal mechanical strain on the thin film properties. By controlling the strain of thin film, we can control the electromechanical properties of thin film for MEMS.4) A simulation method for optimizing dynamic of micro-electro-mechanical devices and systems (MEMS) is proposed. A series of equations of electrostatic field, fluid dynamics and deflection of micro-membrane are coupled and solved simultaneously. Since the genetic algorithm is appropriate to reduce the searching space of solution, the genetic algorithm is used to optimize the thickness distribution of a micro-membrane. As an application of the developed method, the thickness distribution of the micro-membrane of a micro air pump is optimized. It is shown that the thickness distribution relates to the distribution of bending strain of the micro-membrane. Less

1)我们用俄歇电子能谱（AES）测量了扩散层的厚度和原子的分布，并研究了制备工艺对扩散层的影响。我们选择了Al和SiO_xD_22_xD_2薄膜沉积在硅晶片上，因为SiO_xD_22_xD_2和Al薄膜通常用于MEMS。实际上，使用SiO_xO_22_xO_22薄膜作为介电层，即，SiO_xO_22_xO_22_xO_22夹在电极或布线与其它材料之间。该SiO ↓ [2] O ↓ [2] D ↓ [22] O ↓ [2] D ↓ [2]膜还用作掩模或蚀刻停止层的材料，因此，它用作一种结构，即，用于振动膜或杠杆的基板。在MEMS的制造过程中，薄膜可能会受到热处理：进行退火以减少薄膜中的残余应力;当沉积额外的材料时，应加热衬底。在这项研究中，我们研究了原子的分布， ...更多信息 利用俄歇电子能谱（AES）对Al、SiO_xD_22、SiO_xD_2薄膜和硅片中的原子分布进行了研究，并讨论了热处理对原子分布的影响。2）提出了一种新的拉伸测试方法。将其上沉积有薄膜的预制测试衬底显影。我们的方法的概念如下。首先，在硅衬底上，通过表面微加工如光刻和湿法蚀刻来预制计量部分。在制造测试基板之后，进行拉伸测试以测量测试基板的杨氏模量。第二，我们所关注的薄膜沉积在预制的测试基板上。最后，再次进行拉伸试验。薄膜的杨氏模量可以通过减去预制测试基板的杨氏模量的影响来测量。为此，我们还开发了一种新的拉伸试验设备和一个测试基板保持器。我们讨论了这种方法测量沉积薄膜机械性能的可行性。3）我们明确了内部机械应变对薄膜性能的影响。通过控制薄膜的应变，可以控制MEMS薄膜的机电性能。4）提出了一种微机电器件与系统（MEMS）动态优化的仿真方法。将静电场方程、流体动力学方程和微膜变形方程耦合起来，同时求解。由于遗传算法能够有效地减小解的搜索空间，因此将遗传算法用于微膜厚度分布的优化。作为该方法的应用，对微型气泵的微膜厚度分布进行了优化。结果表明，微膜的厚度分布与弯曲应变的分布有关。少

项目成果

Hidetoshi Kotera: "A study of the effect of the fabrication process on diffusion in a layered thin film"Microsystim Technologies. Vol.5, No.4.. 169-172 (1999)

Hidetoshi Kotera：“制造工艺对层状薄膜扩散影响的研究”Microsysstim Technologies。

Hidetoshi Kotera: "A study of the effect of the fabrication process on diffusion in a layered thin film"Microsystem Technologies. Vol.5, No4. 169-172 (1999)

Hidetoshi Kotera：“制造工艺对层状薄膜扩散影响的研究”Microsystem Technologies。

H.Kotera: "Dynamic Simulation Method of MEMS Coupling Electrostatic Field,Fluid Dynamics and Membrane Deflection" Microsystem Technologies 98. 491-496 (1998)

H.Kotera：“MEMS耦合静电场、流体动力学和膜偏转的动态模拟方法” Microsystem Technologies 98. 491-496 (1998)

Hidetoshi Kotera: "Shape Optimization for Dynamic Response of Micro-Membrane By Genetic Algorithm"ASME PVP. Vol.397-2. 227-232 (1999)

Hidetoshi Kotera：“通过遗传算法优化微膜动态响应”ASME PVP。

Hidetoshi Kotera: "A study of the effect of the fabrication process on diffusion in a layered thin film"Microsystem Technologies. Vol.5,No.4. 169-172 (1999)

Hidetoshi Kotera：“制造工艺对层状薄膜扩散影响的研究”Microsystem Technologies。