DEVELOPMENT OF SOFT X-RAY INTERFEROMETRY WITH SYNTHETIC MULTILAYERS AND APPLICATION TO WAVEFRONT MEASUREMENTS AND CONTROL OF PRECISION IMAGING MIRRORS

合成多层软X射线干涉技术的发展及其在波前测量和精密成像镜控制中的应用

• 批准号: 11305009
• 负责人: YAMAMOTO Masaki
• 金额: $ 26.52万
• 依托单位: TOHOKU UNIVERSITY
• 依托单位国家: 日本
• 项目类别: Grant-in-Aid for Scientific Research (A)
• 财政年份: 1999
• 资助国家: 日本
• 起止时间: 1999 至 2001
• 项目状态: 已结题
• 来源: https://kaken.nii.ac.jp/grant/KAKENHI-PROJECT-11305009/
• 关键词: SOFT X-RAY; INTERFEROMETRY; SYNTHETIC MULTILAYERS; MULTILAYER MIRROR; PRECISION IMAGING-MIRROR; WAVEFRONT ERROR; WAVEFRONT ERROR CORRECTION; DEBRIS REGECTION; 多層膜; ビームスプリッタ; 干渉計; 波面計測; 結像光学系

This research aims development of precision imaging mirrors for normal incidence optics at a wavelength of 13 nm with our fabrication expertise of soft X-ray multilayers. Methodology of precise wavefront measurement and correction has been investigated with development of soft X-ray interferometry of high accuracy better than 1 nm, needed for high quality imaging. In the development process, in addition to the interferometer optics with alignment system enabling nm accuracy measurement, basic compositions for general imaging systems are developed. These include a soft X-ray light source of a YAG-laser produced plasma free from debris contamination to optics, as well as a 2-dimensional detector with a data handling and analysis system for soft X-ray interferogram detection.In this fiscal year, continuing effort leads to successful development of the basic compositions, i.e., the light source, interferometry optics, and the detector.As for the light source assembly, a bright source has b … More een developed enabling soft X-ray interferogram recording by one shot of the YAG laser pulse. In this assembly, a multilayer condenser mirror of 10 cm in diameter is set at 0.2 NA configuration, effectively collecting soft X-ray of a solid Sn target locating 21 cm away from the mirror. A mechanical debris stopper designed and constructed removes the debris of the target. With the debris stopper, the life of the source are elongated to 40000 shots by 10 times with removal of debris particles forming 90 % of total debris mass.As for the optics, accuracy of the multilayer period distribution over the substrate of the precision imaging mirror has been improved from last year's 2 % to within 1 %. For this control, a new mechanical shutter system has been constructed with a function controlling speed of the open and close movements.As for the detector, imaging plates for Tr were investigated in respect to the sensitivity and detection linearity for the soft X-ray with use of our spectro-reflectometer. At around 13 nm wavelengths, high sensitivity of 100000 photons / mm^2 and good linearity over 4 orders of magnitudes were confirmed. Less

本研究旨在利用我们在软X射线多层膜制造方面的专业知识，开发用于13 nm波长正入射光学系统的精密成像镜。随着高精度软X射线干涉测量技术的发展，对波前的精确测量和校正方法进行了研究，以满足高质量成像的需要。在开发过程中，除了具有实现nm精度测量的对准系统的干涉仪光学器件外，还开发了用于一般成像系统的基本组成。其中包括采用YAG激光器产生的等离子体的软X射线光源，该光源不会对光学器件造成碎片污染，以及具有用于软X射线干涉图检测的数据处理和分析系统的二维检测器。在本财政年度，通过持续努力，成功开发了基本成分，即，光源、干涉测量光学器件和检测器。对于光源组件，亮源具有B ...更多信息 甚至开发了通过YAG激光脉冲的一次发射来实现软X射线干涉图记录。在该组件中，直径为10 cm的多层聚光镜设置为0.2 NA配置，有效地收集位于离反射镜21 cm处的固体Sn靶的软X射线。设计和制造的机械碎片阻挡器清除目标的碎片。采用碎片阻挡器后，源的寿命延长了10倍，达到40000次发射，去除了占总碎片质量90%的碎片颗粒。在光学方面，精密成像镜基片上多层膜周期分布的精度从去年的2%提高到1%以内。为了实现这一控制，我们设计了一种新型的机械快门系统，它具有控制开关运动速度的功能。作为探测器，我们使用我们的分光反射计研究了Tr成像板对软X射线的灵敏度和探测线性。在约13 nm波长处，确认了100000光子/ mm^2的高灵敏度和超过4个数量级的良好线性。少

项目成果

Masaki Yamamoto: "Present Status of EUV Interferometer Development at the Research Center for Soft X-ray Microscopy"Optics and Precision Engineering. 9. 405-410 (2001)

Masaki Yamamoto：“软 X 射线显微镜研究中心的 EUV 干涉仪开发现状”光学与精密工程。

T.Hatano: "Sensitivity and Linearity of imaging plates for EUV Light"Book of Abstr. 7th Int-Conf.Syn.Rad.Instrum.. POS1-209 (2000)

T.Hatano：“EUV 光成像板的灵敏度和线性度”摘要书。

M.Yamamoto: "Compact debris shutter design of a laser-prodiccel plasma source for high NA application"Proc.SPIE. 4146. 128-131 (2000)

M.Yamamoto：“用于高 NA 应用的激光 Prodiccel 等离子体源的紧凑碎片快门设计”Proc.SPIE。

T.Hatano: "Material selection for high reflectance muetilayer mirror at 400 eV"Book of Abstr. 7th Int Conf.Syn.Rad.Instrum.. POS2-080 (2000)

T.Hatano：“400 eV 高反射率多层镜的材料选择”摘要之书。

M.Yamamoto: "Sensitivity and Linearity of EUV Image Datection with an Imaging plate"Abstr. Int. Workshop on Extr. Ultraviolet Lithography. B-15 (1999)

M.Yamamoto：“使用成像板进行 EUV 图像检测的灵敏度和线性度”摘要。