High-resolution, element-specific microscope using a laser-produced-plasma soft X-ray source

使用激光产生的等离子体软 X 射线源的高分辨率、元素特异性显微镜

• 批准号: 15002001
• 负责人: YAMAMOTO Masaki
• 金额: $ 242.94万
• 依托单位: Tohoku University
• 依托单位国家: 日本
• 项目类别: Grant-in-Aid for Specially Promoted Research
• 财政年份: 2003
• 资助国家: 日本
• 起止时间: 2003 至 2007
• 项目状态: 已结题
• 来源: https://kaken.nii.ac.jp/grant/KAKENHI-PROJECT-15002001/
• 关键词: Soft X-ray; Multilayer; Microscope; Laser Plasma; Period thickness distribution control; Sputtering; Ellipsometer; Growth rate monitor

The project aims to develop a soft X-ray Schwarzschild microscope having spatial resolution of 50 nm enabling fast and easy laboratory imaging of organic and inorganic hybrids, magnetic materials and biological samples with the soft X-ray light in the wavelength range of 3 to 30 nm. The soft X-ray microscope is composed of a clean laboratory source of a laser produced plasma, imaging multilayer mirrors of specific D-spacing for monochromatic reflection, high accuracy alignment optics by visible light and image detectors, all comply with the high quality imaging.The most outstanding technology established is with our multilayer fabricator enabling D-space control on concave and convex mirror substrates with high accuracy of 0.1%, which achieves exact wavelength matching among the monochromatic mirrors for the wavelengths of 13.5nm and beyond, down to the 4.5nm, the carbon window region. The fabrication is supported by a new laboratory spectro-reflectometer designed for the curved mirror samples, a soft X-ray interferometer for the wave-front error measurements and a multilayer surface milling system for digital error correction by the layer period removal. These equipments help establishing soft X-ray optical engineering with multiyear optics.The most dominant achievement is the high grade <one shot imaging> by the microscope with the high 80% throughput 4-mirror optics developed. The resolution of the image has already met the 400nm limit by the CCD detector pixel size and is expected to reach 30nm. The high resolution imaging of living cells within the 0.2mm field of view will show details inside with 6000×6000 pixels by one shot. The image is free from burring by possible Brownian motion of particles in solution and offers new process of detailed analysis of multi-events in the wide field of view at desired magnification in the computer display of the novel optical microscope.

该项目旨在开发一种空间分辨率为50 nm的软X射线史瓦西显微镜，利用3至30 nm波长范围内的软X射线光，能够快速简便地对有机和无机混合物、磁性材料和生物样品进行实验室成像。软X射线显微镜由激光产生等离子体的清洁实验室源、用于单色反射的特定D间距的成像多层镜、通过可见光和图像检测器的高精度对准光学器件最出色的技术是我们的多层膜制造机，可在凹面和凸面镜基板上实现D空间控制，精度高达0.1%，其实现了对于13.5nm及更高波长（下至4.5nm）的碳窗口区域的单色镜之间的精确波长匹配。该制造是由一个新的实验室光谱反射仪设计的曲面镜样品，一个软X射线干涉仪的波前误差测量和多层表面铣削系统的数字误差校正层周期去除支持。这些设备帮助建立了软X射线光学工程与多年的光学。最主要的成就是高等级<one shot imaging>的显微镜与高吞吐量80%的四镜光学开发。图像的分辨率已经满足了CCD探测器像素尺寸的400nm限制，预计将达到30nm。在0.2mm的视野范围内，活细胞的高分辨率成像将以6000×6000像素的一次拍摄显示内部细节。图像是免费的毛刺可能布朗运动的粒子在溶液中，并提供了新的过程中详细分析的多个事件在宽视场中，在所需的放大倍率的计算机显示的新型光学显微镜。

项目成果

In-situ ellipsometric monitor with layer-by-layer analysis for precise thickness control of EUV multilayer optics

• DOI: 10.1016/j.tsf.2006.07.068
• 发表时间: 2006-11
• 期刊: Thin Solid Films
• 影响因子: 2.1
• 作者: T. Tsuru;Masaki Yamamoto

Thickness monitoring of nm period EUV multilayer fabrication by ellipsometry

通过椭圆光度法监测纳米周期 EUV 多层制造的厚度

• 发表时间: 2004
• 期刊: AIP Conference Proceedings 705
• 作者: Kazuhiro Endo;Peter Badica;Tamio Endo;Toshihide Tsuru
• 通讯作者: Toshihide Tsuru

Development of soft X-ray wavefront control technology for imaging multilayer mirrors

多层镜成像软X射线波前控制技术开发

• 发表时间: 2005
• 作者: R. S. Hayano;R. S. Hayano;M. Toyoda;R. S. Hayano;R. S. Hayano;R. S. Hayano;M. Yamamoto
• 通讯作者: M. Yamamoto

Precise thickness monitoring of EUV multilayer mirror fabrication by an ellipsometric thickness monitor

通过椭圆厚度监测仪对 EUV 多层反射镜制造进行精确厚度监测

• 发表时间: 2005
• 作者: R. S. Hayano;R. S. Hayano;M. Toyoda;R. S. Hayano;R. S. Hayano;R. S. Hayano;M. Yamamoto;R. S. Hayano;R. S. Hayano;R. S. Hayano;M. Hori;R. S. Hayano;R. S. Hayano;R. S. Hayano;R. S. Hayano;R. S. Hayano;R. Fuankoshi;R. S. Hayano;R. S. Hayano;R. S. Hayano;R. S. Hayano;M. Yamamoto;R. S. Hayano;R. S. Hayano;R. S. Hayano;T. Harada;R. S. Hayano;T. Tsuru
• 通讯作者: T. Tsuru

On shape selection of a speed Controlled shutter for thickness distribution control.

用于厚度分布控制的速度控制快门的形状选择。

• 发表时间: 2005
• 作者: R. S. Hayano;R. S. Hayano;M. Toyoda;R. S. Hayano;R. S. Hayano;R. S. Hayano;M. Yamamoto;R. S. Hayano;R. S. Hayano;R. S. Hayano;M. Hori;R. S. Hayano;R. S. Hayano;R. S. Hayano;R. S. Hayano;R. S. Hayano;R. Fuankoshi;R. S. Hayano;R. S. Hayano;R. S. Hayano;R. S. Hayano;M. Yamamoto;R. S. Hayano;R. S. Hayano;R. S. Hayano;T. Harada;R. S. Hayano;T. Tsuru;R. S. Hayano;T. Hatano
• 通讯作者: T. Hatano