Development of Soft-X-Ray Multilayrs and Novel Multilayr Optics

本项目的目标是研制短周期厚度小于6 nm的软X射线多层膜，并开发新型多层膜光学器件，同时对多层膜的生长过程进行了基础研究，建立了反射率-入射角法，收集了C，Mo，Ru，Rh，W，Pt，Au，BK 7玻璃，在60 - 900 eV的几种光子能量下，研究了反射率与表面粗糙度频谱的相关性，椭圆偏振法可用于研究生长相，包括粗糙度平滑和边界处化合物的形成。周期为4.70 - 5.34nm的Ru/B_4C和Mo/B_4C多层膜，用磁控溅射法制备了45 °反射率为167.3 ~ 186.2eV的薄膜，用研制的偏振度>98%的高性能偏振片和移相器实现了软X射线椭圆偏振测量，首次测量了Mo薄层的相对振幅衰减Rp/Rs=tanPSIexp（iDELTA）。

Aim of this project is to develop soft-x-ray multilayrs of short period thickness of less than 6nm and also to develop novel multilayr optics, with fundamental study of growth process.We have established the reflectance vs. angle of incidence method and collected optical contants of C, Mo, Ru, Rh, W, Pt, Au, BK7 glass, and fused silica at several photon energies between 60 to 900eV.Correlation between reflectance and special frequency spectrum of surface roughness was olso studied.In-situ, ellipsometry was found useful for growth phase study including roughness smoothing and compound formation at boundaries.Multilayrs of Ru/B4C and Mo/B4C of 4.70 to 5.34nm period, fabricated by magnetron sputtering, were found to have 16 to 18% reflectance at 45ﾟ angle of incidence with 167.3 to 186.2eV soft-x-ray.By soft-x-ray ellipsometry, realized with high performance polarizers of >98% polarizance and phase shifters developped, relative amplitude attenuation Rp/Rs=tanPSIexp(iDELTA) of a thin Mo layr was measured for the first time.