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Crystal growth and contral of nano-level zinc alloy electrodeposits

Crystal growth and contral of nano-level zinc alloy electrodeposits
纳米级锌合金电沉积晶体生长与控制
批准号:
11650745
负责人:
KONDO Kazuo
金额:
$2.11万
依托单位:
依托单位国家:
日本
项目类别:
Grant-in-Aid for Scientific Research (C)
财政年份:
1999
资助国家:
日本
项目状态:
已结题
起止时间:
1999 至 2000

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中文摘要
翻译
研究了TiO_2、SiO_2和链状SiO_2粒子的原子级复合电沉积。1. SiO_2的掺入机理研究了锌电沉积物在(00 1)η面上的宏观台阶横向生长。本文报道了50nm的SiO_2微粒在锌电沉积(001)η上的掺入机理。二氧化硅颗粒可以分为在(00 l)η上的无规沉淀物和在宏观台阶边缘的有序沉淀物。随机沉淀物被捕获从他们的底部由单个原子高度台阶在初始吸收网站。在宏观台阶边缘的有序沉淀物从宏观台阶的侧壁捕获。同时,我们还观察到在电沉积物内部的断裂表面上有许多二氧化硅颗粒。2.与二氧化钛的结合机理:二氧化钛颗粒由直径为10 nm的较小颗粒和50 nm的较大颗粒组成。50nm以上的颗粒可以分为(00 1)η上的无规沉淀物和宏观台阶边缘处的有序沉淀物。10nm的小颗粒随机沉淀在(00 1)η上。这些较小的粒子被捕获从他们的底部的单原子高度台阶在其初始吸收网站。在电沉积的初始阶段,只有较小的颗粒被捕获。3.链状SiO2颗粒的嵌入机理:探讨了链状SiO2颗粒的嵌入机理,即多个SiO2颗粒形成链状结构。链状颗粒可分为(00 1)η上的无规沉淀物和宏观台阶边缘的有序沉淀物。随机链状的前体分子在其初始吸收位置处被单原子高度台阶从其底部捕获。台阶边缘的有序链状析出相是从台阶侧壁捕获的。另外,我们还观察到链状粒子随机地粘附在(10 0)η面上.
英文摘要
Atomic level composite electrodeposition has been investigated with Titania, Silica and chained Silica particles.1.Incorporation mechanism with Silica ; The author has been investigated the macrostep lateral growth on (00 1)η of zinc electrodepoists. In this investigation, an incorporation mechanism of Silica particles of 50nm on (00 1)η of zinc electrodepoistsis is reported. Silica particles can be classified with random precipitates on the (00 l)η and ordered precipitates at the macrostep edge. The random precipitates are trapped form their bottom by single atomic height steps at the initial absorbed sites. The ordered precipitates at the macrostep edges are trapped from sidewall of macrosteps. Also, we observed many Silica particles on fractured surfaces which are inside of the electrodeposits.2.Incorporation mechanism with Titania ; The titania particles consist of 10nm diameter smaller particles and 50nm larger particles. 50nm larger particles can be classified with random precipitates on the (00 1)η and ordered precipitates at the macrostep edge. 10nm smaller particles randomly precipitates on the (00 1)η. These smaller particles are trapped form their bottom by the single atomic height steps at their initial absorbed sites. At the initial stage of electrodeposition, only smaller particles are trapped.3.Incorporation mechanism with chained Silica particles ; Incorporation mechanism of chained Silica particles, multiple Silica particle forming chain, is discussed. The chained particles can be classified with random precipitates on the (00 1)η and ordered precipitates at the macrostep edge. The random chained preoipitates are trapped form their bottom by the single atomic height steps at their initial absorbed sites. The ordered chained precipitates at the macrostep edges are trapped from sidewall of macrosteps. Also, we observed chained particles randomly sticking on the (10 0)η.
期刊论文(18)
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会议论文
林 克彦,田中義之助,近藤和夫: "亜鉛-コバルト合金めっきの結晶形態"鉄と鋼. 85・4. 314-320 (1999)
Katsuhiko Hayashi、Yoshinosuke Tanaka、Kazuo Kondo:“锌钴合金镀层的晶体形态”《钢铁》85・4(1999)。
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通讯作者:
K.Kondo, A.Ogishi and Z.Tanaka: "Electrodeposition of zinc- SiO_2 composite"J.Electrochem.Society. 147. 2611-2617 (2000)
K.Kondo、A.Ogishi 和 Z.Tanaka:“锌- SiO_2 复合材料的电沉积”J.Electrochem.Society。
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K.Kondo 他3名: "Atomic Force Microscopy Imaging the Growth Morphologies of electrodeposits"Advances in Science and Technology 20. 465-472 (1999)
K.Kondo 等 3 人:“原子力显微镜成像电沉积的生长形态”科学技术进展 20. 465-472 (1999)
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石山敬造,清水勝,田中善之助,近藤和夫: "プラズマCVD法によるZnO透明導電薄膜"化学工学論文集. Vol.25,.3. 485-489 (1999)
Keizo Ishiyama、Masaru Shimizu、Zennosuke Tanaka、Kazuo Kondo:“通过等离子体 CVD 方法制备 ZnO 透明导电薄膜”《化学工程杂志》第 25 卷,.3(1999 年)。
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