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Crystal growth and contral of nano-level zinc alloy electrodeposits

Crystal growth and contral of nano-level zinc alloy electrodeposits
纳米级锌合金电沉积晶体生长与控制
批准号:
11650745
负责人:
KONDO Kazuo
金额:
$2.11万
依托单位:
依托单位国家:
日本
项目类别:
Grant-in-Aid for Scientific Research (C)
财政年份:
1999
资助国家:
日本
项目状态:
已结题
起止时间:
1999 至 2000

项目摘要

项目成果

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中文摘要
翻译
研究了二氧化钛、二氧化硅和链状二氧化硅颗粒的原子级复合电沉积。1.二氧化硅与二氧化硅的结合机理;作者研究了锌电极沉积者在(0 0 1)η上的宏观台阶横向生长。研究了5 0 nm二氧化硅颗粒在锌电极(0 0 1)η上的掺杂机理。二氧化硅颗粒在(00 L)η上为随机沉淀,在宏观台阶边缘为有序沉淀。在初始吸收位置,随机沉淀以单原子高度的台阶从其底部被捕获。宏观台阶边缘的有序析出物从宏观台阶的侧壁被捕获。此外,我们还在断口观察到了电沉积层内部的大量二氧化硅颗粒。2.二氧化钛与二氧化钛的结合机理:二氧化钛颗粒由直径10 nm的小颗粒和50 nm大的颗粒组成。5 0 nm大颗粒在(0 0 1)η上有随机沉淀,在宏观台阶边缘有有序沉淀。10 nm的小颗粒在(00 1)η上随机析出。这些较小的粒子在它们最初被吸收的地方被单原子高度的台阶从它们的底部捕获。在电沉积初期,只有较小的颗粒被捕获。3.讨论了链状二氧化硅颗粒的嵌入机理,多个二氧化硅颗粒形成链状二氧化硅颗粒的机理。链状颗粒在(0 0 1)η面上可分为随机析出相和宏观台阶边缘有序析出相。无规链状预吸附体在其初始吸收位置通过单原子高度的台阶从其底部被捕获。宏观台阶边缘的有序链状析出物从宏观台阶的侧壁被捕获。此外,我们还观察到链状颗粒随机附着在(100)η上。
英文摘要
Atomic level composite electrodeposition has been investigated with Titania, Silica and chained Silica particles.1.Incorporation mechanism with Silica ; The author has been investigated the macrostep lateral growth on (00 1)η of zinc electrodepoists. In this investigation, an incorporation mechanism of Silica particles of 50nm on (00 1)η of zinc electrodepoistsis is reported. Silica particles can be classified with random precipitates on the (00 l)η and ordered precipitates at the macrostep edge. The random precipitates are trapped form their bottom by single atomic height steps at the initial absorbed sites. The ordered precipitates at the macrostep edges are trapped from sidewall of macrosteps. Also, we observed many Silica particles on fractured surfaces which are inside of the electrodeposits.2.Incorporation mechanism with Titania ; The titania particles consist of 10nm diameter smaller particles and 50nm larger particles. 50nm larger particles can be classified with random precipitates on the (00 1)η and ordered precipitates at the macrostep edge. 10nm smaller particles randomly precipitates on the (00 1)η. These smaller particles are trapped form their bottom by the single atomic height steps at their initial absorbed sites. At the initial stage of electrodeposition, only smaller particles are trapped.3.Incorporation mechanism with chained Silica particles ; Incorporation mechanism of chained Silica particles, multiple Silica particle forming chain, is discussed. The chained particles can be classified with random precipitates on the (00 1)η and ordered precipitates at the macrostep edge. The random chained preoipitates are trapped form their bottom by the single atomic height steps at their initial absorbed sites. The ordered chained precipitates at the macrostep edges are trapped from sidewall of macrosteps. Also, we observed chained particles randomly sticking on the (10 0)η.
期刊论文(18)
专著(0)
科研奖励(0)
会议论文
林 克彦,田中義之助,近藤和夫: "亜鉛-コバルト合金めっきの結晶形態"鉄と鋼. 85・4. 314-320 (1999)
Katsuhiko Hayashi、Yoshinosuke Tanaka、Kazuo Kondo:“锌钴合金镀层的晶体形态”《钢铁》85・4(1999)。
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通讯作者:
K.Kondo, A.Ogishi and Z.Tanaka: "Electrodeposition of zinc- SiO_2 composite"J.Electrochem.Society. 147. 2611-2617 (2000)
K.Kondo、A.Ogishi 和 Z.Tanaka:“锌- SiO_2 复合材料的电沉积”J.Electrochem.Society。
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K.Kondo 他3名: "Atomic Force Microscopy Imaging the Growth Morphologies of electrodeposits"Advances in Science and Technology 20. 465-472 (1999)
K.Kondo 等 3 人:“原子力显微镜成像电沉积的生长形态”科学技术进展 20. 465-472 (1999)
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石山敬造,清水勝,田中善之助,近藤和夫: "プラズマCVD法によるZnO透明導電薄膜"化学工学論文集. Vol.25,.3. 485-489 (1999)
Keizo Ishiyama、Masaru Shimizu、Zennosuke Tanaka、Kazuo Kondo:“通过等离子体 CVD 方法制备 ZnO 透明导电薄膜”《化学工程杂志》第 25 卷,.3(1999 年)。
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