Crystal growth and contral of nano-level zinc alloy electrodeposits

纳米级锌合金电沉积晶体生长与控制

• 批准号: 11650745
• 负责人: KONDO Kazuo
• 金额: $ 2.11万
• 依托单位: OKAYAMA UNIVERSITY
• 依托单位国家: 日本
• 项目类别: Grant-in-Aid for Scientific Research (C)
• 财政年份: 1999
• 资助国家: 日本
• 起止时间: 1999 至 2000
• 项目状态: 已结题
• 来源: https://kaken.nii.ac.jp/grant/KAKENHI-PROJECT-11650745/
• 关键词: Zinc; Electrodeposition; Surface treatment; Crystal growth; nano level

Atomic level composite electrodeposition has been investigated with Titania, Silica and chained Silica particles.1.Incorporation mechanism with Silica ; The author has been investigated the macrostep lateral growth on (00 1)η of zinc electrodepoists. In this investigation, an incorporation mechanism of Silica particles of 50nm on (00 1)η of zinc electrodepoistsis is reported. Silica particles can be classified with random precipitates on the (00 l)η and ordered precipitates at the macrostep edge. The random precipitates are trapped form their bottom by single atomic height steps at the initial absorbed sites. The ordered precipitates at the macrostep edges are trapped from sidewall of macrosteps. Also, we observed many Silica particles on fractured surfaces which are inside of the electrodeposits.2.Incorporation mechanism with Titania ; The titania particles consist of 10nm diameter smaller particles and 50nm larger particles. 50nm larger particles can be classified with random precipitates on the (00 1)η and ordered precipitates at the macrostep edge. 10nm smaller particles randomly precipitates on the (00 1)η. These smaller particles are trapped form their bottom by the single atomic height steps at their initial absorbed sites. At the initial stage of electrodeposition, only smaller particles are trapped.3.Incorporation mechanism with chained Silica particles ; Incorporation mechanism of chained Silica particles, multiple Silica particle forming chain, is discussed. The chained particles can be classified with random precipitates on the (00 1)η and ordered precipitates at the macrostep edge. The random chained preoipitates are trapped form their bottom by the single atomic height steps at their initial absorbed sites. The ordered chained precipitates at the macrostep edges are trapped from sidewall of macrosteps. Also, we observed chained particles randomly sticking on the (10 0)η.

研究了二氧化钛、二氧化硅和链状二氧化硅颗粒在原子水平上的复合电沉积。二氧化硅掺入机理；本文研究了锌镀层(001)η的宏观台阶横向生长。本文报道了50nm二氧化硅颗粒在(00 1)η锌镀层上的掺入机理。二氧化硅颗粒在(00 l)η处可分为无序析出相和有序析出相。随机沉淀物通过在初始吸收位置的单原子高度台阶从其底部被捕获。宏观台阶边缘的有序析出物是从宏观台阶的侧壁捕获的。此外，我们在电镀层内部的断裂表面上观察到许多二氧化硅颗粒。二氧化钛的掺入机理；二氧化钛颗粒由直径为10nm的小颗粒和直径为50nm的大颗粒组成。50nm较大的颗粒可分为(00 1)η处的无序析出和宏观台阶边缘的有序析出。10nm的小颗粒在(00 1)η上随机析出。这些较小的粒子在它们最初的吸收位置被单原子高度的台阶从它们的底部捕获。在电沉积的初始阶段，只有较小的颗粒被捕获。链状二氧化硅颗粒的掺入机理；讨论了链式二氧化硅颗粒的掺入机理，即多二氧化硅颗粒形成链。链状颗粒可分为(00 1)η处的随机析出和宏观阶边处的有序析出。随机链状预沉淀通过其初始吸收位置的单原子高度台阶从其底部被捕获。宏观台阶边缘的有序链状沉淀物是从宏观台阶的侧壁捕获的。此外，我们还观察到链状粒子随机粘附在(10 0)η上。

项目成果

林 克彦,田中義之助,近藤和夫: "亜鉛-コバルト合金めっきの結晶形態"鉄と鋼. 85・4. 314-320 (1999)

Katsuhiko Hayashi、Yoshinosuke Tanaka、Kazuo Kondo：“锌钴合金镀层的晶体形态”《钢铁》85・4（1999）。

K.Kondo, A.Ogishi and Z.Tanaka: "Electrodeposition of zinc- SiO_2 composite"J.Electrochem.Society. 147. 2611-2617 (2000)

K.Kondo、A.Ogishi 和 Z.Tanaka：“锌- SiO_2 复合材料的电沉积”J.Electrochem.Society。

K.Kondo 他3名: "Atomic Force Microscopy Imaging the Growth Morphologies of electrodeposits"Advances in Science and Technology 20. 465-472 (1999)

K.Kondo 等 3 人：“原子力显微镜成像电沉积的生长形态”科学技术进展 20. 465-472 (1999)

石山敬造,清水勝,田中善之助,近藤和夫: "プラズマCVD法によるZnO透明導電薄膜"化学工学論文集. Vol.25,.3. 485-489 (1999)

Keizo Ishiyama、Masaru Shimizu、Zennosuke Tanaka、Kazuo Kondo：“通过等离子体 CVD 方法制备 ZnO 透明导电薄膜”《化学工程杂志》第 25 卷，.3（1999 年）。

近藤和夫,石山敬造,田中善之助: "プラズマ法によるZnO透明導電膜-ホウ素ドーパントの影響"化学工学論文集. Vol26,No2. 309-313 (2000)

Kazuo Kondo、Keizo Ishiyama、Zennosuke Tanaka：“等离子体法的 ZnO 透明导电膜 - 硼掺杂剂的影响”《化学工程杂志》第 26 卷，第 2. 309-313 期（2000 年）。