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Development of Two Beam Total-Reflection X-Ray Fluorescence and its evaluation of Analytical Performance

Development of Two Beam Total-Reflection X-Ray Fluorescence and its evaluation of Analytical Performance
两束全反射X射线荧光分析仪的研制及其分析性能评价
批准号:
11650828
负责人:
TSUJI Kouichi
金额:
$2.37万
依托单位:
依托单位国家:
日本
项目类别:
Grant-in-Aid for Scientific Research (C)
财政年份:
1999
资助国家:
日本
项目状态:
已结题
起止时间:
1999 至 2000

项目摘要

项目成果

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中文摘要
翻译
我对前人研制的大测角仪(A,07555260)进行了改进,研制出了一种新的设备--2x射线激发全反射x射线荧光仪。该测角仪被放置在Rigaku,RU-200阳极式X射线发生器的工作台上。通过倾斜测角仪的一个轴(φ)来改变来自该X射线发生器的X射线的入射角。在测角仪的另一臂上安装了一根密封式X射线管。通过移动该臂,改变了密封式X射线管的入射角(χ)。利用该系统,可以对两束独立控制入射角度的X射线束进行TXRF分析。由于我在比利时和英国呆了很长时间,我花了一年半的时间才研制出上述特种设备。因此,项目工期不足以完成对该方法的评估。然而,证实了X射线荧光强度在两束X射线照射下得到了增强。我将继续研究该方法的分析性能。在本项目期间,还提出了另一种方法:掠射-出射电子探针微量分析(GE-EPMA)。这种方法使表面敏感的微量分析成为可能。将Ge-EPMA用于颗粒分析和薄膜分析。用这种方法取得的部分成果载于该项目的报告小册子。
英文摘要
I developed a new equipment "2 x-ray beams excitation total reflection x-ray fluorescence (TXRF)" by modified the large goniometer that was developed by previous grant (A, 07555260). This goniometer was placed on the table of an x-ray generator of anode-rotating type (Rigaku, RU-200). The incident angle of the x-rays from this x-ray generator was changed by tilting one axis (φ) of the goniometer. A sealed-type x-ray tube was attached on another arm of the goniometer. The incident angle (χ) of the sealed-type x-ray tube was changed by moving this arm. By using this system, TXRF analysis was possible with two different x-ray beams, whose incident angle were independently controlled. Due to my long stay in Belgium and England, it took 1 year and a half to develop the above special equipment. Therefore, the term of project was not enough to finish the evaluation of the proposed method. However, it was confirmed that x-ray fluorescent intensity was enhanced by two x-ray beams irradiation. I will continuously investigate the analytical performance of this method.During the term of this project, another method : "grazing-exit electron probe microanalysis (GE-EPMA)" was also proposed. This method enables surface-sensitive microanalysis. GE-EPMA was applied to particle analysis and thin-film analysis. The parts of the results obtained by this method were included in the report booklet of this project.
期刊论文(19)
专著(0)
科研奖励(0)
会议论文
辻幸一: "斜出射X線測定型の電子線プローブマイクロアナリシス"X線分析の進歩(アグネ技術センター編). 32集. 25-44 (2001)
Koichi Tsuji:“倾斜发射X射线测量型电子束探针微量分析”X射线分析进展(Agne技术中心编辑)第32卷25-44(2001年)。
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Y.Hasegawa: "X-Ray Source Combined Ultrahigh-Vacuum Scanning Tunneling Microscopy for Elemental Analysis"J.Vac.Sci.Tech.B. 18. 2676-2680 (2000)
Y.Hasekawa:“用于元素分析的 X 射线源结合超高真空扫描隧道显微镜”J.Vac.Sci.Tech.B。
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K.Tsuji: "Detection Limit of Grazing-Exit Electron Probe Microanalysis (GE-EPMA) for Particles Analysis"Mikrochim. Acta.. 132. 357-360 (2000)
K.Tsuji:“用于颗粒分析的掠射电子探针微量分析 (GE-EPMA) 的检测极限”Mikrochim。
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通讯作者:
K.Tsuji: "Detection Limit of Grazing-Exit Electron Probe Microanalysis(GE-EPMA) for Particles Analysis"Mikrochim.Acta.. 132. 357-360 (2000)
K.Tsuji:“用于颗粒分析的掠射电子探针微量分析 (GE-EPMA) 的检测极限”Mikrochim.Acta.. 132. 357-360 (2000)
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共 14 条
    Development of fast XRF elemental imaging spectrometer
    • 批准号:
      26288069
    • 项目类别:
      Grant-in-Aid for Scientific Research (B)
    • 资助金额:
      $10.98万
    • 财政年份:
      2014
    • 负责人:
      TSUJI Kouichi
    • 依托单位:
    Development of 3DXRF instrument and application to forensic science
    • 批准号:
      23350034
    • 项目类别:
      Grant-in-Aid for Scientific Research (B)
    • 资助金额:
      $12.48万
    • 财政年份:
      2011
    • 负责人:
      TSUJI Kouichi
    • 依托单位:
    Small region XRF in-situ analysis of solid-liquid interface analysis
    • 批准号:
      19350042
    • 项目类别:
      Grant-in-Aid for Scientific Research (B)
    • 资助金额:
      $11.32万
    • 财政年份:
      2007
    • 负责人:
      TSUJI Kouichi
    • 依托单位:
    Development of 3-D DX-ray Analytical Microscope and micro-nano analysis under actual environment
    • 批准号:
      15350048
    • 项目类别:
      Grant-in-Aid for Scientific Research (B)
    • 资助金额:
      $9.66万
    • 财政年份:
      2003
    • 负责人:
      TSUJI Kouichi
    • 依托单位:
    海外基金