Development of Two Beam Total-Reflection X-Ray Fluorescence and its evaluation of Analytical Performance
Development of Two Beam Total-Reflection X-Ray Fluorescence and its evaluation of Analytical Performance
批准号:
11650828
负责人:
TSUJI Kouichi
金额:
$2.37万
依托单位:
依托单位国家:
日本
项目类别:
Grant-in-Aid for Scientific Research (C)
财政年份:
1999
资助国家:
日本
项目状态:
已结题
起止时间:
1999 至 2000
中文摘要
我对先前拨款(a, 07555260)研制的大型测角仪进行了改进,研制了新的设备“2束x射线激发全反射x射线荧光(TXRF)”。该测角仪放置在阳极旋转型x射线发生器的工作台上(Rigaku, RU-200)。通过倾斜测角仪的一个轴(φ)来改变x射线发生器的x射线入射角。在测角仪的另一个臂上安装了一个密封式x射线管。通过移动该臂改变了封闭式x射线管的入射角(χ)。利用该系统,可以对两束独立控制入射角的x射线进行TXRF分析。由于长期在比利时和英国工作,我用了1年半的时间才开发出上述专用设备。因此,项目期限不足以完成所提出方法的评价。然而,证实了两次x射线束照射增强了x射线荧光强度。我将继续研究这种方法的分析性能。在本项目期间,还提出了另一种方法:“掠射出口电子探针微分析(GE-EPMA)”。这种方法使表面敏感微量分析成为可能。GE-EPMA用于颗粒分析和薄膜分析。用这种方法得到的部分结果被收录在本项目的报告手册中。
英文摘要
I developed a new equipment "2 x-ray beams excitation total reflection x-ray fluorescence (TXRF)" by modified the large goniometer that was developed by previous grant (A, 07555260). This goniometer was placed on the table of an x-ray generator of anode-rotating type (Rigaku, RU-200). The incident angle of the x-rays from this x-ray generator was changed by tilting one axis (φ) of the goniometer. A sealed-type x-ray tube was attached on another arm of the goniometer. The incident angle (χ) of the sealed-type x-ray tube was changed by moving this arm. By using this system, TXRF analysis was possible with two different x-ray beams, whose incident angle were independently controlled. Due to my long stay in Belgium and England, it took 1 year and a half to develop the above special equipment. Therefore, the term of project was not enough to finish the evaluation of the proposed method. However, it was confirmed that x-ray fluorescent intensity was enhanced by two x-ray beams irradiation. I will continuously investigate the analytical performance of this method.During the term of this project, another method : "grazing-exit electron probe microanalysis (GE-EPMA)" was also proposed. This method enables surface-sensitive microanalysis. GE-EPMA was applied to particle analysis and thin-film analysis. The parts of the results obtained by this method were included in the report booklet of this project.
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辻幸一: "斜出射X線測定型の電子線プローブマイクロアナリシス"X線分析の進歩(アグネ技術センター編). 32集. 25-44 (2001)
Koichi Tsuji:“倾斜发射X射线测量型电子束探针微量分析”X射线分析进展(Agne技术中心编辑)第32卷25-44(2001年)。
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Y.Hasegawa: "X-Ray Source Combined Ultrahigh-Vacuum Scanning Tunneling Microscopy for Elemental Analysis"J.Vac.Sci.Tech.B. 18. 2676-2680 (2000)
Y.Hasekawa:“用于元素分析的 X 射线源结合超高真空扫描隧道显微镜”J.Vac.Sci.Tech.B。
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K.Tsuji: "Detection Limit of Grazing-Exit Electron Probe Microanalysis (GE-EPMA) for Particles Analysis"Mikrochim. Acta.. 132. 357-360 (2000)
K.Tsuji:“用于颗粒分析的掠射电子探针微量分析 (GE-EPMA) 的检测极限”Mikrochim。
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K.Tsuji: "Detection Limit of Grazing-Exit Electron Probe Microanalysis(GE-EPMA) for Particles Analysis"Mikrochim.Acta.. 132. 357-360 (2000)
K.Tsuji:“用于颗粒分析的掠射电子探针微量分析 (GE-EPMA) 的检测极限”Mikrochim.Acta.. 132. 357-360 (2000)
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K.Tsuji et al.: "Enhancement of X-ray fluorescence intensity from an ultra-thin sandwiched layer at grazing-emission angles"Spectrochim. Acta B. 54. 1881-1888 (1999)
K.Tsuji 等人:“在掠射发射角处增强超薄夹层的 X 射线荧光强度”Spectrochim。
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共 14 条
Development of fast XRF elemental imaging spectrometer
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批准号:26288069
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财政年份:2014
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负责人:TSUJI Kouichi
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依托单位:
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Small region XRF in-situ analysis of solid-liquid interface analysis
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财政年份:2007
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Development of 3-D DX-ray Analytical Microscope and micro-nano analysis under actual environment
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财政年份:2003
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负责人:TSUJI Kouichi
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依托单位:
DEVELOPMENT OF GRAZING-EXIT MICRO X-RAY FLUORESCENCE INSTRUMENT AND SINGLE PARTICLE ANALYSIS SUCH AS AEROSOLS
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批准号:12554030
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项目类别:Grant-in-Aid for Scientific Research (B)
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资助金额:$8.77万
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财政年份:2000
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负责人:TSUJI Kouichi
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依托单位:
Development of the glancing-incidence and glancing-takeoff X-ray fluorescence apparatus for surface an analysis
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批准号:07555260
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项目类别:Grant-in-Aid for Scientific Research (A)
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资助金额:$7.42万
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财政年份:1995
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负责人:TSUJI Kouichi
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依托单位:
海外基金