Nanostructure of exchange spring magnet multilayers examined by resonant X-ray magnetic scattering

通过共振 X 射线磁散射检查交换弹簧磁体多层的纳米结构

基本信息

批准号：
13650721
负责人：
OKUDA Hiroshi
金额：
$ 1.98万
依托单位：
KYOTO UNIVERSITY (2002)Nara Institute of Science and Technology (2001)
依托单位国家：
日本
项目类别：
Grant-in-Aid for Scientific Research (C)
财政年份：
2001
资助国家：
日本
起止时间：
2001 至 2002
项目状态：
已结题

项目摘要

Spring magnets comprising of magnetically soft materials such as NiFe films on top of hard materials such as SmCo, exhibits unique magnetization characteristics. The present research aims to examine the twisted magnetic structure appearing in the magnetically soft layers by means of resonant X-ray magnetic scattering measurements.The sample used in the present experiments was grown on Si substrate as SmCo_5(16.5)/Ni_<80>Fe_<20>(60)/SmCo_516.5 nm) trilayers by Molecular Beam Epitaxy(MBE). In-plane magnetic field was applied during the film growth. The direction of applied field was rotated by 90 degree for the top hard layer (SmCo). The magnetization curve of the sample exhibited a two-step magnetization, characteristic of spring magnet structure. Resonant X-ray reflectivity measurements were carried out at beam-line 39XU of Spring 8. The charge contribution of the reflectivity gives a clear Kiessig fringes. The difference reflectivity obtained by the difference in the reflectivity between right and left circularly polarized X-ray near the critical angle, where the preliminary simulation suggest best signal, was well above the statistical variation, but still remain noisy for quantitative analysis. Considering quite small cross section of the magnetic scattering at K edge, much better statistics is required. The present study has shown that the limiting factor in the RMXS measurement is the maximum counting rate of the detector.

弹簧磁铁由磁性柔软的材料（例如硬化材料（例如SMCO））的磁性材料（例如Nife膜）具有独特的磁化特性。 The present research aims to examine the twisted magnetic structure appearing in the magnetically soft layers by means of resonant X-ray magnetic scattering measurements.The sample used in the present experiments was grown on Si substrate as SmCo_5(16.5)/Ni_<80>Fe_<20>(60)/SmCo_516.5 nm) trilayers by Molecular Beam Epitaxy(MBE).在膜生长期间，应用了平面磁场。对顶部硬层（SMCO）旋转应用场的方向。样品的磁化曲线表现出两步磁化，这是弹簧磁体结构的特征。在弹簧8的光束线39xU上进行了谐振X射线反射率测量。反射率的电荷贡献可提供清晰的Kiessig条纹。通过右角左右极化X射线之间的反射率在临界角度附近，初步模拟表明最佳信号的差异差异远高于统计变化，但仍保持定量分析的噪声仍然很嘈杂。考虑到K边缘的磁散射的相当小，需要更好的统计数据。本研究表明，RMXS测量的限制因子是检测器的最大计数率。