Formation of High energy White Synchrotron Microbeam and its Application to Micro-Imaging of Electronic Devices

点击翻译按钮获取中文摘要

Microbeam techniques are becoming increasingly important with the recent development of third-generation synchrotron light sources. The present microbeam with microhole among various type of microbeam such as those by KB mirror or two-dimensional asymmetric crystal-reflection has unique characteristics ; high energy, white spectrum and being parallel. In the present research project 5 micrometers diameter microbeam has been successfully attained and applied to the observation of micro-imaging of individual defects such dislocation microdefects in electronic devices.The observation of a Germanium single crystal clearly revealed dislocations with better contrast and resolution than in a conventional white beam topograph. The present research has shown advantages of a high energy white and parallel microbeam in materials-imaging by X-ray scattering topography. Besides the imaging system equipped with an energy sensitive multi-channel detecting system has provided a function of local spectroscopy simultaneously.Besides It has been found that focusing effect at the microhole provides approximately 3 micrometer in beam diameter to enable us to attain one micrometer resolution in the present scanning type micro-imaging of devices which takes advantages of high energy white and parallel micro beam, otherwise impossible.