A study on plasmaless etchig process for fabrication of micro-systems

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Properties, mechanism, and application of plasmaless etching, using reactive gases, were mainly investigated in this study. First, etch characteristics of annealed spin-on-glass films using anhydrous hydrogen fluoride were investigated. Next, etch characteristics of silicon, silicon dioxide, and glass-like carbon by chlorine trifluoride were clarified.As an application of plasmaless etching process, chlorine trifluoride was used to form bridge structures in thermal type infrared sensor devices. Highly-sensitive bolometer devices were fabricated using polycrystalline silicon films as a sensing material. Next, the plasmaless etching process was applied to surface texturing of solar cells. Anti-reflective surfaces of polycrystalline silicon substrates were obtained by the slight etching with chlorine trifluoride. Next, fabrication process of biosensors was investigated. Micro-cell sorters were fabricated, and the blood cells in the channel are deflected by dielectrophoretic force, exerted by the vacuum evaporated electrodes. A sticking technique for glass substrates was investigated to make micro-channels. The glass substrates were stuck to each other by the treatment with diluted hydrogen fluoride and low temperature annealing.