Effect of Strong Magnetic Field Gradient Imposition on Iron Film Deposition Rate and Grain Structures

强磁场梯度施加对铁膜沉积速率和晶粒结构的影响

• 批准号: 14550680
• 负责人: YOSHIKAWA Noboru
• 金额: $ 2.3万
• 依托单位: Tohoku University
• 依托单位国家: 日本
• 项目类别: Grant-in-Aid for Scientific Research (C)
• 财政年份: 2002
• 资助国家: 日本
• 起止时间: 2002 至 2003
• 项目状态: 已结题
• 来源: https://kaken.nii.ac.jp/grant/KAKENHI-PROJECT-14550680/
• 关键词: iron; chemical vapor deposition; strong magnetic field; magnetic field gradient; film microstructure; crystal orientation; gas flow; simulation; 磁化力; 微細組織

In this research, difference in film microstructures between in a homogeneous magnetic field and in a gradient magnetic field was investigated. Position of the substrate was modified to be variable in the apparatus already installed. Under condition of maximum80T^2/m of the field gradient, film was deposited and the weight change of FeCl_3 powder was measured. The followings points were clarified.1.Cubic shaped, (100) oriented island crystals have higher probability of formation by imposition of gradient field, which is the same tendency as that of homogeneous field.2.The magnetic field imposition effect was obviously observed in the flatness of the crystal grains on the film surface. It was demonstrated that the grains with flatter surface grain facet was obtained thn the one deposited by homogeneous field imposition.3.The consumed amount of FeCl_3 source positioned in a gradient field was increased as an increase of the field intensity.The gas flow simulation in the reactor was performed in order to verify the third finding, by means of a software "Fluent" for fluid flow calculation. In the simulations of the gas flow, variations in gas properties, magnetic properties with temperature were taken into consideration, and the measured values of wall temperature distribution were input. It was shown that gas velocity at the outlet of the reactor increased doubly by the field imposition within the experimental conditions tested. In this study, basic simulation method for investigating the effects of the gas concentration distribution were established for the future studies.

在本研究中，薄膜微结构的差异在均匀磁场和梯度磁场之间进行了研究。基底的位置被修改为在已经安装的设备中是可变的。在最大场梯度为80T^2/m的条件下，沉积了FeCl_3薄膜，并测量了FeCl_3粉末的重量变化。结果表明：（1）施加梯度场时，（100）取向的立方岛状晶体的形成几率更高，这与均匀场的形成几率相同;（2）施加磁场对薄膜表面晶粒的平整度有明显的影响。结果表明，均匀场沉积的颗粒表面更平整。3.梯度场中FeCl_3源的消耗量随场强的增加而增加。为了验证第三个发现，利用流体流动计算软件Fluent对反应器中的气体流动进行了模拟。在气体流动的模拟中，考虑了气体性质、磁性质随温度的变化，并输入了壁面温度分布的测量值。结果表明，在实验条件下，反应器出口处的气体速度增加了一倍，由场的实施。本研究建立了研究气体浓度分布影响的基本模拟方法，为以后的研究奠定了基础。

项目成果

N.Yoshikawa, T.Endo, S.Awaji, E.Aoyagi, S.Taniguchi: "Microstructure and Orientation of Iron Crystal by Thermal CVD with Imposition of Magnetic Field"Mater.Sci.Forum.. Vol 408-412. 1633-1638 (2002)

N.Yoshikawa、T.Endo、S.Awaji、E.Aoyagi、S.Taniguchi：“通过施加磁场的热 CVD 来研究铁晶体的微观结构和取向”Mater.Sci.Forum.. 第 408-412 卷。

N.Yoshikawa, T.Endo, S.Awaji, E.Aoyagi, S.Taniguchi: "Texture and Grain Structure of Iron Film Obtained by CVD with Imposition of magnetic Field"Materials Science Foram. 408-412. 1633-1638 (2002)

N.Yoshikawa、T.Endo、S.Awaji、E.Aoyagi、S.Taniguchi：“通过施加磁场的 CVD 获得的铁膜的纹理和晶粒结构”材料科学论坛。

N.Yoshikawa, H.Baba, T.Endo, S.Taniguchi, I.Mogi, S.Awaji, K, Watanabe: "Effect of Magnetic Field Imposition on Thermal CVD Process of Iron Crystals"Proc.of 4th Int.Conf.on electromagnetic Processing of Materials, EPM2003,Lyon France. Oct.(CD-ROM). (2003)

N.Yoshikawa、H.Baba、T.Endo、S.Taniguchi、I.Mogi、S.Awaji、K、Watanabe：“磁场强加对铁晶体热 CVD 过程的影响”Proc.of 4th Int.Conf。

N.Yoshikawa, T.Endo, S.Taniguchi, S.Awaji, K.Watanabe, E.Aoyagi: "Microstructure and Orientation of Iron Crystal by Thermal CVD with Imposition of Magnetic Field"J.Mater.Res.. 17[11]. 2865-2874 (2002)

N.Yoshikawa、T.Endo、S.Taniguchi、S.Awaji、K.Watanabe、E.Aoyagi：“通过施加磁场的热 CVD 来研究铁晶体的微观结构和取向”J.Mater.Res.. 17[11]

N.Yoshikawa, T.Endo, S.Taniguchi, S.Awaji, K.Watanabe: "Influence of Magnetic Field Imposition on CVD Process for Fabrication of Fe Film"Proc.Of International Symposium on Innovative Materials Processing by Controlling Chemical Reaction Field(IMP2002). 9-

N.Yoshikawa、T.Endo、S.Taniguchi、S.Awaji、K.Watanabe：“磁场强加对 CVD 工艺制备 Fe 薄膜的影响”Proc.Of International Symposium on Innovative MaterialsProcessing by Control Chemical Reaction Field（