On the Mechanism and ControLof Nanoparticles Co-deposition in Electrochemical Processes

电化学过程中纳米颗粒共沉积的机理与控制

• 批准号: 14550685
• 负责人: MATSUBARA Hiroshi
• 金额: $ 2.11万
• 依托单位: Nagaoka University of Technology
• 依托单位国家: 日本
• 项目类别: Grant-in-Aid for Scientific Research (C)
• 财政年份: 2002
• 资助国家: 日本
• 起止时间: 2002 至 2003
• 项目状态: 已结题
• 来源: https://kaken.nii.ac.jp/grant/KAKENHI-PROJECT-14550685/
• 关键词: Electroless Plating; Nanoparticle; Composite Plating; Nanodiamond; Cluster Diamond; 初期析出; 微細構造

At first, co-deposition. conditions of nanoparticles into electrolessly plated films were studied. Effects of concentration, temperature and pH of the baths were investigated. Size of particles also affected co-deposition characteristics. Next co-deposition mechanism of nanoparticles into electrolessly plated films were studied in detail. It was suggested that nanodiamond particles were co-deposited into the film after adsorption of metal ion onto the surface of the particles. It was found that citrate complex of nickel effectively adsorbed on the surface of nanodiamond particles and the particles co-deposited large amount. Charge of particles in solutions seemed to have no effect on the co-deposition mechanism. No aggregation of the paticles was observed by transmission electron microscope. It was also found that direct observation of nanodiamond particles was impossible.

起初，共同沉积。研究了纳米颗粒进入电镀膜的条件。研究了浓度，温度和pH值的影响。颗粒的大小还影响了共沉积特征。详细研究了纳米粒子在电镀膜中的下一个共沉积机理。有人提出，在将金属离子吸附到颗粒表面后，将纳米座颗粒共沉积到膜中。发现镍的柠檬酸盐配合物有效地吸附在纳米座颗粒的表面上，而颗粒共同沉积了大量。溶液中颗粒的电荷似乎对共沉积机制没有影响。没有通过透射电子显微镜观察到裂缝的聚集。还发现不可能直接观察纳米座颗粒。

项目成果

松原 浩, 田澤尚志, 斉藤信雄, 西山 洋, 井上泰宣, 黛 政男: "無電解ニッケルめっき膜中へのクラスターダイヤモンド微粒子の共析"表面技術. 第54巻第5号. 374-375 (2003)

Hiroshi Matsubara、Naoshi Tazawa、Nobuo Saito、Hiroshi Nishiyama、Yasunobu Inoue、Masao Mayuzumi：“化学镀镍膜中簇状金刚石细颗粒的共析体”表面技术，第 54 卷，第 5 期。374-375 (2003)。

Hiroshi MATSUBARA, Mikinori KOBAYASHI, Hiroshi NISHIYAMA, Nobuo SAITO, Yasunobu INOUE, Masao MAYUZUMI: "Co-Deposition Characteristics of Nanodiamond Particles in Electrolessly Plated Nickel Film"Electrochemistry. 72. 446-448 (2004)

Hiroshi MATSUBARA、Mikinori KOBAYASHI、Hiroshi NISHIYAMA、Nobuo SAITO、Yasunobu INOUE、Masao MAYUZUMI：“化学镀镍膜中纳米金刚石颗粒的共沉积特性”电化学。

松原 浩, 田澤尚志, 斉藤信雄, 西山 洋, 井上泰宜, 黛 政男: "無電解ニッケルめっき膜中へのクラスターダイヤモンド微粒子の共析"表面技術. 第54巻第5号. 374-375 (2003)

Hiroshi Matsubara、Naoshi Tazawa、Nobuo Saito、Hiroshi Nishiyama、Yasunori Inoue、Masao Mayuzumi：“将簇状金刚石微粒共沉积到化学镀镍膜中”《表面技术》第 54 卷，第 5 期。374-375 (2003)。

Hiroshi MATSUBARA, Mikinori KOBAYASHI, Hiroshi NISHIYAMA, Nobuo SAITO, Yasunobu INOUE, Masao MAYUZUMI: "Co-deposition Characteristics of Nanodiamond Particles in Electrolessly Plated Nickel Films"Electrochemistry. Vol.72,No.6(印刷中). (2004)

Hiroshi MATSUBARA、Mikinori KOBAYASHI、Hiroshi NISHIYAMA、Nobuo SAITO、Yasunobu INOUE、Masao MAYUZUMI：“化学镀镍薄膜中纳米金刚石颗粒的共沉积特性”电化学第 72 卷，第 6 期（出版中）。

Hiroshi MATSUBARA, Hisashi TAZAWA, Nobuo SAITO, Hiroshi NISHIYAMA, Yasunobu INOUE, Masao MAYUZUMI: "Co-Deposition of Cluster Diamond into Electrolessly Plated Nickel Films"Journal of the Surface Finishing Society of Japan. 54. 374-375 (2003)

Hiroshi MATSUBARA、Hisashi TAZAWA、Nobuo SAITO、Hiroshi NISHIYAMA、Yasunobu INOUE、Masao MAYUZUMI：“将簇状金刚石共沉积到化学镀镍膜中”日本表面处理学会杂志。