On the Mechanism and ControLof Nanoparticles Co-deposition in Electrochemical Processes

电化学过程中纳米颗粒共沉积的机理与控制

• 批准号: 14550685
• 负责人: MATSUBARA Hiroshi
• 金额: $ 2.11万
• 依托单位: Nagaoka University of Technology
• 依托单位国家: 日本
• 项目类别: Grant-in-Aid for Scientific Research (C)
• 财政年份: 2002
• 资助国家: 日本
• 起止时间: 2002 至 2003
• 项目状态: 已结题
• 来源: https://kaken.nii.ac.jp/grant/KAKENHI-PROJECT-14550685/
• 关键词: Electroless Plating; Nanoparticle; Composite Plating; Nanodiamond; Cluster Diamond; 初期析出; 微細構造

At first, co-deposition. conditions of nanoparticles into electrolessly plated films were studied. Effects of concentration, temperature and pH of the baths were investigated. Size of particles also affected co-deposition characteristics. Next co-deposition mechanism of nanoparticles into electrolessly plated films were studied in detail. It was suggested that nanodiamond particles were co-deposited into the film after adsorption of metal ion onto the surface of the particles. It was found that citrate complex of nickel effectively adsorbed on the surface of nanodiamond particles and the particles co-deposited large amount. Charge of particles in solutions seemed to have no effect on the co-deposition mechanism. No aggregation of the paticles was observed by transmission electron microscope. It was also found that direct observation of nanodiamond particles was impossible.

一开始，是共同作证。研究了纳米粒子进入化学镀膜的条件。考察了镀液浓度、温度、pH值等因素对镀液性能的影响。颗粒的大小也影响共沉积特性。其次，详细研究了纳米粒子在化学镀薄膜中的共沉积机理。结果表明，纳米金刚石颗粒表面吸附了金属离子，形成了共沉积的薄膜。结果表明，柠檬酸镍络合物能有效地吸附在纳米金刚石颗粒表面，并与纳米金刚石颗粒大量共沉积。溶液中粒子的电荷似乎对共沉积机理没有影响。透射电子显微镜观察未见颗粒聚集现象。研究还发现，直接观察纳米金刚石颗粒是不可能的。

项目成果

松原 浩, 田澤尚志, 斉藤信雄, 西山 洋, 井上泰宣, 黛 政男: "無電解ニッケルめっき膜中へのクラスターダイヤモンド微粒子の共析"表面技術. 第54巻第5号. 374-375 (2003)

Hiroshi Matsubara、Naoshi Tazawa、Nobuo Saito、Hiroshi Nishiyama、Yasunobu Inoue、Masao Mayuzumi：“化学镀镍膜中簇状金刚石细颗粒的共析体”表面技术，第 54 卷，第 5 期。374-375 (2003)。

Hiroshi MATSUBARA, Mikinori KOBAYASHI, Hiroshi NISHIYAMA, Nobuo SAITO, Yasunobu INOUE, Masao MAYUZUMI: "Co-Deposition Characteristics of Nanodiamond Particles in Electrolessly Plated Nickel Film"Electrochemistry. 72. 446-448 (2004)

Hiroshi MATSUBARA、Mikinori KOBAYASHI、Hiroshi NISHIYAMA、Nobuo SAITO、Yasunobu INOUE、Masao MAYUZUMI：“化学镀镍膜中纳米金刚石颗粒的共沉积特性”电化学。

松原 浩, 田澤尚志, 斉藤信雄, 西山 洋, 井上泰宜, 黛 政男: "無電解ニッケルめっき膜中へのクラスターダイヤモンド微粒子の共析"表面技術. 第54巻第5号. 374-375 (2003)

Hiroshi Matsubara、Naoshi Tazawa、Nobuo Saito、Hiroshi Nishiyama、Yasunori Inoue、Masao Mayuzumi：“将簇状金刚石微粒共沉积到化学镀镍膜中”《表面技术》第 54 卷，第 5 期。374-375 (2003)。

Hiroshi MATSUBARA, Mikinori KOBAYASHI, Hiroshi NISHIYAMA, Nobuo SAITO, Yasunobu INOUE, Masao MAYUZUMI: "Co-deposition Characteristics of Nanodiamond Particles in Electrolessly Plated Nickel Films"Electrochemistry. Vol.72,No.6(印刷中). (2004)

Hiroshi MATSUBARA、Mikinori KOBAYASHI、Hiroshi NISHIYAMA、Nobuo SAITO、Yasunobu INOUE、Masao MAYUZUMI：“化学镀镍薄膜中纳米金刚石颗粒的共沉积特性”电化学第 72 卷，第 6 期（出版中）。

Hiroshi MATSUBARA, Mikinori KOBAYASHI, Hiroshi NISHIYAMA, Nobuo SAITO, Yasunobu INOUE, Masao MAYUZUMI: "Co-deposition Characteristics of Nanodiamond Particles in Electrolessly Plated Nickel Films"Electrochemistry. Vol.72,No.6. 446-448 (2004)

Hiroshi MATSUBARA、Mikinori KOBAYASHI、Hiroshi NISHIYAMA、Nobuo SAITO、Yasunobu INOUE、Masao MAYUZUMI：“化学镀镍薄膜中纳米金刚石颗粒的共沉积特性”电化学。