Formation of Metal Films on Magnesium by Photoinduced Autocatalytic Deposition

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Thin films comprised of ultrafine titanium dioxide particles have been formed on magnesium alloy (AZ31) substrates. Autocatalytic deposition of metal is initiated by UV irradiation onto the TiO_2 coated magnesium alloy substrates. The metal deposition occurs only on the irradiated part of substrate, thus the photo-patterning of autocatalytically deposited metal films can be achieved without photoresist. Anodized magnesium alloy substrates have relatively high corrosion resistance. Even such anodized substrates are easily corroded by immersion into a common solution for autocatalytic plating of nickel phosphorus alloy. In order to keep the substrates in the plating solution, the pH of plating solution should be higher than the corrosion limit of magnesium alloy. Highly basic solutions for autocatalytic deposition of nickel phosphorus alloy or pure nickel films have been developed. In some cases of using such plating solutions, a two-step catalyzation pretreatment for electroless plating can be applied for the initiation of metal film deposition onto the magnesium alloy substrates. Adsorbates formed on non-conducting substrates by the pretreatment have been investigated.