Formation of Metal Films on Magnesium by Photoinduced Autocatalytic Deposition

光诱导自催化沉积在镁上形成金属薄膜

• 批准号: 14550706
• 负责人: YAE Shinji
• 金额: $ 1.54万
• 依托单位: Himeji Institute of Technology
• 依托单位国家: 日本
• 项目类别: Grant-in-Aid for Scientific Research (C)
• 财政年份: 2002
• 资助国家: 日本
• 起止时间: 2002 至 2003
• 项目状态: 已结题
• 来源: https://kaken.nii.ac.jp/grant/KAKENHI-PROJECT-14550706/
• 关键词: Magnesium Alloy; Photo-Patterning; Photocatalyst; Corrosion Resistibility; Titanium Dioxide; Catalyzation Pretreatment; Eelctroless Plating; Nickel; 半導体超微粒子; 光電気化学

Thin films comprised of ultrafine titanium dioxide particles have been formed on magnesium alloy (AZ31) substrates. Autocatalytic deposition of metal is initiated by UV irradiation onto the TiO_2 coated magnesium alloy substrates. The metal deposition occurs only on the irradiated part of substrate, thus the photo-patterning of autocatalytically deposited metal films can be achieved without photoresist. Anodized magnesium alloy substrates have relatively high corrosion resistance. Even such anodized substrates are easily corroded by immersion into a common solution for autocatalytic plating of nickel phosphorus alloy. In order to keep the substrates in the plating solution, the pH of plating solution should be higher than the corrosion limit of magnesium alloy. Highly basic solutions for autocatalytic deposition of nickel phosphorus alloy or pure nickel films have been developed. In some cases of using such plating solutions, a two-step catalyzation pretreatment for electroless plating can be applied for the initiation of metal film deposition onto the magnesium alloy substrates. Adsorbates formed on non-conducting substrates by the pretreatment have been investigated.

在镁合金（AZ31）表面制备了由超细二氧化钛颗粒组成的薄膜。采用紫外光照射法在镁合金表面自催化沉积TiO_2。金属沉积仅发生在衬底的被照射部分上，因此可以在没有光刻胶的情况下实现自催化沉积的金属膜的光图案化。阳极化镁合金基材具有相对高的耐腐蚀性。即使这样的阳极化基材也容易通过浸入用于镍磷合金的自催化电镀的普通溶液中而被腐蚀。为了使基体保持在镀液中，镀液的pH应高于镁合金的腐蚀极限。已经开发了用于镍磷合金或纯镍膜的自催化沉积的高碱性溶液。在使用这样的镀液的一些情况下，可以应用用于化学镀的两步催化预处理来引发金属膜沉积到镁合金基底上。研究了预处理后在非导电基体上形成的吸附物。

项目成果

岡本尚樹, 八重真治, 山岸憲史, 三俣宜明, 福室直樹, 渡辺 徹, 松田 均: "無電解めっきの活性化前処理に用いられるセンシタイジング液の経時変化"表面技術. 55・4. 281-285 (2004)

Naoki Okamoto、Shinji Yae、Kenji Yamagishi、Yoshiaki Mitsumata、Naoki Fukumuro、Toru Watanabe、Hitoshi Matsuda：“用于化学镀活化预处理的敏化液随时间的变化” 55・4 (2004)。

山岸憲史, 八重真治, 岡本尚樹, 福室直樹, 松田 均: "無電解めっきの二液法活性化前処理により非導電性基板上に形成される吸着物"表面技術. 54・2. 150-154 (2003)

Kenji Yamagishi、Shinji Yae、Naoki Okamoto、Naoki Fukumuro、Hitoshi Matsuda：“通过化学镀的二组分活化预处理在非导电基材上形成吸附剂”表面技术 54・2 (2003)。

八重真治, 濱田隆弘, 横山敦之, 伊藤 潔, 福室直樹, 松田 均: "ヒドラジンを還元剤とする無電解純ニッケルめっきの浴組成の単純化"表面技術. 55・1. 89-90 (2004)

Shinji Yae、Takahiro Hamada、Atsuyuki Yokoyama、Kiyoshi Ito、Naoki Fukumuro、Hitoshi Matsuda：“使用肼作为还原剂的化学镀纯镍浴组合物的简化”Surface Technology 55・1。

S.Yae, T.Hamada, A.Yokoyama, K.Ito, N.Fukumuro, H.Matsuda: "Simplification of Solution Composition of Electroless Pure Ni Plating Using Hydrazine as a Reducing Agent"J.Surf.Fin.Soc.Jpn.. Vol.55. 89-90 (2004)

S.Yae、T.Hamada、A.Yokoyama、K.Ito、N.Fukumuro、H.Matsuda：“使用肼作为还原剂简化化学镀纯镍的溶液成分”J.Surf.Fin.Soc.Jpn

K.Yamagishi, N.Okamoto, H.Ukawa, N.Fukumuro, S.Yae, H.Matsuda: "Microscopical Morphology of Adsorbate Produced During Two--Step Catalyzation Pretreatment and Deposit Formed at Initial Stage of Electroless Ni-P Deposition on Non-Conductive Substrates"J.Sur

K.Yamagishi、N.Okamoto、H.Ukawa、N.Fukumuro、S.Yae、H.Matsuda：“两步催化预处理过程中产生的吸附物的微观形态以及化学镀 Ni-P 沉积初始阶段形成的沉积物