Study on Narrow Tube Inner Coating Method by Harmonic ECR Plasma

谐波ECR等离子体窄管内涂层方法研究

• 批准号: 16340184
• 负责人: FUJIYAMA Hiroshi
• 金额: $ 9.22万
• 依托单位: Nagasaki University
• 依托单位国家: 日本
• 项目类别: Grant-in-Aid for Scientific Research (B)
• 财政年份: 2004
• 资助国家: 日本
• 起止时间: 2004 至 2006
• 项目状态: 已结题
• 来源: https://kaken.nii.ac.jp/grant/KAKENHI-PROJECT-16340184/
• 关键词: plasma; micro plasma; micro devices; micro machine; plasma processing; マイクロプラズマ; 小型化; スパッタリング; コーティング; 細管

For the inner surface coating of narrow tubes, we have investigated pulsed coaxial sputtering process with the micro plasmas in a magnetic field, especially, the 2nd harmonic electron cyclotron resonance (ECR) plasmas. Resonant confinement of electrons at the 2nd harmonic ECR leads to interesting micro plasma characteristics: the higher electron density, the lower plasma potential, the lower electron temperature and the effective power absorption compared with ECR condition.As a result of detailed investigation of temporal evolutions of the target ion current and voltage, we found that the selection rule of pulse bias voltage and gap length. The target ion current was measured at uniform type, and the ion current is decreased with increasing the target bias voltage. Expansion of a sheath width can be considered as this reason. When the uniform type and the mirror type are compared, it is understood that the tendency to the ion current density was the same. However, the ion current density was higher than that of uniform type one. It is considered that the increase of ion current density in mirror-type is caused by decreased axial electron loss by mirror effect. From this result, it is understood that plasma density was higher than that of uniform type one.As a result, we have succeeded in sputter coating of Au films onto the inner surface of insulated narrow tube with 1mm inner diameter by using Xe gas. And it was performed that inner coating of narrow tube with 40mm length by using scanning-mirror-type magnetic field.

针对窄管内壁镀膜，研究了磁场中微等离子体，特别是二次谐波电子回旋共振（ECR）等离子体的脉冲同轴溅射工艺。在二次谐波ECR条件下，电子的共振约束导致了有趣的微等离子体特性：与ECR条件相比，更高的电子密度、更低的等离子体电势、更低的电子温度和更低的有效功率吸收.通过对靶离子电流和电压随时间的变化的详细研究，发现了脉冲偏压和间隙长度的选择规律.在均匀型下测量了靶离子流，离子流随靶偏压的增加而减小。护套宽度的扩大可以被认为是这个原因。当比较均匀型和镜面型时，可以理解离子电流密度的趋势是相同的。但是，离子流密度高于均匀型。认为镜面型离子流密度的增加是由于镜面效应减少了轴向电子损失所致。结果表明，等离子体密度高于均匀型等离子体密度，并成功地用氩气在内径为1mm的绝缘细管内表面溅射镀制了Au膜。并利用扫描镜式磁场对40mm长的窄管进行了内镀。

项目成果

Functional Sputter-Coatings of Inner Surface of Narrow Tubes by the Second Harmonic Electron Cyclotron Resonance Plasmas

二次谐波电子回旋共振等离子体对窄管内表面进行功能性溅射涂层

• 发表时间: 2006
• 期刊: Proc.The 9th Joint Symposium of Nagasaki University and Cheju National University on Science and Technology
• 作者: T.Saida;M.Sasao;M.Isobe;A.V.Krasilnikov;R.Kumazawa;T.Mutoh;T.Watari;T.Seki;K.Saito;M. Sasao;笹尾真実子;M. Sasao,;M. Sasao;M. Sasao^1;M. Sasao;M. Sasao;M. Sasao;K. Okada;S.KITAJIMA;S. KITAJIMA;H.Fujiyama;Y.Nitta;Y.Nitta;H.Fujiyama
• 通讯作者: H.Fujiyama

Micro/Nano-Plasma Technology and Industrial Application

微纳等离子体技术及工业应用

• 发表时间: 2006
• 期刊: CMC Books
• 作者: Y.Nitta;H.Uchida;T.Nakatani;H.Fujiyama;H.Fujiyama
• 通讯作者: H.Fujiyama

Narrow Tube Inner Coating by Low Pressure Micro Plasma Sputtering,

低压微等离子体溅射窄管内涂层，

• 发表时间: 2005
• 期刊: Proc.of the 17^<th> International Symposium on Plasma Chemistry (ISPC-17)
• 作者: H.Uchida;M.Kumamoto;H.Fujiyama;M.Shinohara;Y.Matsuda
• 通讯作者: Y.Matsuda

極細長軸体へのコーティング方法および極細長軸体へのコーティング装置

超薄长轴体的涂覆方法及超薄长轴体的涂覆装置

• 发表时间: 2006

Inner Wall Coating of Narrow Tube by Low-pressure and Hifh Frequency Microplasmas

低压高频微等离子体窄管内壁涂层

• 发表时间: 2006
• 期刊: Proc. of the 6th International Conference on Reactive Plasmas and 23rd Symposium on Plasma Processing (ICRP-6/SPP-23) P-3A-59
• 作者: T.Saida;M.Sasao;M.Isobe;A.V.Krasilnikov;R.Kumazawa;T.Mutoh;T.Watari;T.Seki;K.Saito;M. Sasao;笹尾真実子;M. Sasao,;M. Sasao;M. Sasao^1;M. Sasao;M. Sasao;M. Sasao;K. Okada;S.KITAJIMA;S. KITAJIMA;H.Fujiyama;Y.Nitta
• 通讯作者: Y.Nitta