Development of plasma synthesis technology for advanced complex compound materials based on mass-selective momentum control

基于质量选择动量控制的先进复杂复合材料等离子体合成技术发展

• 批准号: 16360356
• 负责人: SATO Naoyuki
• 金额: $ 9.66万
• 依托单位: Ibaraki University
• 依托单位国家: 日本
• 项目类别: Grant-in-Aid for Scientific Research (B)
• 财政年份: 2004
• 资助国家: 日本
• 起止时间: 2004 至 2006
• 项目状态: 已结题
• 来源: https://kaken.nii.ac.jp/grant/KAKENHI-PROJECT-16360356/
• 关键词: plasma processing; transparent conductive film; ponderomotive force; stoichiometry control; momentum control; orientation control; oxygen plasma; zinc vaporization; 透明導電膜; 亜鉛蒸発

We have developed the experimental apparatus of new plasma processing oriented to the advanced functional oxide compounds such as ZnO film, applying the mass-selective momentum control based on the ponderomotive force on the magnetized ions. The ponderomotive potential generated by the localized rf electric field with the frequency ω is superimposed on the collision-less sheath of the sample substrate. Then the composition and crystal orientation of ZnO are expected to be controlled just before the substrate by varying ω near the cyclotron frequency Ω_o (or Ω_<zn>) and Ω_o (orΩ_<zn>)-ω, respectively. Although the oxide dominates the carrier concentration and is very sensitive for process pressure and temperature, this new way could draw more the theoretical properties of the oxide compounds than the conventional sputtering type.The flux depression of oxygen ion upon the substrate has been demonstrated accompanying with the ponderomotive effect on the magnetized reactive molecular ion. … More This phenomenon connecting to mass-selective momentum control is applied to synthesis the ZnO transparent conductive film with lower resistivity comparable to the Indium based film. The enhancement of ponderomotive force, being necessary for high selectivity of cyclotron ion's species, is expected to appear by decelerating ion's initial velocity proportional to the square root of electron temperature in a plasma. To confirm this expectation even in a plasma, we have prepared the low-temperature plasma extracted from ECR oxygen plasma around a pressure of 10^<-2> Pa and investigated the enhancement effect of the ponderomotive force against electron temperature.The mixture plasma source is developed by evaporating zinc into ECR oxygen plasma confined by the axial magnetic field. The O^+, O_2^+, and Zn^+ exist in our plasma at a low pressure of 10^<-2> Pa when oven temperature exceeds around 400℃. The vapor source can move 3-dimensionally, searching the more proper deposition geometry with in-situ mass-spectroscopy and/or film thickness measurement. The resistivity measurement of ZnO transparent conductive film has been performed during the deposition.It is found that the resistivity of film with 〜 100 nm thickness decreases until 〜 10^<-4>Ωcm when ω approaches to the cyclotron frequency for the singly charged oxygen molecular. This phenomenon is considered to be attributed to the reflection of the oxygen molecular ion due to the ponderomotive force. Less

我们已经开发了针对先进功能性氧化物化合物（例如ZnO膜）的新等离子体加工的实验设备，并基于磁化磁化力应用质量选择性动量控制。带有频率ω的局部RF电场产生的蓬代电位叠加在样品底物的无碰撞鞘上。然后，ZnO的组成和晶体方向预计将在氧化物主导载体浓度之前受到控制，并且对过程压力和温度非常敏感，这种新方法比传统的溅射类型相比，这种新方法可以吸引更多的氧化物化合物的理论特性。氧气对氧化的氧气抑制对底物的变化效应是有效的。 …更多的现象将连接到质量选择动量控制的现象应用于ZnO透明导电膜，其耐药性较低，与基于inim的膜相当。预计将通过与等离子中电子温度的平方根成正比的初始速度减速，预计将出现浮动力的增强，这对于高选择性的种群的高选择性是必要的。为了确认这一期望，即使在血浆中，我们已经准备了从ECR氧血浆中提取的低温等离子体，围绕10^<-2> PA的压力，研究了浮珠性针对电子温度的增强效应。混合物源源是通过将锌蒸发到ECR氧气中的锌等离子磁性的氧化量来开发的。当烤箱温度超过400℃时，在我们的血浆中，O^+，O_2^+和Zn^+以10^<-2> pA的速度存在。蒸气源可以在3维移动，通过原位质谱和/或膜厚度测量搜索更合适的沉积几何形状。在沉积过程中，已经进行了ZnO透明导电膜的抗性测量。发现，〜100 nm厚度的膜的电阻降低，直到〜10^<-4>ωcm当ω接近循环频率以获得单电荷氧的氧气频率。该现象被认为归因于由于硫代球引起的氧分子离子的反射。较少的

项目成果

The flux control of ion incident upon the substrate in oxygen plasma for ZnO film synthesis based on mass-selective momentum control

基于质量选择动量控制的氧等离子体中入射到基板上的离子通量控制用于 ZnO 薄膜合成

• 发表时间: 2006
• 期刊: Proceeding of the 6^<th> International Conference on Reactive Plasmas and 23^<rd> Symposium on Plasma Processing AP061201・P-1A-06
• 作者: N.Y;Sato・K;Kinoshita・Y;Nakano・T;Ikehata・S;Yamauchi・J;Oonuki
• 通讯作者: Oonuki

動重力効果を利用したイオンの選択的運動量制御によるZnO薄膜合成の実験準備

利用动态重力效应选择性动量控制离子合成 ZnO 薄膜的实验准备

• 发表时间: 2004
• 期刊: 電気学会プラズマ研究会資料 PST-04-28
• 作者: Yasushi Nakano;Naoyuki Sato;Takashi Ikehata;Satoshi Yamauchi;Jin Oonuki;佐藤直幸・中野恭嗣・池畑 隆・山内 智・大貫 仁
• 通讯作者: 佐藤直幸・中野恭嗣・池畑 隆・山内 智・大貫 仁

質量選択的運動量制御によるZnO薄膜の合成に向けた磁場中酸素プラズマへの亜鉛蒸気導入

将锌蒸气引入磁场中的氧等离子体中，通过质量选择动量控制合成 ZnO 薄膜

• 发表时间: 2005
• 期刊: 第65回応用物理学会学術講演会講演予稿集 No.2・30a-E-6
• 作者: 佐藤直幸;中野恭嗣;池畑 隆;山内 智;大貫 仁
• 通讯作者: 大貫 仁

質量選択的運動量制御に向けた亜鉛・酸素混合プラズマ中の透明導電膜合成

锌氧混合等离子体中合成透明导电薄膜用于质量选择动量控制

• 发表时间: 2008
• 期刊: 電気学会プラズマ研究会資料 PST-08-13
• 作者: H.Murakami;T.Yano;S.Sodeoka;村上秀之(分担);山本祐輝;橋本麻由;野中脩平;Yuki Yamamoto;Mayu Hashimoto;Shuhei Nonaka;橋本麻由;野中脩平;Il-Doo Kim;稗田耕士;Avner Rothschild;Seiichiro Itami;Koji Hieda;兵頭健生;Seiichiro Itami;Takeo Hyodo;Koji Hieda;Avner Rothschild;Seiichiro Itami;Koji Hieda;Takeo Hyodo;稗田耕士;Avner Rothschild;Seiichiro Itami;Koji Hieda;兵頭健生;Seiichiro Itami;Takeo Hyodo;II-Doo Kim;Takeo Hyodo;Yasuhiro Shimizu;伊丹誠一郎;Takeo Hyodo;Yasuhiro Shimizu;Huankiat Seh;Yasuhiro Shimizu;柴田浩希;Takeo Hyodo;Yasuhiro Shimizu;Seiichiro Itami;Takeo Hyodo;Makoto Egashira;Yasuhiro Shimizu;Seiichiro Itami;Huankiat Seh;Yasuhiro Shimizu;Hiroki Shibata;Takeo Hyodo;Yasuhiro Shimizu;Huankiat Seh;Takeo Hyodo;Takako Ishibashi;Harry L.Tuller;Makoto Egashira;Yasuhiro Shimizu;Takeo Hyodo;Yasuhiro Shimizu;Seiichiro Itami;伊丹誠一郎;Takeo Hyodo;Yasuhiro Shimizu;Yasuhiro Shimizu;Huankiat Seh;Takeo Hyodo;Takako Ishibashi;Yasuhiro Shimizu;大宅修平;Takeo Hyodo;Huankiat Seh;Yasuhiro Shimizu;Shuhei Ohya;Takeo Hyodo;Yasuhiro Shimizu;Yasuhiro Shimizu;Yasuhiro Shimizu;Yasuhiro Shimizu;Yasuhiro Shimizu;佐藤直幸・薮内祐二・菅谷聡一・池畑 隆・山内 智・大貫 仁;佐藤直幸・小松良寛・池畑 隆・山内 智・大貫 仁
• 通讯作者: 佐藤直幸・小松良寛・池畑 隆・山内 智・大貫 仁

Production of low temperature plasma under low pressure for complex compound synthesis by mass-selective momentum control

通过质量选择动量控制在低压下产生用于复杂化合物合成的低温等离子体

• 作者: Naoyuki Sato;Kousuke Kinoshita;Takashi Ikehata;Satoshi Yamauchi
• 通讯作者: Satoshi Yamauchi