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Development of High Efficiency Gas Treatment System by Pulsed Electron Beam Irradiation

Development of High Efficiency Gas Treatment System by Pulsed Electron Beam Irradiation
脉冲电子束辐照高效气体处理系统的研制
批准号:
17360122
负责人:
WATANABE Masato
金额:
$9.02万
依托单位国家:
日本
项目类别:
Grant-in-Aid for Scientific Research (B)
财政年份:
2005
资助国家:
日本
项目状态:
已结题
起止时间:
2005 至 2006

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中文摘要
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英文摘要
The purpose of this research project is to develop an effective gaseous treatment system in order to reduce the emission of gaseous compounds including Volatile Organic Compounds (VOCs).A low-energy secondary emission electron gun (SEEG) using wire ion plasma source (WIPS) was applied to generate electron beams. The characteristics of ion beam and secondary electron beam were investigated in order to achieve main objective, which is to increase removal efficiency of VOCs using SEEG. The results of ion beam current measurement showed that there were some limitations at electron accelerating chamber, so the pressure at WIPS can be optimized for 20 mTorr. Distribution of electron beam energy at gas treatment chamber was measured using photosensitive film and it was observed that electron beam filtered in through the electron window at 63 kV and there expected to be small energy losses at the accelerating voltage of 100 kV. At 100 kV, the electron beam reaches the distance as high as 80 mm from electron window and performs enough energy distribution at the dimension of (27x373x60) mm3.Decomposition of benzene and trichloroethylene were studied at the accelerating voltage of 100 kV, the gas volume of 6 L. The degrees of decomposition at the shot number of 1000 were observed as 60 % for benzene and 70 % for trichloroethylene, respectively. The results show that 90 % decomposition of benzene at a flow rate of 3 L/s can be achieved at pulse repetition rate of 2 kHz and SEEG is a promising device for treating VOCs at a small-scale industrial corporation or a smoking area.
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会议论文
Purification of Gaseous Pollutant using Secondary Emission Electron Beam generated by Wire Discharge Plasma Source
利用线放电等离子体源产生的二次发射电子束净化气态污染物
DOI: --
发表时间: 2005
期刊: Bulletin of the American Physical Society Vol.50, No.7
影响因子: --
作者: [Masato Watanabe, Yusuke Sakai, Eiki Hotta]
通讯作者: Eiki Hotta
DOI: --
发表时间: 2006
期刊: Europhysics Conference Abstract 30(CD-ROM)
影响因子: --
作者: [M.Watanabe, A.Fukamachi, A.Okino, K.C.Ko, E.Hotta]
通讯作者: E.Hotta
TREATMENT OF VOLATILE ORGANIC COMPOUNDS USING SECONDARY EMISSION ELECTRON GUN
使用二次发射电子枪处理挥发性有机化合物
DOI: --
发表时间: 2006
期刊: 2006 IEEE International Conference on Plasma Science
影响因子: --
作者: [M.Watanabe, A.Fukamachi, A.Okino, E.Hotta, K.C.Ko]
通讯作者: K.C.Ko
DOI: --
发表时间: 2006
期刊: Abstracts of 16th International Conference of High-Power Particle Beams
影响因子: --
作者: [M.Watanabe, A.Fukamachi, A.Okino, K.C.Ko, E.Hotta]
通讯作者: E.Hotta
8
    Pulsed electron beam generation and bacterial sterilization using secondary electron emission gun
    • 批准号:
      25420245
    • 项目类别:
      Grant-in-Aid for Scientific Research (C)
    • 资助金额:
      $3.24万
    • 财政年份:
      2013
    • 负责人:
      WATANABE Masato
    • 依托单位:
    Study on Transport phenomena at supercritical mixure interface by moelcular velocity distribution function and mean field kinetic theory
    • 批准号:
      23656122
    • 项目类别:
      Grant-in-Aid for Challenging Exploratory Research
    • 资助金额:
      $2.5万
    • 财政年份:
      2011
    • 负责人:
      WATANABE Masato
    • 依托单位:
    Development of High-speed Gas Flow Debris Shielding Technology for Discharge Produced Plasma Light Source
    • 批准号:
      19560282
    • 项目类别:
      Grant-in-Aid for Scientific Research (C)
    • 资助金额:
      $2.91万
    • 财政年份:
      2007
    • 负责人:
      WATANABE Masato
    • 依托单位:
    High efficiency gas treatment using bi-directional pulse power system
    • 批准号:
      13555079
    • 项目类别:
      Grant-in-Aid for Scientific Research (B)
    • 资助金额:
      $8.83万
    • 财政年份:
      2001
    • 负责人:
      WATANABE Masato
    • 依托单位:
    海外基金