Development of Nano-periodic X-ray Multilayer Films for Hard X-ray Optics

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High-precision Pt/C multilayer films for the hard x-ray optical applications were fabricated using ECR ion beam sputtering system. Grazing incidence x-ray reflectometry (GDR) and transmission electron microscopy (TEM) studies were performed for measurement of thin film thickness, and evaluation of multilayer structures. From the result of TEM observations, multilayer film was smoothly laminated with no macroscopic structural defect. For the fitting analysis of GIXR intensity profiles, multiply divided structure models were employed to evaluate the deviation of stacking period. It was demonstrated that the deviation of the period, in the 50 layer-pairs, was less than 0.25% (0.01nm), after a development of deposition conditions.