Development of Nano-periodic X-ray Multilayer Films for Hard X-ray Optics

用于硬X射线光学的纳米周期X射线多层膜的开发

基本信息

  • 批准号:
    18560117
  • 负责人:
  • 金额:
    $ 2.39万
  • 依托单位:
  • 依托单位国家:
    日本
  • 项目类别:
    Grant-in-Aid for Scientific Research (C)
  • 财政年份:
    2006
  • 资助国家:
    日本
  • 起止时间:
    2006 至 2007
  • 项目状态:
    已结题

项目摘要

High-precision Pt/C multilayer films for the hard x-ray optical applications were fabricated using ECR ion beam sputtering system. Grazing incidence x-ray reflectometry (GDR) and transmission electron microscopy (TEM) studies were performed for measurement of thin film thickness, and evaluation of multilayer structures. From the result of TEM observations, multilayer film was smoothly laminated with no macroscopic structural defect. For the fitting analysis of GIXR intensity profiles, multiply divided structure models were employed to evaluate the deviation of stacking period. It was demonstrated that the deviation of the period, in the 50 layer-pairs, was less than 0.25% (0.01nm), after a development of deposition conditions.
采用ECR离子束溅射系统制备了高精度的硬X射线光学用Pt/C多层膜。掠入射X射线反射仪(GDR)和透射电子显微镜(TEM)的研究进行测量的薄膜厚度,和多层结构的评价。从TEM观察结果来看,多层膜层合光滑,没有宏观结构缺陷。在GIXR强度剖面的拟合分析中,采用多重分割结构模型来评价叠加周期的偏差。实验结果表明,在改变了沉积条件后,在50个层对中,周期的偏差小于0.25%(0.01nm)。

项目成果

期刊论文数量(0)
专著数量(0)
科研奖励数量(0)
会议论文数量(0)
专利数量(0)
ECRイオンビームスパッタ法によるPt/C硬X線多層膜の成膜と評価
ECR离子束溅射法沉积Pt/C硬X射线多层膜并评价
  • DOI:
  • 发表时间:
    2007
  • 期刊:
  • 影响因子:
    0
  • 作者:
    S. Ito;et. al.;神谷 佳裕
  • 通讯作者:
    神谷 佳裕
Epitaxial Growth of Er, Ti Doped LiNbO_3 Films Prepared by Sol-Gel Method
溶胶-凝胶法外延生长Er、Ti掺杂LiNbO_3薄膜
Fabrication of Nano-periodic X-ray Multilayer Films by ECR Ion-beam Sputtering
ECR离子束溅射制备纳米周期X射线多层膜
  • DOI:
  • 发表时间:
    2007
  • 期刊:
  • 影响因子:
    0
  • 作者:
    Y. Kamiya;et. al.
  • 通讯作者:
    et. al.
Epitaxial Growth of Er,Ti Doped LiNbO_3 Films Prepared by Sol-Gel Method
溶胶-凝胶法外延生长Er,Ti掺杂LiNbO_3薄膜
  • DOI:
  • 发表时间:
    2006
  • 期刊:
  • 影响因子:
    0
  • 作者:
    有泉直輝;吉田政弘;鈴木,鶴巻,吉田;有泉,吉田;花岡,吉田;M.Takahashi
  • 通讯作者:
    M.Takahashi
HRTEM Study of Calcium Fluoride Single Crystal Surfaces Processed by Ultraprecision Machining
超精密加工氟化钙单晶表面的 HRTEM 研究
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OHNISHI Naoyuki其他文献

OHNISHI Naoyuki的其他文献

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{{ truncateString('OHNISHI Naoyuki', 18)}}的其他基金

Nanostructure analysis and laser damage mechanism of ultra-precision polished surface of calcium fluoride single crystals for high-power DUV applications.
高功率 DUV 应用氟化钙单晶超精密抛光表面的纳米结构分析和激光损伤机制。
  • 批准号:
    14350077
  • 财政年份:
    2002
  • 资助金额:
    $ 2.39万
  • 项目类别:
    Grant-in-Aid for Scientific Research (B)
Rltraprecision Machinig of Optical Materials for Deep Ultra Violet Lasers of High Brightness and Improvement of Optical Performancs
高亮度深紫外激光器光学材料的超精密加工及光学性能的提高
  • 批准号:
    11450063
  • 财政年份:
    1999
  • 资助金额:
    $ 2.39万
  • 项目类别:
    Grant-in-Aid for Scientific Research (B)
Crystal Structure Analysis of Zeolites by Quantitative HRTEM Study
通过定量 HRTEM 研究分析沸石的晶体结构
  • 批准号:
    07650776
  • 财政年份:
    1995
  • 资助金额:
    $ 2.39万
  • 项目类别:
    Grant-in-Aid for Scientific Research (C)

相似海外基金

Nanotechnology Applied Research and Development Using Ion Beam Sputtering
使用离子束溅射的纳米技术应用研究和开发
  • 批准号:
    461455-2013
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  • 批准号:
    02805035
  • 财政年份:
    1990
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    $ 2.39万
  • 项目类别:
    Grant-in-Aid for General Scientific Research (C)
Synthesis of Functional Ceramics Thin Films by Dual Ion Beam Sputtering Method
双离子束溅射法合成功能陶瓷薄膜
  • 批准号:
    02453071
  • 财政年份:
    1990
  • 资助金额:
    $ 2.39万
  • 项目类别:
    Grant-in-Aid for General Scientific Research (B)
Development of a new ion-beam sputtering apparatus and its application for scanning electron microscopy.
新型离子束溅射装置的研制及其在扫描电子显微镜中的应用
  • 批准号:
    59870002
  • 财政年份:
    1984
  • 资助金额:
    $ 2.39万
  • 项目类别:
    Grant-in-Aid for Developmental Scientific Research
Specialized Research Equipment: Ion-Beam Sputtering System For Research in Optics
专业研究设备:用于光学研究的离子束溅射系统
  • 批准号:
    8203457
  • 财政年份:
    1982
  • 资助金额:
    $ 2.39万
  • 项目类别:
    Standard Grant
Deposition of epitaxial Ga2O3 and (AlxGa1-x)2O3 thin films by ion beam sputtering: a systematic study
离子束溅射外延 Ga2O3 和 (AlxGa1-x)2O3 薄膜沉积:系统研究
  • 批准号:
    451986469
  • 财政年份:
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    $ 2.39万
  • 项目类别:
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Development of an ion beam sputtering process for 2 meter optics in astronomy - IBS2000
天文学中 2 米光学器件离子束溅射工艺的开发 - IBS2000
  • 批准号:
    452244676
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