Analyses of chemical reaction producing carbonized-metal for ULSI plasma etching process
Analyses of chemical reaction producing carbonized-metal for ULSI plasma etching process
批准号:
20760023
负责人:
TAKAHASHI Kazuo
金额:
$2.75万
依托单位国家:
日本
项目类别:
Grant-in-Aid for Young Scientists (B)
财政年份:
2008
资助国家:
日本
项目状态:
已结题
起止时间:
2008 至 2009
中文摘要
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英文摘要
This study was for plasma etching technology in fabrication of ULSI MOSFET gate with a few ten nm size and hafnium oxide as an insulating material. In CF_4/Ar plasmas with addition of CO or H_2 resulting in making the gas phase carbon-rich, the etch rates of Si and SiO_2 were decreased. On the other hand, that of HfO_2 was increased, which implied that HfO_2 could be etched in the reaction of carbonized-hafnium formed as an etch product.
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マイクロアレイ用基板及びその製造方法
微阵列基板及其制造方法
DOI:
--
发表时间:
2008
期刊:
影响因子:
--
作者:
[]
通讯作者:
高誘電率(High-k)材料のエッチング反応
高介电常数(High-k)材料的蚀刻反应
DOI:
--
发表时间:
2010
期刊:
Material Stage 5巻
影响因子:
--
作者:
[高橋和生, 高橋麗]
通讯作者:
高橋麗
COおよびH2添加CF4プラズマにおけるHfO2のエッチング特性
HfO2 在添加 CO 和 H2 的 CF4 等离子体中的蚀刻特性
DOI:
--
发表时间:
2010
期刊:
影响因子:
--
作者:
[美山遼, 高橋和生]
通讯作者:
高橋和生
COおよびH_2添加CF_4プラズマにおけるHfO_2のエッチング特性
HfO_2在CO和H_2添加CF_4等离子体中的刻蚀性能
DOI:
--
发表时间:
2010
期刊:
影响因子:
--
作者:
[美山遼, 高橋和生]
通讯作者:
高橋和生
Etching of diamond-like carbon in fluorocarbon plasmas
氟碳等离子体中类金刚石碳的蚀刻
DOI:
--
发表时间:
2008
期刊:
影响因子:
--
作者:
[Rei Takahashi, Kazuo Takahashi]
通讯作者:
Kazuo Takahashi
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