Epitaxial Growth and Electrical Property of Compositionally-modulated Boride Thin Films
Epitaxial Growth and Electrical Property of Compositionally-modulated Boride Thin Films
批准号:
21560029
负责人:
YOSHIMOTO Mamoru
金额:
$3.0万
依托单位国家:
日本
项目类别:
Grant-in-Aid for Scientific Research (C)
财政年份:
2009
资助国家:
日本
项目状态:
已结题
起止时间:
2009 至 2011
中文摘要
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英文摘要
In this study, epitaxial thin film of various hexaboride series including LaB6, BaB6, SrB6, CaB6,(La, Sr) B6, and(Sr, Ca) B6 s were fabricated successfully by means of laser molecular beam epitaxy(laser MBE). These epitaxial boride thin films are expected wide applications such as thermoelectric conversion materials, a high current density field emission flat source, and high-temperature electronic devices. Through the various film processing such as substrate-surface engineering were applied for development of film epitaxy, we could obtain the knowledge on the new material science concerning with the crystal growth of boron-octahedron cluster structure.
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DOI:
--
发表时间:
2010
期刊:
J. Appl. Phys.
影响因子:
--
作者:
[S. Kaneko, T. Nagano, K. Akiyama, T. Ito, M. Yasui, Y. Hirabayashi, H. Funakubo, and M. Yoshimoto]
通讯作者:
and M. Yoshimoto
Crystal Growth Control of Functional Oxide Thin Films on Nanopatterned Substrate Surfaces
纳米图案基底表面上功能性氧化物薄膜的晶体生长控制
DOI:
--
发表时间:
2009
期刊:
J. Laser Micro/Nanoengineering
影响因子:
--
作者:
[Y. Akita, Y. Sugimoto, K. Kobayashi, T. Suzuki, H. Oi, M. Mita and M. Yoshimoto]
通讯作者:
M. Mita and M. Yoshimoto
Nanoimprint Fabrication and Thermal Behavior of Atomically Ultrasmooth Glass Substrate with 0.2nm-Height Steps
0.2nm 高度台阶的原子级超光滑玻璃基板的纳米压印制造和热行为
DOI:
--
发表时间:
2011
期刊:
Jpn.J.Appl.Phys.
影响因子:
--
作者:
[Y.Miyake, Y.Akita, H.Oi, M.Mita, S.Kaneko, K.Koyama, K.Sunagawa, K.Tada, Y.Hirai, M.Yoshimoto]
通讯作者:
M.Yoshimoto
PLDによる不純物ドープMgOエピタキシャル薄膜の室温合成と評価
PLD 掺杂 MgO 外延薄膜的室温合成与评价
DOI:
--
发表时间:
2009
期刊:
影响因子:
--
作者:
[坂本純一, et al., 春木一夫,渡辺将章,佐藤英樹,齋藤弥八, 荒井秀樹,加藤侑志,白石尚輝,土嶺信男,小林晋,吉本護]
通讯作者:
荒井秀樹,加藤侑志,白石尚輝,土嶺信男,小林晋,吉本護
Room-Temperature Epitaxial Growth of (Li,Ni)O Thin Film with Li Content up to 60 mol %
室温%20外延%20生长%20of%20(Li,Ni)O%20薄%20薄膜%20with%20Li%20含量%20up%20to%2060%20mol%20%
DOI:
10.1143/jjap.49.108001
发表时间:
2010
期刊:
影响因子:
--
作者:
[N. Shiraishi, Yushi Kato, H. Arai, Nobuo Tsuchimine, Susumu Kobayashi, M. Mitsuhashi, M. Soga, S. Kaneko, M. Yoshimoto]
通讯作者:
M. Yoshimoto
共 22 条
Atomic-scale transcription of natural nano-pattern onto glassy materials
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批准号:24655188
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项目类别:Grant-in-Aid for Challenging Exploratory Research
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资助金额:$2.33万
-
财政年份:2012
-
负责人:YOSHIMOTO Mamoru
-
依托单位:
Science and technology of glass nanoimprint and its industrial applications
-
批准号:17360320
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项目类别:Grant-in-Aid for Scientific Research (B)
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资助金额:$7.85万
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财政年份:2005
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负责人:YOSHIMOTO Mamoru
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依托单位:
Room-Temperature Selective Homoepitaxial Growth of Functional Oxide Thin Films Induced by Electron Beam Irradiation and Its Application
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批准号:14350347
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项目类别:Grant-in-Aid for Scientific Research (B)
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资助金额:$5.06万
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财政年份:2002
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负责人:YOSHIMOTO Mamoru
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依托单位:
Epitaxial Growth of Diamond Thin Films on Large-scale Smooth Sapphire Substrate
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批准号:11450118
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项目类别:Grant-in-Aid for Scientific Research (B)
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资助金额:$4.03万
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财政年份:1999
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负责人:YOSHIMOTO Mamoru
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依托单位:
海外基金