Science and technology of glass nanoimprint and its industrial applications
玻璃纳米压印科学技术及其工业应用
基本信息
- 批准号:17360320
- 负责人:
- 金额:$ 7.85万
- 依托单位:
- 依托单位国家:日本
- 项目类别:Grant-in-Aid for Scientific Research (B)
- 财政年份:2005
- 资助国家:日本
- 起止时间:2005 至 2007
- 项目状态:已结题
- 来源:
- 关键词:
项目摘要
We investigated atomic-scale surface modifications of silicate glass by nanoimprint using an atomically stepped sapphire (α-Al_2O_3 single crystal) plate as nanopattern mold. The sapphire mold had regularly arranged straight atomic steps, with uniform height and terrace width of about 0.2 and 80 nm, respectively. During pressing, vertical positions of the sapphire mold and glass plate significantly affected the morphology of the imprinted glass surface. The nanopattern was transferred to the glass surface when the mold was set on the glass plate, while the nanowave pattern was formed on the glass surface when the glass plate was set on the mold. The Vickers hardness of the nanostriped glass was estimated to be higher than that of non-patterned glass, and the surface of the nanostriped glass was more hydrophobic than that of non-patterned glass. We fabricated indium tin oxide (ITO) thin films on nanoimprinted glass substrates using pulsed laser deposition (PLD). The surface of the ITO thin films well reflected the nanopattern of the glass substrate surface. The degree of crystalline orientation of the ITO thin films fabricated on the nanoimprinted glasses was more intense than that of the ITO thin films on the non-patterned commercial glass substrates. The resistivity of the ITO thin films deposited on the nanoimprinted glasses was lower by about 30% than that on the non-patterned commercial glasses, which was probably due to the higher crystal orientation of the films on the nanopatterned glass surfaces.
采用纳米压印技术,以具有原子级台阶的蓝宝石(α-Al_2O_3单晶)为模板,对硅酸盐玻璃进行了原子级表面修饰。蓝宝石模具具有规则排列的直原子台阶,具有分别约0.2和80 nm的均匀高度和平台宽度。在压制过程中,蓝宝石模具和玻璃板的垂直位置显著影响压印玻璃表面的形态。当将模具设置在玻璃板上时,纳米图案被转移到玻璃表面,而当将玻璃板设置在模具上时,在玻璃表面上形成波纹图案。纳米条纹玻璃的维氏硬度被估计为高于非图案化玻璃的维氏硬度,并且纳米条纹玻璃的表面比非图案化玻璃的表面更疏水。采用脉冲激光沉积法在纳米压印玻璃基底上制备了氧化铟锡薄膜。ITO薄膜的表面很好地反映了玻璃基板表面的纳米图案。在纳米压印玻璃上制备的ITO薄膜的结晶取向度比在非图案化商业玻璃基板上制备的ITO薄膜的结晶取向度更强烈。沉积在纳米压印玻璃上的ITO薄膜的电阻率比未图案化的商业玻璃低约30%,这可能是由于纳米图案化玻璃表面上的膜的较高晶体取向。
项目成果
期刊论文数量(0)
专著数量(0)
科研奖励数量(0)
会议论文数量(0)
专利数量(0)
Control of Nano-Step Structures on Sapphire Wafer Surface by Focused Ion Beam Processing
- DOI:10.2109/jcersj.113.478
- 发表时间:2005
- 期刊:
- 影响因子:1.1
- 作者:Atsuko Takeuchi;T. Kotaki;K. Koyama;K. Sunakawa;Y. Yaguchi;Yoshinori Matsui;M. Murasugi;S. Seki;S. Tagawa;W. Hara;M. Yoshimoto
- 通讯作者:Atsuko Takeuchi;T. Kotaki;K. Koyama;K. Sunakawa;Y. Yaguchi;Yoshinori Matsui;M. Murasugi;S. Seki;S. Tagawa;W. Hara;M. Yoshimoto
Nanoscale growth control of functional thin films on atomically surface- controlled substrates by laser MBE
利用激光 MBE 对原子表面控制基底上的功能薄膜进行纳米级生长控制
- DOI:
- 发表时间:2008
- 期刊:
- 影响因子:0
- 作者:W. Hara;M. Yoshimoto
- 通讯作者:M. Yoshimoto
Formation of a nanogroove-striped NiO surface using atomic steps
使用原子步骤形成纳米凹槽条纹 NiO 表面
- DOI:
- 发表时间:2006
- 期刊:
- 影响因子:0
- 作者:S. Akiba;A. Matsuda;H. Isa;M. Kasahara;S. Sato;T. Watanabe. W. Hara;M. Yoshimoto
- 通讯作者:M. Yoshimoto
Nanostripe Patterning of Glass Surface by Nanoimprint Using Self-organized Oxide Mold
使用自组织氧化物模具通过纳米压印在玻璃表面形成纳米条纹图案
- DOI:
- 发表时间:2009
- 期刊:
- 影响因子:0
- 作者:Y. Akita;Y. Kato;M. Hosaka;Y. Ono. S. Suzuki;A. Nakaiima;M. Yoshimoto
- 通讯作者:M. Yoshimoto
Transformation from an atomically stepped NiO thin film to a nanotape structure : A kinetic study using x-ray diffraction
从原子级 NiO 薄膜到纳米带结构的转变:使用 X 射线衍射的动力学研究
- DOI:
- 发表时间:2008
- 期刊:
- 影响因子:0
- 作者:O. Sakata;J. M. Soon;A. Matsuda;Y. Akita;M. Yoshimoto
- 通讯作者:M. Yoshimoto
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YOSHIMOTO Mamoru其他文献
YOSHIMOTO Mamoru的其他文献
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{{ truncateString('YOSHIMOTO Mamoru', 18)}}的其他基金
Atomic-scale transcription of natural nano-pattern onto glassy materials
天然纳米图案在玻璃材料上的原子级转录
- 批准号:
24655188 - 财政年份:2012
- 资助金额:
$ 7.85万 - 项目类别:
Grant-in-Aid for Challenging Exploratory Research
Epitaxial Growth and Electrical Property of Compositionally-modulated Boride Thin Films
成分调制硼化物薄膜的外延生长和电性能
- 批准号:
21560029 - 财政年份:2009
- 资助金额:
$ 7.85万 - 项目类别:
Grant-in-Aid for Scientific Research (C)
Room-Temperature Selective Homoepitaxial Growth of Functional Oxide Thin Films Induced by Electron Beam Irradiation and Its Application
电子束辐照诱导功能氧化物薄膜的室温选择性同质外延生长及其应用
- 批准号:
14350347 - 财政年份:2002
- 资助金额:
$ 7.85万 - 项目类别:
Grant-in-Aid for Scientific Research (B)
Epitaxial Growth of Diamond Thin Films on Large-scale Smooth Sapphire Substrate
大尺寸光滑蓝宝石衬底上外延生长金刚石薄膜
- 批准号:
11450118 - 财政年份:1999
- 资助金额:
$ 7.85万 - 项目类别:
Grant-in-Aid for Scientific Research (B)
相似海外基金
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23760119 - 财政年份:2011
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$ 7.85万 - 项目类别:
Grant-in-Aid for Young Scientists (B)
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- 批准号:
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$ 7.85万 - 项目类别:
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MRI: Aquisition of Nano-Imprint Lithography System
MRI:获得纳米压印光刻系统
- 批准号:
0521074 - 财政年份:2005
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Standard Grant
Position and Orientation Control of Si Thin-Film Crystal Grain Using Nano-Imprint Technology
利用纳米压印技术控制硅薄膜晶粒的位置和取向
- 批准号:
15360022 - 财政年份:2003
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