Development of hetero-structure control and opto-electronics device application technology based on III-nitride semiconductor nanowall crystal

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The selective area RF-MBE growth technology of artificially shape controlled thin GaN nano-crystal of "nanowall" was established. It was found that dislocation stopping mechanism at the bottom of nanowall brings about high quality dislocation-free crystal growth. Nanowall top shape control technique, growth conditions of embedded InGaN active layer and dependency of emission characteristics of InGaN/GaN nanowall was clarified. The potentiality of GaN nanowall for optical and electronic device application was proved by room temperature photo-pumped lasing of GaN nanowall and first demonstration of AlGaN/GaN heterostructure nano-FET.