Development of mirco DLC coating method using high-density plasma flow generated by pulsed arc discharge

利用脉冲电弧放电产生的高密度等离子流开发微 DLC 涂层方法

• 批准号: 21760581
• 负责人: KOUSAKA Hiroyuki
• 金额: $ 2.83万
• 依托单位: Nagoya University
• 依托单位国家: 日本
• 项目类别: Grant-in-Aid for Young Scientists (B)
• 财政年份: 2009
• 资助国家: 日本
• 起止时间: 2009 至 2010
• 项目状态: 已结题
• 来源: https://kaken.nii.ac.jp/grant/KAKENHI-PROJECT-21760581/
• 关键词: パルスアークプラズマ; アブレーション; ダイヤモンドライクカーボン; スリット内面; PTFE; 硬度; 水蒸気; 高密度プラズマ; 細穴内面; 硬さ; 摩擦係数

The possibility of diamond-like carbon coating to the inside of narrow slit (less than a few hundred microns in width) by using ultra-high-density plasma flow generated by pulsed arc discharge was investigated. It was revealed that inclusion of small amount of water molecule in coating chamber is effective to increase the hardness of the DLC film deposited by pulsed plasma ablation of PTFE. Then, DLC coating to slits 1.0, 0.5, 0.2 mm in width, which was made by 2 stainless-steel plate, was attempted ; the results showed that the length of 10 mm from the entrance of the silt was coated in the case of 1.0 mm slit, while almost no film was coated in the cases of 0.5 and 0.2 mm slits.

研究了利用脉冲电弧放电产生的超高密度等离子体流在窄缝（宽度小于几百微米）内沉积类金刚石碳的可能性。结果表明，在镀膜室中加入少量的水分子可以有效地提高脉冲等离子体烧蚀PTFE沉积的DLC膜的硬度。然后，尝试在由2块不锈钢板制成的宽度为1.0、0.5、0.2 mm的缝隙上涂覆DLC，结果表明，在1.0 mm缝隙的情况下，距离淤泥入口10 mm的长度上都涂覆了DLC膜，而在0.5和0.2 mm缝隙的情况下几乎没有涂覆薄膜。

项目成果

フッ素含有炭素材料の製造方法

含氟碳材料的制造方法

• 发表时间: 2010

MVP法により細穴内面に成膜されたDLC膜の軸方向の均一化

使用MVP方法在小孔内表面沉积DLC薄膜的轴向均匀性

• 发表时间: 2010
• 作者: 森一憲;上坂裕之;梅原徳次
• 通讯作者: 梅原徳次

High-density plasma generation using microwave propagation along plasma-sheath interface and its application to DLC coating

利用微波沿着等离子体-鞘层界面传播产生高密度等离子体及其在 DLC 涂层中的应用

• 发表时间: 2010
• 作者: M.Shahien;M.Yamada;T.Yasui;M.Fukumoto;H.Kousaka
• 通讯作者: H.Kousaka

Hardness increase of amorphous carbon film coated by pulsed-plasma ablation of PTFE

脉冲等离子体烧蚀PTFE涂层非晶碳膜的硬度增加

• 发表时间: 2010
• 作者: Shingo KAWARA;Hiroyuki KOIZUMI;Hiroyuki KOUSAKA;et.al.
• 通讯作者: et.al.

Surface Chemical Modification of Ciir Rubber by High Density Plasma Treatment

高密度等离子体处理对 Ciir 橡胶进行表面化学改性

• 发表时间: 2010
• 期刊: International Journal of Modern Physics B 24
• 作者: J.H.Kim;N.Umehara;H.Kousaka;M.Shimada;M.Hasegawa
• 通讯作者: M.Hasegawa