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Fabrication of highly-functional polymer surface using very-low-potential plasma and its evaluation

Fabrication of highly-functional polymer surface using very-low-potential plasma and its evaluation
极低电位等离子体制备高功能聚合物表面及其评价
批准号:
21760587
负责人:
TAKENAKA Kosuke
金额:
$2.83万
依托单位:
依托单位国家:
日本
项目类别:
Grant-in-Aid for Young Scientists (B)
财政年份:
2009
资助国家:
日本
项目状态:
已结题
起止时间:
2009 至 2010

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中文摘要
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英文摘要
For fabrication of highly-functional polymer surface, modification of plasma surface modification has been performed using inductivity-coupled plasma sources have been developed with multiple low-inductance antenna (LIA) modules, which have allowed low-voltage operation of ICPs. Non-destructive depth analysis of chemical bonding states showed that low-potential ICP of argon/oxygen mixture gas resulted in oxidation of polymer surface only in a few nm regions, without degradation beneath the 10nm depth by oxygen radicals or ions. Surface roughness of the polymer slightly increased with increasing ion dose, while the average peak interval considerably decreased with ion dose. These results indicate the feasibility of control of structure and chemical bonding state of polymer surface via controlling the plasma.
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Combinatorial Analysis of Plasma-Surface Interactions of Polyethyleneterephthalate with X-ray Photoelectron Spectroscopy
聚对苯二甲酸乙二醇酯等离子体-表面相互作用与 X 射线光电子能谱的组合分析
DOI: --
发表时间: 2010
期刊: Japanese Journal of Applied Physics 49
影响因子: --
作者: [K.Takenaka, Y.Setsuhara, K.Cho, M.Shiratani, M.Sekine M.Hori]
通讯作者: M.Sekine M.Hori
X線光電子分光によるプラズマーソフト材料相互作用の解析-UV-VUV領域の発光がナノ表面に及ぼす影響-
使用 X 射线光电子能谱分析等离子体-软材料相互作用 - UV-VUV 区域中的发射对纳米表面的影响 -
DOI: --
发表时间: 2010
期刊:
影响因子: --
作者: [趙研, 節原裕一, 竹中弘祐]
通讯作者: 竹中弘祐
Advanced Research and Development for Plasma Processing of Polymers with Combinatorial Plasma-Process Analyzer,
使用组合等离子体过程分析仪进行聚合物等离子体加工的高级研究和开发,
DOI: --
发表时间: 2010
期刊: Thin Solid Films 518
影响因子: --
作者: [Y.Setsuhara, K.Cho, K.Takenaka, M.Shiratani, M.Sekine M.Hori]
通讯作者: M.Sekine M.Hori
DOI: 10.1016/j.tsf.2009.11.045
发表时间: 2010-04
期刊: Thin Solid Films
影响因子: 2.1
作者: [Y. Setsuhara;Ken Cho;K. Takenaka;M. Shiratani;M. Sekine;M. Hori;E. Ikenaga;S. Zaima]
通讯作者: Y. Setsuhara;Ken Cho;K. Takenaka;M. Shiratani;M. Sekine;M. Hori;E. Ikenaga;S. Zaima
10
    Development of low-temperature high-speed deposition method for forming a high-quality zinc oxide thin films using atmospheric pressure non-equilibrium plasma
    • 批准号:
      24760597
    • 项目类别:
      Grant-in-Aid for Young Scientists (B)
    • 资助金额:
      $2.83万
    • 财政年份:
      2012
    • 负责人:
      TAKENAKA Kosuke
    • 依托单位:
    海外基金