Development of low-temperature high-speed deposition method for forming a high-quality zinc oxide thin films using atmospheric pressure non-equilibrium plasma

开发利用常压非平衡等离子体形成高质量氧化锌薄膜的低温高速沉积方法

• 批准号: 24760597
• 负责人: TAKENAKA Kosuke
• 金额: $ 2.83万
• 依托单位: Osaka University
• 依托单位国家: 日本
• 项目类别: Grant-in-Aid for Young Scientists (B)
• 财政年份: 2012
• 资助国家: 日本
• 起止时间: 2012-04-01 至 2014-03-31
• 项目状态: 已结题
• 来源: https://kaken.nii.ac.jp/grant/KAKENHI-PROJECT-24760597/
• 关键词: 大気圧非平衡プラズマ; ミストCVD; 酸化亜鉛

For fabrication of a next generation flexible device, development of low-temperature high-speed deposition technology of high- quality zinc oxide thin film have been carried out using atmospheric pressure non-equilibrium plasma. In order to investigate interaction between liquid and plasma, optical emission has been measured on the plasma/liquid interface. The optical emission spectrum shows emission of OH radicals attributed to dissociation of water. Furthermore, the interaction of the plasma with organic molecules in liquid have been investigated. This result showed that the radicals contributing to oxidation supplied through the gas-liquid interface from the plasma has affected the organic molecules into the liquid. Based on these results, low temperature deposition of zinc oxide thin film has been demonstrated by irradiation of atmospheric pressure non-equilibrium plasma to the droplet dissolved the film precursor.

为了制造下一代柔性器件，已经使用大气压非平衡等离子体进行了高质量氧化锌薄膜的低温高速沉积技术的开发。为了研究液体和等离子体之间的相互作用，在等离子体/液体界面上测量了光发射。 光学发射光谱显示归因于水的解离的OH自由基的发射。 此外，还研究了等离子体与液体中有机分子的相互作用。 该结果表明，从等离子体通过气液界面供给的有助于氧化的自由基已经影响到液体中的有机分子。在此基础上，利用常压非平衡等离子体辐照溶解了薄膜前驱体的液滴，实现了氧化锌薄膜的低温沉积。

项目成果

Low-Temperature Deposition of Zinc Oxide Film by Plasma-Assisted Mist Chemical Vapor Deposition

等离子体辅助雾化化学气相沉积法低温沉积氧化锌薄膜

• DOI: 10.1143/jjap.51.08hf05
• 发表时间: 2012
• 期刊: Jpn. J. Appl. Phys.
• 作者: Kosuke Takenaka;Yusuke Okumura and Yuichi Setsuhara
• 通讯作者: Yusuke Okumura and Yuichi Setsuhara

プラズマ支援ミストCVDによる微小凹凸構造を有した酸化亜鉛薄膜形成

等离子体辅助雾气CVD形成微粗糙结构氧化锌薄膜

• 发表时间: 2013
• 作者: Kosuke Takenaka;Yuichi Setsuhara;竹中弘祐,節原裕一
• 通讯作者: 竹中弘祐,節原裕一

Molecular-Structure Variation of Organic Materials Irradiated with Atmospheric Pressure Plasma

大气压等离子体辐照有机材料的分子结构变化

• DOI: 10.1088/1742-6596/518/1/012018
• 发表时间: 2014
• 期刊: J. Phys. : Conf. Ser.
• 作者: K. Takenaka;A. Miyazaki and Y. Setsuhara
• 通讯作者: A. Miyazaki and Y. Setsuhara

Properties of ZnO Film Deposited by Plasma-Assisted Mist Chemical Vapor Deposition

等离子体辅助雾化化学气相沉积氧化锌薄膜的性能

• 发表时间: 2014
• 作者: Kosuke Takenaka;Yuichi Setsuhara
• 通讯作者: Yuichi Setsuhara

Structure Control of ZnO Film Surface Using Plasma-Assisted Mist CVD

使用等离子体辅助雾气 CVD 控制 ZnO 薄膜表面的结构

• 发表时间: 2013
• 作者: Kosuke Takenaka;Yuichi Setsuhara
• 通讯作者: Yuichi Setsuhara