Research on the high-power pulsed sputtering discharge and its application to ion sources for thin film fabrication.

为了研究高功率脉冲磁控溅射（HPPMS）的放电特性，测量了其电压-电流密度特性和发射光谱。结果表明，HPPMS工作在异常辉光模式下，放电区域扩展到阴极的整个半径。放电电压上升，而初级电子约束退化的放电面积的扩大。接下来，我们提出了一种非均匀的潘宁suputterinf设备作为一种新型的高密度金属离子源。它使用等离子体漂移作为交叉场离子提取的机制。

In order to explore discharge properties of high-power pulsed magnetron sputtering (HPPMS)、 the voltage-current density characteristics and emission spectra were measured. It was found that HPPMS operated in the abnormal glow mode and the discharge area was extended over the whole radius of the cathode. The discharge voltage was found to rise while the primary electron confinement degraded by extention of the discharge area. Next、 we proposed an inhomogeneous Penning suputterinf device as a novel high-density metal ion source. It uses plasma drift as the mechanism of cross-field ion extraction.