Development of self-propagating exothermic materials and micro-scale casting technique for ecology bonding
Development of self-propagating exothermic materials and micro-scale casting technique for ecology bonding
批准号:
22656033
负责人:
NAMAZU Takahiro
金额:
$2.37万
依托单位:
依托单位国家:
日本
项目类别:
Grant-in-Aid for Challenging Exploratory Research
财政年份:
2010
资助国家:
日本
项目状态:
已结题
起止时间:
2010 至 2011
中文摘要
在这项工作中,我们成功地发展了自蔓延放热结构。其结构由镍包铝纳米颗粒组成。通过在结构附近产生一个小火花,通过放热反应生成NiAl金属间化合物。利用该反应,熔化了Snag焊料膜,在很短的时间内实现了硅片的焊料键合。
英文摘要
In this work, we have succeeded in the development of self-propagating exothermic structure. The structure consisted of Ni-coated Al nano-particles. By inducing a small spark at the vicinity of the structure, NiAl intermetallic compound could be produced with exothermic reaction. By using the reaction, SnAg solder film was melted, and solder bonding of Si chips in very short time period could be achieved.
期刊论文(0)
专著(0)
科研奖励(0)
会议论文
Application of Al/Ni Exothermic Reaction to Sputtering Chamber Cleaning
Al/Ni放热反应在溅射室清洗中的应用
DOI:
--
发表时间:
2011
期刊:
影响因子:
--
作者:
[T. Namazu, K. Ohtani, K. Yoshiki, and S. Inoue]
通讯作者:
and S. Inoue
Application of Nano-Layered Reactive Film to Silicon Soldering
纳米层状反应膜在硅焊接中的应用
DOI:
--
发表时间:
2010
期刊:
影响因子:
--
作者:
[K. Kiriyama, T. Shobu, J. Shibano, T. Fujishiro, H. Kaneko, S. Miura, Keisuke Tanaka, T.Namazu]
通讯作者:
T.Namazu
DOI:
10.4028/www.scientific.net/msf.638-642.2142
发表时间:
2010-01
期刊:
Materials Science Forum
影响因子:
--
作者:
[T. Namazu;S. Inoue]
通讯作者:
T. Namazu;S. Inoue
Mechanism of stress-induced exothermic reaction in Ti/Si multilayer films and development of novel reactive bonding technique
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批准号:16H04510
-
项目类别:Grant-in-Aid for Scientific Research (B)
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资助金额:$11.73万
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财政年份:2016
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负责人:NAMAZU Takahiro
-
依托单位:
Bio-compatible exothermic nanoparticles development and their exothermic performance evaluation
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批准号:16K14136
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项目类别:Grant-in-Aid for Challenging Exploratory Research
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资助金额:$2.33万
-
财政年份:2016
-
负责人:NAMAZU Takahiro
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依托单位:
Development of stress measurement method using Raman spectroscopy and biaxial tensile testing for micro/nanoscale structures
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批准号:20760075
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项目类别:Grant-in-Aid for Young Scientists (B)
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资助金额:$2.83万
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财政年份:2008
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负责人:NAMAZU Takahiro
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依托单位:
海外基金